Lithographic apparatus and device manufacturing method

• US 7,492,440 B2
• Filed: 09/09/2004
• Issued: 02/17/2009
• Est. Priority Date: 09/09/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Gilissen, Noud Jan, Zaal, Koen Jacobus Johannes Maria, Buis, Edwin Johan, Van Der Schoot, Harmen Klaas, Cox, Henrikus Herman Marie
• Primary Examiner(s): Mullins; Burton
• Application Number:
  US10/936,712
• Publication Number:
  US 20060049698A1
• Time in Patent Office: 1,622 Days
• Field of Search: 310/12, 355/53, 355/72, 250/492.1, 250/492.2
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.

Claims

1. A lithographic apparatus comprising:

an illumination system configured to condition a radiation beam;

a pattern support configured to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

a substrate support constructed to hold a substrate;

a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and

an actuator assembly configured to move one of said supports with respect to a base structure, the actuator assembly comprising;

an actuator assembly frame;

a flexible coupling assembly configured to flexibly couple said actuator assembly frame to said one support, and

a plurality of actuators that are each configured to couple said actuator assembly frame to said base structure and that are each configured to controllably exert a force on the actuator assembly frame, the plurality of actuators being configured to move said one support in three degrees of freedom in a plane and at least one other degree of freedom, wherein the plurality of actuators are connected to the actuator assembly frame such that movement of said support is effected by the plurality of actuators in the three degrees of freedom in a plane and the at least one other degree of freedom through the flexible coupling assembly.

2. The lithographic apparatus according to claim 1, wherein said actuator assembly comprises at least one planar actuator configured to move said one support in said plane and at least one actuator configured to move said support in said one other degree of freedom.

3. The lithographic apparatus according to claim 2, wherein said one other degree of freedom is directed substantially perpendicular to said plane.

4. The lithographic apparatus according to claim 1, wherein the actuator assembly is at least partly provided with a heat shield configured to prevent a heat transfer to said support.

5. The lithographic apparatus according to claim 1, wherein the actuator assembly further comprises a cooling system.

6. The lithographic apparatus according to claim 1, wherein said one support is the pattern support.

7. The lithographic apparatus according to claim 1, wherein said one support is the substrate support.

8. The lithographic apparatus according to claim 1, further comprising an actuator assembly configured to move the other of said supports so that both said pattern support and said substrate support are moved by a respective actuator assembly that each comprise an actuator assembly frame, a flexible coupling assembly and at least one actuator.

9. The lithographic apparatus according to claim 1, wherein the pattern support is a mask table.

10. The lithographic apparatus according to claim 1, wherein the substrate support is a substrate table.

11. The lithographic apparatus according to claim 1, wherein said flexible coupling assembly comprises a plurality of leaf springs.

12. The lithographic apparatus according to claim 1, wherein said flexible coupling assembly comprises a plurality of flexible coupling members.

13. The lithographic apparatus according to claim 12, wherein the flexible coupling members are equidistant to one another.

14. The lithographic apparatus according to claim 1, The lithographic apparatus according to claim 1, wherein said plurality of actuators include a magnet assembly arranged in said actuator assembly frame and a coil arranged in said base structure.

15. The lithographic apparatus according to claim 1, wherein the actuator assembly is configured to filter supporting forces that act to space apart said support from the base structure.

16. The lithographic apparatus according to claim 1, wherein the one support partly encloses the actuator assembly frame.

17. An apparatus comprising an actuator assembly constructed to support and move an object, the actuator assembly comprising:

an actuator assembly frame;

a flexible coupling assembly configured to flexibly couple said actuator assembly frame to said object, and

a plurality of actuators that are each configured to couple said actuator assembly frame to a base structure and that are each configured to controllably exert a force on the actuator assembly frame, the plurality of actuators being configured to move said object in three degrees of freedom in a plane and at least one other degree of freedom, wherein the plurality of actuators are connected to the actuator assembly frame such that movement of said support is effected by the plurality of actuators in the three degrees of freedom in a plane and the at least one other degree of freedom through the flexible coupling assembly.

18. The apparatus according to claim 17, wherein said flexible coupling assembly comprises a plurality of leaf springs.

19. The apparatus according to claim 17, wherein said flexible coupling assembly comprises a plurality of flexible coupling members.

20. The apparatus according to claim 19, wherein the flexible coupling members are equidistant to one another.

21. The lithographic apparatus according to claim 17, wherein said plurality of actuators include a magnet assembly arranged in said actuator assembly frame and a coil arranged in said base structure.

22. The apparatus according to claim 17, wherein the plurality of actuators are arranged in the actuator assembly frame, such that movement of the object is effected by the plurality of actuators in the three degrees of freedom in a plane and the at least one other degree of freedom through the flexible coupling assembly.