U-shape metal-oxide-semiconductor (UMOS) gate structure for high power MOS-based semiconductor devices
First Claim
1. A U-shape Metal-Oxide-Semiconductor (UMOS) device, comprising:
- a P-base layer;
an N+ source region disposed in the P-base layer, the N+ source region having a first surface that is coplanar with a first surface of the P-base layer;
a dielectric layer extending through the P-base layer and forming a U-shape trench having side walls and a floor enclosing a trench interior region;
a conducting gate material filling the U-shape trench interior region;
a first accumulation channel layer disposed along a first side wall of the H-shape trench and in contact with the N+ source region and the first side wall of the U-shape trench;
a P-junction gate disposed adjacent to the dielectric layer floor and in proximity to the first accumulation channel layer;
an N-drift region, wherein the P-junction gate is disposed between the dielectric layer and the N-drift region;
a N+ drain region adjacent to a second wall of the U-shape trench, the second wall being disposed on a side opposite from the first side wall; and
a second accumulation channel layer along the second side wall of the trench and in contact with the N+ drain region.
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Accused Products
Abstract
A U-shape Metal-Oxide-Semiconductor (UMOS) device comprises a P-base layer, an N+ source region disposed in the P-base layer where the source region has a first surface coplanar with a first surface of the P-base layer, a dielectric layer extending through the P-base layer and forming a U-shape trench having side walls and floor enclosing a trench interior region, a conducting gate material filling the trench interior region, a first accumulation channel layer disposed along a first side wall of the U-shape trench and in contact with the source region and a first side wall of the U-shape trench, a P-junction gate disposed adjacent to the dielectric layer floor and in proximity to the first accumulation channel layer, and an N-drift region where the P-junction gate is disposed between the dielectric layer and the N-drift region.
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Citations
24 Claims
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1. A U-shape Metal-Oxide-Semiconductor (UMOS) device, comprising:
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a P-base layer; an N+ source region disposed in the P-base layer, the N+ source region having a first surface that is coplanar with a first surface of the P-base layer; a dielectric layer extending through the P-base layer and forming a U-shape trench having side walls and a floor enclosing a trench interior region; a conducting gate material filling the U-shape trench interior region; a first accumulation channel layer disposed along a first side wall of the H-shape trench and in contact with the N+ source region and the first side wall of the U-shape trench; a P-junction gate disposed adjacent to the dielectric layer floor and in proximity to the first accumulation channel layer; an N-drift region, wherein the P-junction gate is disposed between the dielectric layer and the N-drift region; a N+ drain region adjacent to a second wall of the U-shape trench, the second wall being disposed on a side opposite from the first side wall; and a second accumulation channel layer along the second side wall of the trench and in contact with the N+ drain region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A gate structure for a U-shape Metal-Oxide-Semiconductor (UMOS) device, comprising:
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a P-base layer having a first surface and a second surface; a doped buffer layer having a first surface and a second surface, a portion of the doped buffer layer first surface being adjacent to the P-base second surface; a dielectric layer extending through the P-base layer and into the doped buffer layer to form a U-shape trench having side walls and a floor enclosing a U-shape trench interior region; a conducting gate material filling the U-shape trench interior region; a P-junction gate having a first surface that is adjacent to the trench floor, remaining surfaces of the P-junction gate being in contact with the doped buffer layer; a N-drift region having a first surface and a second surface, the N-drift region first surface being adjacent to the doped buffer layer second surface; an N+ source region disposed in the P-base layer, the N+ source region having a first surface that is coplanar with the first surface of the P-base layer; a first accumulation channel layer disposed along a first side wall of the U-shape trench and in contact with the N+ source region; a N+ drain region adjacent to a second side wall of the U-shape trench, the second side wall being disposed on a side opposite from the first side wall; and a second accumulation channel layer disposed along the second side wall of the U-shape trench and in contact with the N+ drain region. - View Dependent Claims (16, 17)
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18. A method of using a UMOS field effect transistor (FET), the UMOS FET comprising:
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a P-base layer; an N+ source region disposed in the P-base layer, the N+ source region having a first surface that is coplanar with a first surface of the P-base layer, the N+ source region having a source terminal in electrical contact with the N+ source region; a dielectric layer extending through the P-base layer and forming a U-shape trench having side walls and a floor enclosing a trench interior region; a conducting gate material filling the U-shape trench interior region, the conducting gate material having a gate terminal in electrical contact with the conducting gate material; a first accumulation channel layer along a first side wall of the U-shape trench and in contact with both the N+ source region and a first side wall of the U-shape trench; a P-junction gate disposed adjacent to the dielectric layer floor and in proximity to the first accumulation channel layer; an N-drift region, wherein the P-junction gate is disposed between the dielectric layer and the N-drift region; a N+ drain region adjacent to a second side wall of the U-shape trench, the second side wall being disposed on a side opposite from the first side wall, the N+ drain region having a drain terminal in electrical contact with the N+ drain region; and a second accumulation channel layer along the second side wall of the U-shape trench and in contact with the N+ drain region, and wherein the method of using the UMOS FET comprises; applying a controlling voltage to the gate terminal, the controlling voltage applied to the UMOS FET being effective in controlling the flow of electrical current through the source terminal and the drain terminal. - View Dependent Claims (19, 20)
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21. A method of making a U-shape Metal-oxide-Semiconductor (UM0S) device, comprising:
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providing a P-base layer having a first surface and a second surface; providing a doped buffer layer having a first surface and a second surface, a portion of the doped buffer layer first surface being adjacent to the P-base second surface; providing a dielectric layer extending through the P-base layer and into the doped buffer layer to form a U-shape trench having side walls and a floor enclosing a U-shape trench interior region; providing a conducting gate material filling the U-shape trench interior region; and providing a P-junction gate having a first surface that is adjacent to the trench floor, remaining surfaces of the P-junction gate being in contact with the doped buffer layer, wherein a distance between the trench floor and the doped buffer layer second surface is sufficient to provide a junction depletion region wholly embedded within the doped buffer layer; providing an N+ source region disposed in the P-base layer, the N+ source region having a first surface that is coplanar with a first surface of the F-base layer; providing a first accumulation channel layer along a first side wall of the u-shape trench and in contact with the N+ source region and a first side wall of the U-shape trench, wherein the doped buffer layer provides an accumulation conducting channel along the first accumulation channel layer; providing an N+ drain region disposed in the P-base layer, the N+ drain region having a first surface that is coplanar with a first surface of the P-base layer; and providing a second accumulation channel layer along a second side wall of the U-shape trench and in contact with the N+ drain region and a second side wall of the U-shape trench, wherein the doped buffer layer provides an accumulation conducting channel along the second accumulation channel layer. - View Dependent Claims (22, 23, 24)
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Specification