Lithographic apparatus, device manufacturing method, and device manufactured thereby

• US 7,508,487 B2
• Filed: 11/24/2003
• Issued: 03/24/2009
• Est. Priority Date: 06/01/2000
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Mulkens, Johannes Catharinus Hubertus, Mulder, Heine Melle, Van Der Veen, Paul, Van Schaik, Willem, Moors, Johannes Hubertus Josephina, Banine, Vadim Yevgenyevich, Bakker, Levinus Pieter
• Primary Examiner(s): Kim; Peter B
• Application Number:
  US10/719,065
• Publication Number:
  US 20040160583A1
• Time in Patent Office: 1,947 Days
• Field of Search: 355/30, 355/53, 355/55, 355/67, 355/77, 250/492.2, 250/492.22, 250/548, 430/311, 430/312
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70558 Dose control, i.e. achievement of a desired dose
• CPC Class Codes: G03F 7/70883 of optical system
• CPC Class Codes: G03F 7/70933 Purge, e.g. exchanging fluid or gas to remove pollutants
• CPC Class Codes: G03F 7/70941 Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss

Abstract

In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses and the radiation may be used to measure the energy of the radiation with minimal disruption to the radiation.

Claims

1. A lithographic projection apparatus for imaging a pattern onto a substrate that is at least partially covered by a layer of radiation-sensitive material, the apparatus comprising:

a radiation system configured to provide a beam of radiation;

a support configured to support a patterning structure, the patterning structure configured to produce a desired pattern in the beam of radiation;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam of radiation onto a target portion of the substrate; and

a radiation absorber comprising a gas supply configured to supply an absorbent gas at a controlled concentration to at least one enclosure traversed by the beam of radiation, the absorbent gas serving to absorb radiation energy delivered by the beam of radiation to the substrate during exposure of the radiation-sensitive material to the patterned beam of radiation,

wherein the radiation absorber is configured to have a gas concentration in a path of the beam of radiation that is controllably non-uniform in an unobstructed plane perpendicular to an optical axis of the radiation system, or the projection system, or both the radiation system and the projection system, and

wherein the beam of radiation traverses through a top surface and a bottom surface of the at least one enclosure, the top and bottom surfaces substantially parallel to each other, while avoiding interaction with an optical element between the top and bottom surfaces of the at least one enclosure.

2. An apparatus according to claim 1, wherein the radiation absorber is configured and arranged to adjust at least one of:

radiation power emitted by a radiation source configured to supply radiation to the radiation system;

a uniformity of energy of the beam of radiation perpendicular to an optical axis of the apparatus;

a radiation energy of pulses of radiation emitted by the radiation source;

a duration of an exposure of a target portion; and

an angular distribution of the radiation energy delivered by the beam of radiation.

3. An apparatus according to claim 1, wherein the radiation absorber is located proximate to at least one of:

a pupil plane of the projection system;

a plane of the patterning structure;

a plane of the substrate;

a conjugate plane of the pupil plane;

a conjugate plane of the patterning structure plane; and

a conjugate plane of the substrate plane.

4. An apparatus according to claim 1, wherein the enclosure is substantially transparent to the beam of radiation in a direction parallel to its direction of propagation.

5. An apparatus according to claim 4, wherein the enclosure further comprises a first aperture configured to allow the beam of radiation to enter the enclosure, and a second aperture configured to allow the beam of radiation to exit the enclosure.

6. An apparatus according to claim 1, wherein the beam of radiation has a focal point and the absorption of the beam by the absorbent gas is located at the focal point.

7. An apparatus according to claim 1, wherein, in use, an optical path of the beam of radiation is substantially evacuated.

8. An apparatus according to claim 1, wherein the radiation system is configured to provide radiation comprising a wavelength in the range of 5 nm to 20 nm.

9. An apparatus according to claim 1, wherein the radiation absorber further comprises a gas extractor configured to extract the absorbent gas from the enclosure.

10. An apparatus according to claim 1, wherein, in use, a speed at which the absorbent gas enters the enclosure is approximately greater than the speed of sound in the absorbent gas.

11. An apparatus according to claim 1, wherein, in use, a speed at which the absorbent gas enters the enclosure is approximately ten times the speed of sound in the absorbent gas.

