Substrates coated with a polycrystalline functional coating

• US 7,498,058 B2
• Filed: 12/20/2004
• Issued: 03/03/2009
• Est. Priority Date: 12/20/2004
• Status: Expired due to Fees

• Current Assignee: PPG Industries Ohio Incorporated (Nouryon BV)
• Original Assignee: PPG Industries Ohio Incorporated (Nouryon BV)
• Inventors: Walck, Scott D., Harris, Caroline S.
• Primary Examiner(s): Meeks; Timothy H
• Assistant Examiner(s): Burkhart; Elizabeth A
• Application Number:
  US11/017,329
• Publication Number:
  US 20060134322A1
• Time in Patent Office: 1,534 Days
• Field of Search: 427/161, 427/248.1, 427/255.11, 427/255.19
• US Class Current: 427/255.19
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 2217/71 Photocatalytic coatings
• CPC Class Codes: C23C 14/024 Deposition of sublayers, e.g. to promote adhesion of the coating C23C14/027 takes precedence
• CPC Class Codes: C23C 14/083 of refractory metals or yttrium
• CPC Class Codes: C23C 16/0272 Deposition of sub-layers, e.g. to promote the adhesion of the main coating
• CPC Class Codes: C23C 16/405 of refractory metals or yttrium

Abstract

A method for forming a coated substrate is disclosed. The method includes depositing an undercoating layer on a substrate; and depositing a functional coating on the undercoating layer, the functional coating comprising at least one material that can be present in at least two crystal structures, wherein the at least two crystal structures are present at and exposed surface of the functional coating, wherein the undercoating layer comprises at least two different materials wherein a first material at the exposed surface provides a first surface area and a second different material at the exposed surface provides a second surface area.

Claims

1. A method for forming a coated substrate in a float glass process, comprising:

providing a glass substrate on a molten tin bath;

depositing an undercoating layer on the substrate in the molten tin bath by CVD or spray pyrolisis, the undercoating layer comprising;

tin oxide doped with phosphorous ;

selectively adjusting a density of crystalline tin oxide at an interface surface of the undercoating layer to form crystalline tin oxide regions and amorphous regions; and

depositing a photocatalytic functional coating comprising titania on the interface surface of the undercoating layer in a single coating step such that rutile titania forms over the crystalline tin oxide regions layer and anatase titania forms over the amorphous regions,

wherein selectively adjusting the density of crystalline tin oxide at the interface surface selectively adjusts the ratio of rutile titania to anatase titania in the functional coating, and

wherein the density of the crystalline tin oxide at the interface surface is adjusted by varying the amount of the phosphorous.

2. The method of claim 1, wherein, the deposited undercoating layer has a thickness of at least 10 nm.

3. The method of claim 1, wherein the deposited functional coating has a thickness ranging from 100 Å

to 2500 Å

.

4. A method for forming a coated substrate in a float glass process, comprising:

providing a glass substrate on a molten tin bath;

depositing an undercoating layer on the substrate in the molten tin bath by CVD or spray pyrolisis, the undercoating layer comprising tin oxide and a dopant;

selectively adjusting a density of crystalline tin oxide at an interface surface of the undercoating layer to form crystalline tin oxide regions and amorphous regions; and

depositing a photocatalytic functional coating comprising titania on the interface surface of the undercoating layer in a single coating step such that rutile titania forms over the crystalline tin oxide regions layer and anatase titania forms over the amorphous regions,

wherein selectively adjusting the density of crystalline tin oxide at the interface surface selectively adjusts the ratio of rutile titania to anatase titania in the functional coating, and

wherein the density of the crystalline tin oxide at the interface surface is adjusted by varying the amount of the dopant.