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Detachable electrostatic chuck for supporting a substrate in a process chamber

  • US 7,480,129 B2
  • Filed: 09/07/2005
  • Issued: 01/20/2009
  • Est. Priority Date: 03/31/2004
  • Status: Expired due to Term
First Claim
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1. An electrostatic chuck for attachment to a pedestal in a substrate processing chamber capable of processing a substrate in an energized process gas, the electrostatic chuck comprising:

  • (a) at least one electrode capable of being charged to energize a process gas;

    (b) a dielectric covering the electrode;

    (c) a frontside surface to receive a substrate;

    (d) an annular flange; and

    (e) a backside surface comprising a central protrusion having asymmetrically offset orifices for receiving electrode terminal posts and a gas tube, wherein at least one orifice is offset from another orifice by an angle of from about 115 to about 135°

    .

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