12. An apparatus according to claim 1, wherein the gas supply is configured to supply the absorbent gas mixed at a controlled concentration with a purge gas.

13. An apparatus according to claim 1, wherein the radiation system is configured to provide radiation comprising a wavelength less than 365 nm.

14. An apparatus according to claim 1, wherein the radiation absorber is arranged to have a gas concentration that is substantially symmetric about the optical axis.

15. An apparatus according to claim 1, wherein the at least one enclosure comprises at least one of a pupil plane of the projection system and a conjugate plane of the pupil plane.

16. An apparatus according to claim 1, wherein the radiation absorber is arranged to have a gas concentration that is controllably variable in a direction perpendicular to a scanning direction in which the substrate table is moved during a scanning exposure.

17. An apparatus according to claim 16, wherein the radiation absorber is located proximate to at least one of:

a plane of the patterning structure;

a plane of the substrate;

a conjugate plane of the patterning structure plane; and

a conjugate plane of the substrate plane.

18. An apparatus according to claim 1, wherein a mean free path of the absorbent gas within the at least one enclosure is in the range of 1 mm to 10 cm.

19. An apparatus according to claim 1, wherein the radiation absorber further comprises a controller configured to control at least one physical property of the absorbent gas.

20. An apparatus according to claim 19, wherein the physical property of the absorbent gas is at least one of:

an absorbent gas pressure;

a path length of the beam of radiation through the absorbent gas; and

a composition of the absorbent gas.

21. An apparatus according to claim 1, wherein the radiation absorber comprises a plurality of gas supplies configured to supply a plurality of different absorbent gases at controlled concentrations to the at least one enclosure.

22. An apparatus according to claim 1, wherein the absorbent gas comprises at least one of:

oxygen (O);

nitrogen (N);

helium (He);

neon (Ne);

argon (Ar);

krypton (Kr);

xenon (Xe);

water (H₂0);

a hydrocarbon; and

a compound or mixture of any combination of the foregoing.

23. A device manufacturing method, comprising:

projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material at least partially covering a substrate;

controlling an energy of the patterned beam, or a duration of exposure of the radiation-sensitive material to the patterned beam, or both the energy and the duration, such that a desired dose of radiation is delivered to the substrate; and

supplying an absorbent gas according to a concentration profile to an enclosure traversed by the beam of radiation to effect a desired attenuation of the patterned beam, the absorbent gas absorbing a wavelength of the radiation, the concentration varying across at least part of an unobstructed space traversed by the beam in a direction substantially perpendicular to a direction of the beam,

wherein the beam of radiation traverses through a top surface and a bottom surface of the enclosure, the top and bottom surfaces substantially parallel to each other, while avoiding interaction with an optical element between the top and bottom surfaces of the enclosure.

24. A device manufacturing method, comprising:

projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material at least partially covering a substrate;

controlling an energy profile of the patterned beam of radiation, such that a desired radiation uniformity is delivered to the substrate during an exposure; and

supplying an absorbent gas according to a concentration profile to an enclosure traversed by the beam of radiation to effect a desired non-uniform attenuation of the patterned beam, the absorbent gas absorbing a wavelength of the radiation, the concentration varying across at least part of an unobstructed space traversed by the beam in a direction substantially perpendicular to a direction of the beam,

wherein the beam of radiation traverses through a top surface and a bottom surface of the enclosure, the top and bottom surfaces substantially parallel to each other, while avoiding interaction with an optical element between the top and bottom surfaces of the enclosure.

25. A lithographic projection apparatus for imaging a pattern onto a substrate that is at least partially covered by a layer of radiation-sensitive material, the apparatus comprising:

a radiation system configured to provide a beam of radiation;

a support configured to support a patterning structure, the patterning structure configured to produce a desired pattern in the beam of radiation;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam of radiation onto a target portion of the substrate; and

an enclosure having a top surface and a bottom surface, the beam of radiation traversing through the top and bottom surfaces of the enclosure, and having a radiation-energy detector configured to determine the energy of the beam of radiation, the beam of radiation passing at least partly through a region of interactive gas,

wherein the detector comprises a sensor located within the enclosure and configured to output a signal that represents an interaction of the beam of radiation with the region of gas, and to measure, out of a path of the beam of radiation, particles scattered from the path of the beam of radiation due to the interaction to determine the amount of interaction of the beam of radiation with the region of gas.

