Ceramic thin film coating material having slope constitution and process for the production thereof

• US 7,494,693 B2
• Filed: 10/23/2006
• Issued: 02/24/2009
• Est. Priority Date: 08/09/2002
• Status: Expired due to Fees

• Current Assignee: UBE Industries Limited
• Original Assignee: UBE Industries Limited
• Inventors: Fujii, Teruaki, Harada, Yoshikatsu, Otani, Shinichirou, Yamaoka, Hiroyuki
• Primary Examiner(s): Chaney; Carol
• Assistant Examiner(s): Gugliotta; Nicole T
• Application Number:
  US11/584,637
• Publication Number:
  US 20070059560A1
• Time in Patent Office: 855 Days
• Field of Search: 428/701, 427/314, 427/331, 427/372.2, 427/376.2, 427/397.7, 427/397.8, 427/226
• US Class Current: 427/376.3
• CPC Class Codes: C23C 26/00 Coating not provided for in groups C23C2/00 - C23C24/00

Abstract

The present invention is characterized in that a base material is coated with a ceramic thin film comprising a composite phase composed of a first phase mainly formed of a silicon ceramic component and a second phase mainly formed of a ceramic component other than the silicon ceramic component of the first phase, in which the amount of fine crystal particles of at least one ceramic component that constitutes the second phase slopingly increases toward a surface layer. According to the present invention, there are provided a ceramic thin film coating material having a slope constitution, which not only has an excellent function such as a photocatalyst function, an electrical function, a thermal catalyst function or a catalyst-supporting function or environment resistance such as oxidation resistance, alkaline resistance or wear resistance but also has excellent dynamic properties, and a process for the production thereof.

Claims

1. A process for producing ceramic thin film coating material having a slope constitution, which comprises

a base material and

a ceramic thin film comprising a composite phase composed of a first phase mainly formed of a silicon ceramic component and a second phase mainly formed of a ceramic component other than the silicon ceramic component of the first phase, in which the amount of fine crystal particles of at least one ceramic component that constitutes the second phase slopingly increases toward a surface layer,

the base material being coated with the ceramic thin film,

which process comprises

coating a base material with a) a modified organosilicon polymer having a structure obtained by modifying an organosilicon polymer with an organometallic compound, b) a mixture of an organosilicon polymer with an organometallic compound, or c) a mixture of said modified organosilicon polymer with an organometallic compound,

carrying out a predetermined heat treatment, and

calcining the resultant base material at a temperature in the range of from 1200 to 1,800°

C. in an oxidizing atmosphere, an inert atmosphere or a nitrogen-containing atmosphere.

2. The process for producing a ceramic thin film coating material according to claim 1, wherein the amount of the first phase is from 99 to 40% by weight and the amount of the second phase is 1 to 60% by weight.

3. The process for producing a ceramic thin film coating material according to claim 1, wherein the amount of the fine crystal particles of the at least one ceramic component that constitutes the second phase slopingly increases from a depth of from 5 to 500 nm to the surface of the ceramic thin film.

4. The process for producing a ceramic thin film coating material according to claim 1, wherein the fine crystal particles of the at least one ceramic component that constitutes the second phase have a particle diameter of 50 nm or less.

5. The process for producing a ceramic thin film coating material according to claim 1, wherein the ceramic component that constitutes the second phase is at least one member selected from the group consisting of oxides, nitrides and carbides.

6. The process for producing a ceramic thin film coating material according to claim 1, wherein the ceramic component that constitutes the second phase is at least one member selected from the group consisting of TiO₂, ZrO₂, Al₂O₃, TiN and TiC.

7. The process for producing a ceramic thin film coating material according to claim 6, wherein the ceramic component that constitutes the second phase is titania and its crystal particle diameter is 15 nm or less.

8. The process for producing a ceramic thin film coating material according to claim 7, wherein the crystal form of titania is anatase.

9. The process for producing a ceramic thin film coating material according to claim 1, wherein the silicon ceramic component is at least one member selected from the group consisting of SiO₂, SiC and Si₃N₄.

10. The process for producing a ceramic thin film coating material according to claim 1, wherein the ceramic thin film has a photocatalyst function and/or a thermal catalyst function.

11. The process for producing a ceramic thin film coating material according to claim 1, wherein the base material is a glass or a ceramic.

12. The process according to claim 1, wherein the organometallic compound is a compound having a basic structure of the formula M(OR′

)n, wherein M is a metal element, R′

is an alkyl group having 1 to 20 carbon atoms or a phenyl group and n is an integer of more than 1, or the formula MR″

m, wherein M is a metal element, R″

is acetylacetonate and m is an integer of more than 1.