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Apparatus for determining a temperature of a substrate and methods therefor

  • US 7,497,614 B2
  • Filed: 07/27/2007
  • Issued: 03/03/2009
  • Est. Priority Date: 09/22/2005
  • Status: Expired due to Fees
First Claim
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1. In a plasma processing system, an apparatus for measuring a temperature of a substrate, the apparatus comprising:

  • a phosphor material in direct contact with said substrate and in thermal contact with said substrate, said phosphor material producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, said fluorescent response decaying at a decay rate that is related to a temperature of said phosphor material;

    a barrier window positioned between said phosphor material and a plasma, wherein said barrier window allows at least a portion of said first wavelength and said second wavelength to be transmitted; and

    a gasket configured to surround said phosphor material,wherein said phosphor material, said barrier window, and said gasket are disposed inside a notch, said notch disposed on a surface of said substrate.

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