26. An apparatus according to claim 25, wherein the radiation-energy detector is located proximate to at least one of:

a pupil plane of the projection system;

a plane of the patterning structure;

a plane of the substrate;

a conjugate plane of the pupil plane;

a conjugate plane of the patterning structure plane; and

a conjugate plane of the substrate plane.

27. An apparatus according to claim 25, wherein the radiation-energy detector further comprises a gas supply configured to supply the interactive gas at a controlled concentration to the enclosure traversed by the beam of radiation.

28. An apparatus according to claim 27, wherein the gas supply is configured to supply the interactive gas mixed at a controlled concentration with a purge gas.

29. An apparatus according to claim 27, wherein the radiation-energy detector further comprises a gas extractor to extract the interactive gas from the enclosure.

30. An apparatus according to claim 27, wherein, in use, a speed at which the interactive gas enters the enclosure is approximately greater than the speed of sound in the absorbent gas.

31. An apparatus according to claim 27, wherein, in use, a speed at which the interactive gas enters the enclosure is approximately ten times the speed of sound in the absorbent gas.

32. An apparatus according to claim 25, wherein the radiation system is configured to provide radiation comprising a wavelength less than 365 nm.

33. An apparatus according to claim 25, wherein the enclosure at least partially surrounds the region of interactive gas and is substantially transparent to the beam of radiation in a direction parallel to its direction of propagation.

34. An apparatus according to claim 33, wherein the enclosure further comprises a first aperture configured to allow the beam of radiation to enter the enclosure, and a second aperture configured to allow the beam to exit the enclosure.

35. apparatus according to claim 25, wherein, in use, the beam of radiation has a focal point and the interaction of the beam of radiation with the region of interactive gas is substantially located at the focal point.

36. An apparatus according to claim 25, wherein, in use, the optical path of the beam of radiation is substantially evacuated.

37. An apparatus according to claim 25, wherein the radiation system is configured to provide radiation comprising a wavelength in the range of 5 nm to 20 nm.

38. An apparatus according to claim 25, wherein the interactive gas comprises at least one of:

oxygen (O);

nitrogen (N);

helium (He);

neon (Ne);

argon (Ar);

krypto;

(Kr);

xenon (Xe);

water (H₂O);

a hydrocarbon; and

a compound or mixture of any combination of the foregoing.

39. An apparatus according to claim 25, wherein the radiation-energy detector is configured to measure the interaction of the beam of radiation with the region of gas at a plurality of points along a plane perpendicular to an optical axis of the radiation system, or the projection system, or both the radiation system and the projection system.

40. An apparatus according to claim 25, wherein the radiation-energy detector is located proximate to at least one of a pupil plane of the projection system and a conjugate plane of the pupil plane.

41. An apparatus according to claim 25, wherein the radiation-energy detector is configured to measure the interaction of the beam with the region of gas at a plurality of points in a direction perpendicular to a scanning direction in which the substrate table is moved during a scanning exposure.

42. An apparatus according to claim 25, wherein the radiation-energy detector is located proximate to at least one of:

a plane of the patterning structure;

a plane of the substrate;

a conjugate plane of the patterning structure plane; and

a conjugate plane of the substrate plane.

43. An apparatus according to claim 25, wherein the sensor is sensitive to a range of electromagnetic radiation including:

visible light;

ultra violet (UV) light; and

infra red (IR) light.

44. An apparatus according to claim 25, wherein the sensor is sensitive to a type of charged particle including:

positive ions;

negative ions; and

electrons.

45. An apparatus according to claim 44, wherein the sensor further comprises an electrode configured to be charged at a potential, which is opposite in sign to the type of charged particle.

46. An apparatus according to claim 25, wherein the radiation-energy detector further comprises a controller configured to receive the output signal, the controller in response to the output signal being configured to control at least one physical property of the interactive gas.

47. An apparatus according to claim 46, wherein the physical property of the interactive gas is at least one of:

an interactive gas pressure;

a path length of the beam through the interactive gas; and

a composition of the interactive gas.

