Wafer probe station having a skirting component

• US 7,492,147 B2
• Filed: 07/27/2007
• Issued: 02/17/2009
• Est. Priority Date: 06/11/1992
• Status: Expired due to Fees

• Current Assignee: Cascade Microtech Incorporated (FormFactor Incorporated)
• Original Assignee: Cascade Microtech Incorporated (FormFactor Incorporated)
• Inventors: Warner, Richard H., Schwindt, Randy J., Harwood, Warren K., Tervo, Paul A., Smith, Kenneth R.
• Primary Examiner(s): Karlsen; Ernest F
• Application Number:
  US11/881,571
• Publication Number:
  US 20070290700A1
• Time in Patent Office: 571 Days
• Field of Search: 324754-765, 324/158.1, 174/350
• US Class Current: 324/757.03
• CPC Class Codes: A46D 1/00 Bristles; Selection of materials for bristles making artificial bristles D01D, D01F
• CPC Class Codes: G01R 1/0416 Connectors, terminals G01R1/0425 and G01R1/0433 take precedence; with measurement function for battery poles G01R31/364
• CPC Class Codes: G01R 1/06705 Apparatus for holding or moving single probes for moving multiple probe heads or ICs under test G01R31/2886
• CPC Class Codes: G01R 1/06794 Devices for sensing when probes are in contact, or in position to contact, with measured object
• CPC Class Codes: G01R 1/07392 manipulating each probe element or tip individually
• CPC Class Codes: G01R 1/18 Screening arrangements against electric or magnetic fields, e.g. against earth's field
• CPC Class Codes: G01R 31/2886 Features relating to contacting the IC under test, e.g. probe heads; chucks G01R31/2865 takes precedence, test connections, e.g. test sockets, or probes per se, G01R1/04 or G01R1/06
• CPC Class Codes: G01R 31/2887 involving moving the probe head or the IC under test; docking stations moving single probes G01R1/06705; moving individual probes in multiple probes G01R1/07392
• CPC Class Codes: H01L 21/68785 characterised by the mechanical construction of the susceptor, stage or support

Abstract

A probe station includes a fully guarded chuck assembly and connector mechanism for increasing sensitivity to low-level currents while reducing settling times. The chuck assembly includes a wafer-supporting first chuck element surrounded by a second chuck element having a lower component, skirting component and upper component each with a surface portion extending opposite the first element for guarding thereof. The connector mechanism is so connected to the second chuck element as to enable, during low-level current measurements, the potential on each component to follow that on the first chuck element as measured relative to an outer shielding enclosure surrounding each element. Leakage current from the first chuck element is thus reduced to virtually zero, hence enabling increased current sensitivity, and the reduced capacitance thus provided by the second chuck element decreases charging periods, hence reducing settling times. With similar operation and effect, where any signal line element of the connector mechanism is arranged exterior of its corresponding guard line element, such as adjacent the chuck assembly or on the probe-holding assembly, a guard enclosure is provided to surround and fully guard such signal line element in interposed relationship between that element and the outer shielding enclosure.

Claims

1. A probe station comprising:

(a) a probe assembly for holding an electrical probe;

(b) a chuck assembly having respective upper and lower chuck assembly elements electrically insulated from each other, said upper chuck assembly element having an upper surface for horizontally supporting a device for probing by said electrical probe, a lower surface opposite said upper surface and a peripheral surface extending between said upper and lower surfaces;

(c) an electrically conductive outer enclosure enclosing said chuck assembly; and

(d) said lower chuck assembly element having respective lower and skirting components each of conductive material and each spaced from said upper chuck assembly element, said lower component including an upper surface portion extending opposite said lower surface, said skirting component including an inner surface portion extending opposite and substantially surrounding said peripheral surface.

2. The probe station of claim 1 including a connector mechanism enabling a first nonzero potential difference to be established between said upper chuck assembly element and said outer enclosure and a second nonzero potential difference substantially equal to said first nonzero potential difference to be established between said lower chuck assembly element and said outer enclosure.

3. The probe station of claim 1 wherein said upper chuck assembly element and said lower chuck assembly element, and said upper chuck assembly element and said skirting component, are each spaced apart by air over a major portion of the region therebetween.

4. A probe station comprising:

(a) a probe assembly for holding an electrical probe;

(b) a chuck assembly having respective upper and lower chuck assembly elements electrically insulated from each other, said upper chuck assembly element having an upper surface for horizontally supporting a device for probing, a lower surface opposite said upper surface and a peripheral surface extending between said upper and lower surfaces;

(c) an electrically conductive outer enclosure enclosing said chuck assembly;

(d) said lower chuck assembly element having respective lower and skirting components each of conductive material and each spaced from said upper chuck assembly element, said lower component including an upper surface portion extending opposite said lower surface, said skirting component including an inner surface portion extending opposite said peripheral surface; and

(e) a connector mechanism enabling a first nonzero potential difference to be established between said upper chuck assembly element and said outer enclosure and a second nonzero potential difference substantially equal to said first nonzero potential difference to be established between said lower chuck assembly element and said outer enclosure.

5. The probe station of claim 4 wherein said peripheral surface is round and said inner surface portion is radially spaced from said peripheral surface.

6. The probe station of claim 5 wherein said inner surface portion and said peripheral surface are separated from each other by an open gap.

7. The probe station of claim 5 including a positioning mechanism for moving said upper chuck assembly element and said skirting component in unison with each other in mutually perpendicular directions.

8. The probe station of claim 5 wherein said connector mechanism includes respective first, second and third conductors electrically connected to said upper chuck assembly element, said lower chuck assembly element and said outer enclosure, respectively.

9. The probe station of claim 8 wherein said connector mechanism includes respective fourth, fifth and sixth conductors electrically connected to said upper chuck assembly element, said lower chuck assembly element and said conductive outer enclosure, respectively.

10. The probe station of claim 5 wherein said connector mechanism is accessible for connection to an external test instrument from a location exterior of said outer enclosure.