Top layers of metal for high performance IC's
First Claim
Patent Images
1. An integrated circuit chip comprising:
- a silicon substrate;
multiple devices in and on said silicon substrate, wherein said multiple devices comprise a transistor in and on said silicon substrate;
a first dielectric layer over said silicon substrate;
a metallization structure over said first dielectric layer, wherein said metallization structure is connected to said multiple devices, and wherein said metallization structure comprises a first metal layer and a second metal layer over said first metal layer;
a second dielectric layer between said first and second metal layers;
a passivation layer over said metallization structure and over said first and second dielectric layers, wherein said passivation layer comprises a nitride layer;
multiple power or ground pads arranged in an area array in a first region of said integrated circuit chip, wherein said area array has more than three rows and more than three columns, and wherein all pads in said area array are said multiple power or ground pads;
multiple first peripheral pads arranged along multiple edges of said integrated circuit chip;
multiple metal traces over said passivation layer;
multiple second peripheral pads arranged in more than two rings surrounding said multiple power or ground pads and in a second region surrounding said first region, wherein said multiple second peripheral pads in each of said more than two rings comprise more than ten signal pads continuously arranged, wherein one of said more than ten signal pads in one of said more than two rings is connected to one of said multiple first peripheral pads through one of said multiple metal traces, and said one of said more than ten signal pads in said one of said more than two rings has a position from a top view different from that of said one of said multiple first peripheral pads; and
multiple metal bumps on said multiple second peripheral pads.
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Abstract
A method of closely interconnecting integrated circuits contained within a semiconductor wafer to electrical circuits surrounding the semiconductor wafer. Electrical interconnects are held to a minimum in length by making efficient use of polyimide or polymer as an inter-metal dielectric thus enabling the integration of very small integrated circuits within a larger circuit environment at a minimum cost in electrical circuit performance.
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Citations
17 Claims
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1. An integrated circuit chip comprising:
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a silicon substrate; multiple devices in and on said silicon substrate, wherein said multiple devices comprise a transistor in and on said silicon substrate; a first dielectric layer over said silicon substrate; a metallization structure over said first dielectric layer, wherein said metallization structure is connected to said multiple devices, and wherein said metallization structure comprises a first metal layer and a second metal layer over said first metal layer; a second dielectric layer between said first and second metal layers; a passivation layer over said metallization structure and over said first and second dielectric layers, wherein said passivation layer comprises a nitride layer; multiple power or ground pads arranged in an area array in a first region of said integrated circuit chip, wherein said area array has more than three rows and more than three columns, and wherein all pads in said area array are said multiple power or ground pads; multiple first peripheral pads arranged along multiple edges of said integrated circuit chip; multiple metal traces over said passivation layer; multiple second peripheral pads arranged in more than two rings surrounding said multiple power or ground pads and in a second region surrounding said first region, wherein said multiple second peripheral pads in each of said more than two rings comprise more than ten signal pads continuously arranged, wherein one of said more than ten signal pads in one of said more than two rings is connected to one of said multiple first peripheral pads through one of said multiple metal traces, and said one of said more than ten signal pads in said one of said more than two rings has a position from a top view different from that of said one of said multiple first peripheral pads; and multiple metal bumps on said multiple second peripheral pads. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An integrated circuit chip comprising:
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a silicon substrate; multiple devices in and on said silicon substrate, wherein said multiple devices comprise a transistor in and on said silicon substrate; a first dielectric layer over said silicon substrate; a metallization structure over said first dielectric layer, wherein said metallization structure is connected to said multiple devices, and wherein said metallization structure comprises a first metal layer and a second metal layer over said first metal layer; a second dielectric layer between said first and second metal layers; a passivation layer over said metallization structure and over said first and second dielectric layers, wherein said passivation layer comprises a nitride layer; multiple power or ground pads arranged in an area array in a region of said integrated circuit chip, wherein said area array has more than three rows defined as multiple first rows and more than three columns, and wherein all pads in said area array are said multiple power or ground pads; multiple first peripheral pads arranged in more than two rows defined as multiple second rows along a first edge of said integrated circuit chip, wherein said multiple first peripheral pads in each of said multiple second rows comprise more than ten signal pads continuously arranged, and wherein a first pitch between every neighboring two of said multiple first peripheral pads in each of said multiple second rows is different from a second pitch between every neighboring two of said multiple power or ground pads in each of said multiple first rows; multiple second peripheral pads arranged in more than two rows defined as multiple third rows along a second edge of said integrated circuit chip, wherein said second edge is opposite to said first edge, wherein said multiple second peripheral pads in each of said multiple third rows comprise more than ten signal pads continuously arranged, and wherein said multiple first rows are between said multiple second rows and said multiple third rows; and multiple metal bumps on said multiple first and second peripheral pads. - View Dependent Claims (12, 13, 14, 15, 16, 17)
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Specification