Electronic devices
First Claim
1. A method for forming an electronic device in a multilayer structure comprising the steps of:
- depositing a first layer in such a way as to define one or more electrodes of the device and a topographic profile;
depositing at least one non-planarizing layer on top of the first layer such that the topographic profile of the surface of the at least one non-planarizing layer conforms to that of the laterally extending first layer; and
depositing a pattern of at least one additional layer onto the top-most non-planarizing layer to define one or more elements of the device, such that the lateral location of the additional layer is defined by the shape of the topographic profile of the non-planarizing layer, and whereby the additional layer is laterally aligned with the topographic profile in the first layer.
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Accused Products
Abstract
A method for forming an electronic device in a multilayer structure comprising the steps of: defining a topographic profile in a laterally extending first layer; depositing at least one non-planarizing layer on top of the first layer such that the topographic profile of the surface of the or each non-planarizing layer conforms to that of the laterally extending first layer; and depositing a pattern of at least one additional layer onto the top-most non-planarizing layer, such that the lateral location of the additional layer is defined by the shape of the topographic profile of the non-planarizing layer, and whereby the additional layer is laterally aligned with the topographic profile in the first layer.
18 Citations
38 Claims
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1. A method for forming an electronic device in a multilayer structure comprising the steps of:
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depositing a first layer in such a way as to define one or more electrodes of the device and a topographic profile; depositing at least one non-planarizing layer on top of the first layer such that the topographic profile of the surface of the at least one non-planarizing layer conforms to that of the laterally extending first layer; and depositing a pattern of at least one additional layer onto the top-most non-planarizing layer to define one or more elements of the device, such that the lateral location of the additional layer is defined by the shape of the topographic profile of the non-planarizing layer, and whereby the additional layer is laterally aligned with the topographic profile in the first layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38)
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Specification