Error correction in interferometry systems

• US 7,489,407 B2
• Filed: 10/06/2005
• Issued: 02/10/2009
• Est. Priority Date: 10/06/2004
• Status: Expired due to Fees

• Current Assignee: Zygo Corporation (Ametek Incorporated)
• Original Assignee: Zygo Corporation (Ametek Incorporated)
• Inventors: Johnston, Jeffrey, Hill, Henry A.
• Primary Examiner(s): Chowdhury; Tarifur
• Assistant Examiner(s): Hansen; Jonathan M
• Application Number:
  US11/246,942
• Publication Number:
  US 20060072119A1
• Time in Patent Office: 1,223 Days
• Field of Search: 356/486, 356/487, 356/493, 356/498, 356/500, 356/508, 356/509
• US Class Current: 356/508
• CPC Class Codes: G01B 2290/45 Multiple detectors for detecting interferometer signals
• CPC Class Codes: G01B 2290/70 Using polarization in the interferometer
• CPC Class Codes: G01B 9/02002 using two or more frequencies
• CPC Class Codes: G01B 9/02021 contacting different faces of object, e.g. opposite faces
• CPC Class Codes: G01B 9/02027 Two or more interferometric channels or interferometers
• CPC Class Codes: G01B 9/02059 Reducing effect of parasitic reflections, e.g. cyclic errors
• CPC Class Codes: G01B 9/02061 Reduction or prevention of effects of tilts or misalignment
• CPC Class Codes: G01B 9/0207 Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position

Abstract

In general, in one aspect, the invention features methods that include using an interferometer to produce an output beam having a phase related to an optical path difference between a path of a first beam and a path of a second beam, wherein the first beam contacts a measurement object and either the measurement object or the interferometer are coupled (e.g., directly attached) to a stage that is moveable within a reference frame. The methods further include monitoring variations in the phase while both varying an orientation of the stage with respect to at least one degree of freedom in the reference frame and keeping a reference mark on the stage in a common position with respect to the reference frame, and determining information based on the monitored variations, the information being related to a contribution to the optical path difference caused by a deviation of the path of the first or second beam from a nominal beam path.

Claims

1. A method, comprising:

using an interferometer to produce an output beam comprising a phase related to an optical path difference between a path of a first beam and a path of a second beam, wherein the first beam contacts a measurement object and either the measurement object or the interferometer are coupled to a stage that is moveable within a reference frame;

monitoring variations in the phase while both varying an orientation of the stage with respect to at least one degree of freedom in the reference frame and keeping a reference mark on the stage in a common position with respect to the reference frame; and

determining information based on the monitored variations, the information being related to a contribution to the optical path difference caused by a deviation of the path of the first or second beam from a nominal beam path,

wherein the information is determined based on additional monitored variations of the phase associated with varying an orientation of the stage with respect to the reference frame while keeping a second alignment mark on the stage at a common position with respect to the reference frame.

2. The method of claim 1 wherein the reference mark is kept in a common position by maintaining the reference mark in alignment with an alignment tool.

3. The method of claim 2 wherein the alignment tool is an optical alignment scope.

4. The method of claim 1 wherein monitoring the variations in the phase includes monitoring the orientation of the stage with respect to the at least one degree of freedom.

5. The method of claim 4 wherein the information is related to deviations of the actual stage orientation from the monitored orientation.

6. The method of claim 5 wherein the information includes contributions to the deviations of the actual stage orientation from the monitored stage orientation due to imperfections in the interferometer.

7. The method of claim 5 wherein the measurement object is a plane mirror measurement object and the information includes contributions to the deviations of the actual stage orientation from the monitored stage orientation due to imperfections in the plane mirror.

8. The method of claim 4 wherein the stage orientation is monitored using the interferometer.

9. The method of claim 4 wherein the degree of freedom corresponds to the stage pitch in the reference frame.

10. The method of claim 4 wherein the degree of freedom corresponds to the stage yaw in the reference frame.

11. The method of claim 1 wherein the information is determined based on a difference between the phase variations monitored with the first alignment mark substantially stationary with respect to the reference frame and the additional monitored phase variations for corresponding stage orientations.

12. The method of claim 1 wherein the reference mark is a mark on a surface of the stage.

13. The method of claim 1 wherein the reference mark is a mark on a surface of a wafer, a LCD substrate, or a reticle supported by the stage.

14. The method of claim 1 wherein the measurement object is a plane mirror measurement object.

15. The method of claim 1 wherein the measurement beam contacts the measurement object more than once.

16. A method, comprising:

using an interferometry system to monitor the position of a moveable stage with respect to a reference frame; and

using information determined according to the method of claim 1 to reduce errors in the monitored position.

17. The method of claim 16 wherein monitoring the position of the stage comprises monitoring the location of a die site on a wafer supported by the stage with respect to the reference frame.

18. A lithography method for use in fabricating integrated circuits on a wafer, the method comprising:

using the method of claim 16 to monitor the position of the stage, wherein the wafer is supported on the stage;

imaging spatially patterned radiation onto the wafer; and

adjusting the position of the stage.

19. A lithography method for use in the fabrication of integrated circuits comprising:

directing input radiation through a mask to produce spatially patterned radiation;

positioning the mask relative to the input radiation;

monitoring the position of the mask relative to the input radiation using the method of claim 16; and

imaging the spatially patterned radiation onto a wafer.

20. A lithography method for fabricating integrated circuits on a wafer comprising:

positioning a first component of a lithography system relative to a second component of a lithography system to expose the wafer to spatially patterned radiation; and

monitoring the position of the first component relative to the second component using the method of claim 16.

21. A method for fabricating integrated circuits, the method comprising;

applying a resist to a wafer;

forming a pattern of a mask in the resist by exposing the wafer to radiation using the lithography method of claim 18; and

producing an integrated circuit from the wafer.

22. A method for fabricating integrated circuits, the method comprising;

applying a resist to a wafer;

forming a pattern of a mask in the resist by exposing the wafer to radiation using the lithography method of claim 19; and

producing an integrated circuit from the wafer.

23. A method for fabricating a lithography mask, the method comprising:

directing a write beam to a substrate to pattern the substrate;

positioning the substrate relative to the write beam; and

monitoring the position of the substrate relative to the write beam using the interferometry method of claim 16.