Lithographic projection apparatus and device manufacturing method

• US 7,483,118 B2
• Filed: 07/14/2004
• Issued: 01/27/2009
• Est. Priority Date: 07/28/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Mulkens, Johannes Catharinus Hubertus
• Primary Examiner(s): Rutledge; Della J.
• Application Number:
  US10/890,389
• Publication Number:
  US 20050030498A1
• Time in Patent Office: 1,658 Days
• Field of Search: 355/30, 355/46, 355/53, 355/67, 355/71, 378/34, 378/35, 250/548
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With substantially no direct connection between the two parts of the projection system, vibrations induced in a first of the two parts by coupling of forces through the liquid filling the space when the substrate moves relative to the liquid supply system affects substantially only the first part of the projection system and not the other second part.

Claims

1. A lithographic projection apparatus comprising:

an illumination system arranged to condition a radiation beam;

a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern;

a substrate table configured to hold a substrate;

a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising a first part and a second part that are two separate physical parts that are substantially isolated from each other such that vibrations in the second part are substantially prevented from being transferred to the first part, wherein each part comprises an optical element of the projection system and the first and second parts are not attached to and movable with the substrate; and

a liquid supply system configured to at least partly fill a space between the projection system and the substrate, with a liquid.

2. The lithographic apparatus according to claim 1, wherein the parts of the projection system are separated at a location between two lens elements having a large curvature radius, between two lens elements where the patterned beam is collimated, or both.

3. The lithographic apparatus according to claim 1, wherein the projection system is a telecentric lens system and the parts are separated at a pupil plane of the lens system.

4. The lithographic apparatus according to claim 1, further comprising:

a sensor configured to establish a position between a first optical element in the first part of the projection system and a second optical element in the second part of the projection system;

an actuator configured to vary the position between the first and second optical elements; and

a controller configured to control the actuator on the basis of output from the sensor to maintain a predetermined position between the first and second optical elements.

5. The lithographic apparatus according to claim 4, wherein the position is a distance in the direction substantially parallel to the direction of the optical axis of the projection system.

6. The lithographic apparatus according to claim 1, further comprising:

an actuator configured to vary the position between the first and second parts; and

a controller configured to control the actuator to maintain a predetermined relative positioning between the first and second parts.

7. The lithographic apparatus according to claim 1, wherein the second part of the projection system is attached to the liquid supply system.

8. The lithographic apparatus according to claim 1, wherein the liquid supply system comprises a seal member configured to seal liquid in at least part of the space between the projection system and the substrate.

9. The lithographic apparatus according to claim 8, wherein the seal member further comprises a contactless seal configured to seal liquid in the space.

10. The lithographic apparatus according to claim 1, wherein the second part is at least partly supported by a resilient member connected between the second part and a base frame.

11. The lithographic apparatus according to claim 10, wherein the base frame is decoupled from a frame to which the first part is attached.

12. A device manufacturing method, comprising:

providing a liquid to a space between a substrate on a substrate table of a lithographic apparatus and a first part of a projection system of the lithographic apparatus, a second part of the projection system being substantially isolated from the first part such that vibrations in the second part are substantially prevented from being transferred to the first part and the first and second parts are not attached to and movable with the substrate; and

projecting a patterned beam of radiation, using the first and second parts of the projection system, through the liquid onto a target portion of a substrate.

13. The method according to claim 12, further comprising:

establishing a position between a first optical element in the first part of the projection system and a second optical element in the second part of the projection system; and

adjusting the position of the first optical element, the second optical element, or both such that the established position is maintained at a predetermined position.

14. The method according to claim 13, wherein the position is a distance in the direction substantially parallel to the direction of the optical axis of the projection system.

15. The method according to claim 12, further comprising adjusting the relative positioning of the first and second parts of the projection system to maintain a predetermined relative positioning between them.

16. The method according to claim 12, wherein the parts of the projection system are separated at a location between two lens elements having a large curvature radius, between two lens elements where the patterned beam is collimated, or both.

17. The method according to claim 12, wherein the projection system is a telecentric lens system and the parts are separated at a pupil plane of the lens system.

18. The method according to claim 12, comprising sealing the liquid in at least part of the space between the projection system and the substrate using a seal member.

19. The method according to claim 18, wherein sealing the liquid comprises sealing the liquid in the space using a contactiess seal.

20. The method according to claim 12, comprising at least partly supporting the second part using a resilient member connected between the second part and a base frame of the lithographic apparatus.

21. The method according to claim 20, wherein the base frame is decoupled from a frame to which the first part is attached.