Gate valve for plus-atmospheric pressure semiconductor process vessels

• US 7,494,107 B2
• Filed: 03/30/2005
• Issued: 02/24/2009
• Est. Priority Date: 03/30/2005
• Status: Expired due to Fees

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Supercritical Systems, Inc. (Tokyo Electron Limited)
• Inventors: Sutton, Thomas, Sheydayi, Alexei
• Primary Examiner(s): Bastianelli; John
• Application Number:
  US11/094,936
• Publication Number:
  US 20060225811A1
• Time in Patent Office: 1,427 Days
• Field of Search: 251/63.5, 251/175, 251/193, 251195-202, 414/935, 414/939
• US Class Current: 251/63.5
• CPC Class Codes: F16K 51/02 specially adapted for high-vacuum installations
• CPC Class Codes: H01L 21/67126 Apparatus for sealing, encapsulating, glassing, decapsulating or the like processes H01L23/02, H01L23/28
• CPC Class Codes: Y10S 414/135 Associated with semiconductor wafer handling

Abstract

An isolation valve is preferably applied to the semiconductor industry for sealing a process vessel and also operates effectively at plus-atmospheric pressures. A double containment gate valve assembly includes a housing and a movable head assembly within the housing. The housing includes a first access opening and a second access opening. The head assembly is configurable into a first position where an access path through the first and second access openings is clear, and a second position where the access path is blocked.

Claims

1. A double containment gate valve, the gate valve comprising:

a housing comprising, a first access opening, a second access opening, and an inner chamber, wherein the first access opening is configured to be substantially in the same horizontal plane as the second access opening, thereby providing an access pass through the inner chamber of the double containment gate valve when the head assembly is in the down position, wherein the double containment gate valve is configured to allow a wafer to be loaded/unloaded to/from a processing chamber via the access path through the outer access opening and the inner access opening;

a head assembly within the housing, wherein the head assembly is movable to concurrently form a first seal over the first access opening and a second seal over the second access opening, and configured such that a pressure exerted to open the second seal is translated to a pressure to maintain the first seal, wherein the head assembly is further configured to move down to clear the access path through the double containment gate valve and to minimize particulates during wafer loading and/or unloading, the head assembly includes a first door and a second door, the first door and the second door being movable in a direction parallel to the access path, wherein the head assembly further includes a head assembly housing and a closure plate, the head assembly housing being configured to form a head inner chamber, the closure plate being coupled to the head assembly housing at an open side of the head inner chamber, thereby enclosing the head inner chamber, wherein the head assembly further comprises a first piston and a second piston configured within the inner head chamber, the first piston being coupled to a first cylinder, wherein the first cylinder is coupled to the first door, the second piston being coupled to a second cylinder, wherein the second cylinder is coupled to the second door, and a fluid gap is configured between the first piston and the second piston; and

a controller coupled to the gate valve and configured to compute a predicted process time for a substrate processed in the processing chamber and to employ the predicted process time to determine an operating state for the gate valve.

2. The double containment gate valve of claim 1, wherein fittings are coupled to access openings drilled into the head assembly housing, the fittings being configured to transmit pressure to a first outside face of the first piston and a second outside face of the second piston.

3. The double containment gate valve of claim 2, wherein one or more additional fittings are coupled to access openings leading to the fluid gap, wherein applying pressure to the first and second outside faces, and removing pressure from the fluid gap, moves the first and second pistons towards each other, and away from the first access opening and the second access opening.

4. The double containment gate valve of claim 2, wherein pressure supplied to the fluid gap between the first and second pistons and removed from the first and second outside faces causes the first and second pistons to be forced equally outward, thereby moving the first and second doors outwardly.

5. The double containment gate valve of claim 2, wherein a first surface of the first door facing the outer access opening includes a first o-ring and a surface of the second door facing the access opening includes a second o-ring.

6. The gate valve of claim 1, wherein the second access opening of the gate valve is coupled to a third access opening of a processing chamber.

7. The gate valve of claim 6, wherein when the head assembly is in a closed position, the head assembly seals closed the third access opening of the processing chamber and the first access opening of the gate valve.

8. The gate valve of claim 6, wherein the first, second, and third access openings form a substantially straight linear access path to the processing chamber.

9. The gate valve of claim 8, wherein the head assembly is movable in a direction perpendicular to the linear access path.

10. The gate valve of claim 8, wherein the head assembly includes first and second doors each movable in a direction of the access path, the first door facing and configured to seal the first access opening and the second door facing and configured to seal the second access opening.

11. The gate valve of claim 10, wherein the head assembly further comprises a first piston coupled to the first door, a second piston coupled to the second door, and a pressure cavity operatively coupling the first and second pistons.

12. The gate valve of claim 11, wherein the head assembly further comprises an access hole to the pressure cavity.

13. The gate valve of claim 11, wherein the first piston and the second piston each includes two-rod, double acting cylinders.

14. The gate valve of claim 11, wherein the first piston and the second piston each comprises a single cylinder.

15. The gate valve of claim 11, wherein the pressure cavity contains a material at a supercritical pressure.