Light emitting diode having surface containing flat portion and plurality of bores
First Claim
1. A light emitting diode of the semiconductor lamination structure comprising at least:
- an n-type semiconducting layer,an active layer composed of 30 or less quantum well layers,a p-type semiconducting layer provided on a substrate, wherein the surface of said semiconductor lamination structure contains a flat portion and bores;
the in-plane coverage rate of said bores is 10% or more without exceeding 85%;
the opening of said bore has a diameter of 100 nm or more without exceeding 4000 nm;
the depth of said bore is smaller than the distance between said active layer and said flat portion; and
the density of said bores expressed in terms of number of bores is 8×
105 per/cm2 or more without exceeding 1.08×
1010 per/cm2, anda transparent conductive film covering a plurality of said bores.
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Accused Products
Abstract
A technique of ensuring compatibility between the method of improving the light extraction efficiency by roughening the surface of a LED structure, and the method of avoiding the adverse effect of a low-cost electrode pad ((1) forming a current distribution layer by a transparent conductive film made of metal or metal oxide, and (2) forming a flip chip structure). A light emitting diode has at least an n-type semiconducting layer, an active layer composed of 30 or less quantum well layers, and a p-type semiconducting layer provided on a substrate, wherein the surface of the semiconductor lamination structure contains a flat portion and a plurality of bores. In this case, the in-plane coverage rate ((the area of the bore opening/surface area) ×100) of the plurality of the bores is 10% or more without exceeding 85%; the opening of the bore has a diameter of 100 nm or more without exceeding 4000 nm; the depth of the bore is smaller than the distance between the active layer and the flat portion; and the density of the plurality of the bores expressed in terms of number of bores is 8 ×105 per/cm2 or more without exceeding 1.08×1010 per/cm2.
42 Citations
27 Claims
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1. A light emitting diode of the semiconductor lamination structure comprising at least:
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an n-type semiconducting layer, an active layer composed of 30 or less quantum well layers, a p-type semiconducting layer provided on a substrate, wherein the surface of said semiconductor lamination structure contains a flat portion and bores; the in-plane coverage rate of said bores is 10% or more without exceeding 85%; the opening of said bore has a diameter of 100 nm or more without exceeding 4000 nm; the depth of said bore is smaller than the distance between said active layer and said flat portion; and the density of said bores expressed in terms of number of bores is 8×
105 per/cm2 or more without exceeding 1.08×
1010 per/cm2, anda transparent conductive film covering a plurality of said bores. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A light emitting diode having a semiconductor lamination structure, comprising:
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a substrate; an n-type semiconducting layer provided on the substrate, wherein a surface of the n-type semiconducting layer opposite a surface adjacent the substrate contains a flat portion and bores; an active layer composed of 30 or less quantum well layers provided on at least a portion of the n-type semiconducting layer containing the bores, wherein a surface of the active layer opposite a surface adjacent the n-type semiconducting layer contains bores corresponding to the bores in the surface of the n-type semiconducting layer; a p-type semiconducting layer provided on the active layer, wherein a surface of the p-type semiconducting layer opposite a surface adjacent the active layer contains bores corresponding to the bores in the surface of the active layer and the n-type semiconducting layer, and wherein the bores in the surface of the p-type semiconducting layer have an in-plane coverage rate of 10% or more without exceeding 85%, the opening of each bore has a diameter of 100 nm or more without exceeding 4000 nm, the depth of each bore is 100 nm or more and smaller than the distance between the active layer and the flat portion, and the density of the bores expressed in terms of number of bores is 8×
105 per/cm2 or more without exceeding 1.08×
1010 per/cm2; anda transparent conductive film covering a plurality of the bores. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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Specification