Device manufacturing method and device

• US 7,507,675 B2
• Filed: 06/24/2004
• Issued: 03/24/2009
• Est. Priority Date: 06/25/2003
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV), Wageningen University
• Original Assignee: ASML Netherlands BV (ASML Holding NV), Wageningen University
• Inventors: Zuilhof, Johannes Teunis, Sun, Qiao-Yu, Sudholter, Ernst Jan Robert, Simon, Klaus
• Primary Examiner(s): Nguyen; Ha Tran T
• Assistant Examiner(s): LEBENTRITT, MICHAEL
• Application Number:
  US10/562,212
• Publication Number:
  US 20070178707A1
• Time in Patent Office: 1,734 Days
• Field of Search: 438/471, 438/472
• US Class Current: 438/758
• CPC Class Codes: G01N 27/4145 specially adapted for biomolecules, e.g. gate electrode with immobilised receptors
• CPC Class Codes: G01N 33/5438 Electrodes
• CPC Class Codes: Y10S 977/809 Organic film on silicon

Abstract

A method for patterning a polished silicon surface is disclosed, the method including steps leading to an organic monolayer on at least a part of the silicon surface, the monolayer being functionalized in specific desired locations. The method can be used to produce a device comprising one or more FET structures, the gate of the FET being formed by the functionalized organic monolayer. The functionalized monolayer preferably contains oligosaccharides or oligopeptides which are capable of interacting with biological substance, such that the device acts as a bio-sensor.

Claims

1. A device manufacturing method comprising:

(a) providing a polished silicon substrate having a background portion and one or more target portions, said background and target portions having Si—

H bonds on the surface;

(b) irradiating said one or more target portions using a patterned beam of radiation and in the presence of oxygen to provide a layer of silicon oxide on said target portion(s);

(c) reacting at least a part of said background portion with a first composition comprising one or more compounds selected from 1-alkenes and 1-alkynes;

(d) removing said layer of silicon oxide from said target portion(s);

(e) reacting one or more target portions with a further composition comprising one or more compounds selected from 1-alkenes and 1-alkynes, to covalently attach said one or more compounds to said target portion(s).

2. A method according to claim 1, wherein reacting one or more target portions comprises irradiating said one or more target portions in the presence of the further composition, using a patterned beam of radiation.

3. A method according to claim 1, further comprising repeating the reacting of one or more target portions one or more times, each repetition being carried out at one or more different target portions and in the presence of a further composition comprising one or more compounds selected from 1-alkenes and 1-alkynes, each further composition being the same or different.

7. A method according to claim 1, wherein one or more of the target portions has in its surface a part of a transistor structure.

8. A method according to claim 7, wherein said silicon substrate comprises 10 or more target portions, each having a part of a transistor structure in its surface.

9. A method according to claim 1, wherein said first composition comprises one or more compounds of formula (I) or (IA):

10. A method according to claim 1, wherein the further composition comprises one or more compounds of formula (II) or (IIA):

11. A method according to claim 10, wherein R″

represents an oligosaccharide or an oligopeptide which is capable of interacting with a chemical or biological substance.

12. A method according to claim 11, wherein said further composition comprises a compound of formula (IIIA) or (IIIB):

13. A device obtained or obtainable by the method of claim 1.

4. A device manufacturing method comprising:

(a1) providing a polished silicon substrate having a background portion and one or more target portions, said background and target portions having Si—

H bonds on the surface;

(b1) reacting one or more target portions with a composition comprising one or more compounds selected from 1-alkenes and 1-alkynes, to covalently attach said one or more compounds to said target portion(s); and

(c1) subsequent to reacting the one or more target portions, reacting at least a part of said background portion with a first composition comprising one or more compounds selected from 1-alkenes and 1-alkynes.

5. A method according to claim 4, wherein reacting one or more target portions comprises irradiating said one or more target portions in the presence of the composition, using a patterned beam of radiation.

6. A method according to claim 4, further comprising repeating the reacting of one or more target portions one or more times, each repetition being carried out at one or more different target portions and in the presence of the composition or a further composition, the further composition comprising one or more compounds selected from 1-alkenes and 1-alkynes, each further composition being the same or different.