Apparatus and method for cleaning glass substrates using a cool hydrogen flame

• US 7,504,267 B2
• Filed: 11/20/2002
• Issued: 03/17/2009
• Est. Priority Date: 11/21/2001
• Status: Expired due to Fees

• Current Assignee: Agency For Science Technology and Research (Government of Singapore)
• Original Assignee: Agency For Science Technology and Research (Government of Singapore)
• Inventors: Liang, David Tee, Lim, Tuti Mariana, Chen, Sau Ngen
• Primary Examiner(s): Estrada; Michelle
• Assistant Examiner(s): Stark; Jarrett J
• Application Number:
  US10/495,973
• Publication Number:
  US 20060005857A1
• Time in Patent Office: 2,309 Days
• Field of Search: 438/4, 438/906, 422/38, 257/E21.226
• US Class Current: 438/4
• CPC Class Codes: B08B 7/0071 by heating B08B7/0035 takes precedence
• CPC Class Codes: C03B 29/025 Glass sheets
• CPC Class Codes: C03C 23/0075 Cleaning of glass specially adapted to plate glass B08B11/00
• CPC Class Codes: H01L 21/02046 Dry cleaning only H01L21/02085 takes precedence
• CPC Class Codes: H01L 21/02054 combining dry and wet cleaning steps H01L21/02085 takes precedence
• CPC Class Codes: H01L 21/67028 for cleaning followed by drying, rinsing, stripping, blasting or the like
• CPC Class Codes: Y10S 438/906 Cleaning of wafer as interim step

Abstract

Contaminants from surfaces of temperature sensitive substrates, such as glass substrates are removed by exposing the surfaces to a hydrogen Surface-mixed diffusion flame for a predetermined duration of time. The predetermined duration of time being insufficient to heat up the surfaces substantially thereby causing damage to the temperature sensitive substrates.

Claims

1. A method for removing contaminants from surfaces of temperature sensitive substrates, said method comprising the steps:

producing a hydrogen diffusion flame by burning hydrogen and oxygen at an interface formed by an envelope of oxygen surrounding the hydrogen, wherein the hydrogen and oxygen are not pre-mixed before being ignited;

spraying a fine mist of hydrogen peroxide towards said hydrogen diffusion flame and said temperature sensitive substrates; and

exposing said hydrogen diffusion flame to said surfaces for a predetermined duration of time;

wherein;

said hydrogen diffusion flame generates radicals to react with said contaminants for removing said contaminants; and

said predetermined duration of time is insufficient to heat up said surfaces substantially, thereby not causing damage to said temperature sensitive substrates.

2. The method according to claim 1, wherein said method is performed in a vacuum environment.

3. The method according to claim 1, wherein said temperature sensitive substrate comprises one or more of the following:

glass substrates and semiconductor silicon-based substrates.

4. The method according to claim 1, said method further comprising:

directing ozone gas at said temperature sensitive substrate after said step of exposing said hydrogen diffusion flame to said surfaces for a predetermined duration of time.

5. The method according to claim 1, wherein the oxygen is at least 100% more than the hydrogen.

6. A process for cleaning surfaces of a glass substrate, said process comprising the steps:

washing said glass substrate with de-ionized water;

drying said glass substrate;

producing a hydrogen diffusion fame by burning hydrogen and oxygen at an interface formed by an envelope of oxygen surrounding the hydrogen, wherein the hydrogen and oxygen are not pre-mixed before being ignited;

spraying a fine mist of hydrogen peroxide towards said hydrogen diffusion flame and said glass substrate; and

exposing said hydrogen diffusion flame to said surfaces for a predetermined duration of time;

wherein;

said hydrogen diffusion flame generates radicals to react with contaminants for removing said contaminants; and

said predetermined duration of time is insufficient to heat up said glass substrate substantially, thereby not causing damage to said glass substrate.

7. The process according to claim 6, wherein said glass substrate is for the manufacturing of Flat Panel Displays.

8. The process according to claim 6, wherein said step of exposing said hydrogen diffusion flame to said surfaces is carried out in a vacuum chamber.

9. The process according to claim 6, wherein the oxygen is at least 100% more than the hydrogen.

10. The process according to claim 6, wherein said step of washing said glass substrate with de-ionized water further comprises introducing ozone into said de-ionized water.

11. The process according to claim 6, said process further comprising:

directing ozone gas at said glass substrate after said step of exposing said hydrogen diffusion flame to said surfaces.