Optimized photomasks for photolithography
First Claim
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1. A network-accessible computing apparatus, comprising:
- a processor to execute instructions which include;
receiving a target pattern;
receiving a first file describing a first mask to produce a wafer pattern, which corresponds to the target pattern, in a photolithography process; and
generating a second file describing a second mask to produce another wafer pattern, which corresponds to the target pattern, in the photolithography process, wherein the second mask is based on the first mask and a difference of the wafer pattern and the target pattern;
wherein the generating involves using a level-set function to represent the first mask, and the other wafer pattern provides a design element in an integrated circuit.
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Abstract
Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.
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Citations
11 Claims
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1. A network-accessible computing apparatus, comprising:
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a processor to execute instructions which include; receiving a target pattern; receiving a first file describing a first mask to produce a wafer pattern, which corresponds to the target pattern, in a photolithography process; and generating a second file describing a second mask to produce another wafer pattern, which corresponds to the target pattern, in the photolithography process, wherein the second mask is based on the first mask and a difference of the wafer pattern and the target pattern; wherein the generating involves using a level-set function to represent the first mask, and the other wafer pattern provides a design element in an integrated circuit.
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2. A computer-program product for use in conjunction with a computer system, the computer-program product comprising a computer-readable storage device and a computer-program mechanism embedded therein, the computer-program mechanism comprising:
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instructions for receiving a target pattern; instructions for receiving a first file describing a first mask to produce a wafer pattern, which corresponds to the target pattern, in a photolithography process; and instructions for generating a second file describing a second mask to produce another wafer pattern, which corresponds to the target pattern, in the photolithography process, wherein the second mask is based on the first mask and a difference of the wafer pattern and the target pattern; wherein the generating involves using a level-set function to represent the first mask, and the other wafer pattern provides a design element in an integrated circuit. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9, 10, 11)
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Specification