Apparatus for determining a temperature of a substrate and methods therefor
First Claim
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1. In a plasma processing system, an apparatus for measuring a temperature of a substrate, the apparatus comprising:
- a phosphor material in direct contact with said substrate and in thermal contact with said substrate, said phosphor material producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, said fluorescent response decaying at a decay rate that is related to a temperature of said phosphor material;
a barrier window positioned between said phosphor material and a plasma, wherein said barrier window allows at least a portion of said first wavelength and said second wavelength to be transmitted; and
a gasket configured to surround said phosphor material,wherein said phosphor material, said barrier window, and said gasket are disposed inside a notch, said notch disposed on a surface of said substrate.
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Abstract
An apparatus for measuring a temperature of a substrate is disclosed. The apparatus includes a phosphor material in direct contact with the substrate and in thermal contact with the substrate, the phosphor material producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, the fluorescent response decaying at a decay rate that is related to a temperature of the phosphor material, and the phosphor material producing a first set of non volatile byproducts when expose to a plasma.
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Citations
25 Claims
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1. In a plasma processing system, an apparatus for measuring a temperature of a substrate, the apparatus comprising:
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a phosphor material in direct contact with said substrate and in thermal contact with said substrate, said phosphor material producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, said fluorescent response decaying at a decay rate that is related to a temperature of said phosphor material; a barrier window positioned between said phosphor material and a plasma, wherein said barrier window allows at least a portion of said first wavelength and said second wavelength to be transmitted; and a gasket configured to surround said phosphor material, wherein said phosphor material, said barrier window, and said gasket are disposed inside a notch, said notch disposed on a surface of said substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. In a plasma processing system, an apparatus of measuring a temperature of a substrate, the apparatus comprising:
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a phosphor material configured for producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, said fluorescent response decaying at a decay rate that is related to a temperature of said phosphor material; a barrier window positioned between said phosphor material and a plasma, wherein said barrier window allows at least a portion of said first wavelength and said second wavelength to be transmitted; means of determining said temperature from said decay rate of said fluorescent response when said electromagnetic radiation is transmitted to said phosphor material through said barrier window; and a gasket configured to surround said phosphor material, wherein said phosphor material, said barrier window, and said gasket are disposed inside a notch, said notch disposed on a surface of said substrate. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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17. In a plasma processing system, a method for measuring a temperature of a substrate, comprising:
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thermally coupling a phosphor material to said substrate, said phosphor material producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, said fluorescent response decaying at a decay rate that is related to a temperature of said phosphor material; providing a gasket, said gasket configured to surround said phosphor material; positioning a barrier window between said phosphor material and a plasma, wherein said barrier window allows at least a portion of said first wavelength and said second wavelength to be transmitted; disposing said phosphor material, said gasket, and barrier in a notch, said notch disposed on a surface of said substrate; and determining said temperature from said decay rate of said fluorescent response when said electromagnetic radiation is transmitted to said phosphor material through said barrier window. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25)
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Specification