48. An apparatus according to claim 25, wherein the radiation-energy detector further comprises a plurality of gas supplies configured to supply a plurality of different interactive gases at controlled concentrations to an enclosure traversed by the beam.

49. A device manufacturing method, comprising:

projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material at least partially covering a substrate;

controlling an energy of the patterned beam of radiation, or a duration of exposure of the radiation-sensitive material to the patterned beam of radiation, or both the energy and the duration, such that a desired dose of radiation is delivered to the substrate during an exposure;

directing the patterned beam of radiation through an enclosure having a top and bottom surface, wherein the beam of radiation traverses through the top and bottom surfaces of the enclosure; and

determining, with a sensor located within the enclosure, the energy of the radiation by supplying an interactive gas according to a concentration profile to the enclosure traversed by the radiation beam of radiation; and

measuring, with the sensor located within the enclosure, particles scattered from a path of the beam of radiation due to the interaction of the beam of radiation with the interactive gas to determine the amount of interaction of the beam of radiation with the interactive gas, wherein results of the measurement are used to control the energy and/or the duration.

50. A device manufacturing method, comprising:

projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material at least partially covering a substrate;

controlling an energy profile of the patterned beam, such that a desired radiation uniformity is delivered to the substrate during an exposure;

directing the patterned beam of radiation through an enclosure having a top and bottom surface, wherein the beam of radiation traverses through the top and bottom surfaces of the enclosure; and

determining, with a sensor located within the enclosure, the energy profile of the radiation by supplying an interactive gas to the enclosure traversed by the radiation; and

measuring, with the sensor located within the enclosure, particles scattered out of a path of radiation due to interaction of the radiation with the interactive gas to determine the amount of interaction of the radiation with the interactive gas at a plurality of points, wherein results of the measurement are used to control the energy profile of the patterned beam.

51. A lithographic projection apparatus for imaging a pattern onto substrate that is at least partially covered by a layer of radiation-sensitive material, the apparatus comprising:

a radiation system configured to provide a beam of radiation;

a support configured to support a patterning structure, the patterning structure configured to produce a desired pattern in the beam of radiation;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam of radiation onto a target portion of the substrate; and

an enclosure having a top surface and a bottom surface, the beam of radiation traversing through the top and bottom surfaces of the enclosure, wherein the enclosure comprises;

a radiation absorber comprising a gas supply configured to supply an absorbent gas al a controlled concentration to an enclosure traversed by the beam of radiation, the absorbent gas serving to absorb radiation energy delivered by the beam of radiation to the substrate during exposure of the radiation-sensitive material; and

a radiation-energy sensor located within the enclosure, the sensor, in operation, providing an output signal that represents an interaction of the beam with the absorbent gas and measuring, out of a path of the beam of radiation, particles scattered from the path of the beam of radiation due to the interaction to determine the amount of interaction of the beam of radiation with the absorbent gas.

52. An apparatus according to claim 51, further comprising a controller configured to receive the output signal, the controller in response to the output signal being arranged to control at least one physical property of the absorbent gas.

53. A device manufacturing method, comprising:

projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material at least partially covering a substrate;

controlling the energy profile of the patterned beam, such that a desired radiation uniformity is delivered to the substrate during an exposure;

directing the patterned beam of radiation through an enclosure having a top and bottom surface, wherein the beam of radiation traverses through the top and bottom surfaces of the enclosure;

supplying an absorbent gas according to a concentration profile to the enclosure traversed by the beam of radiation to effect a desired non-uniform attenuation of the patterned beam of radiation, the absorbent gas absorbing a wavelength of the radiation; and

determining, with a sensor located within the enclosure, the energy profile of the radiation by measuring, out of a path of the beam of radiation, particles scattered from the path of the beam of radiation due to the interaction of the radiation with the absorbent gas to determine an amount of interaction of the radiation with the absorbent gas at a plurality of points, wherein results of the measurement are used to control the energy profile control of the patterned beam.

54. A device manufacturing method, comprising:

projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material at least partially covering a substrate;

controlling an energy of the patterned beam, or a duration of exposure of the radiation-sensitive material to the patterned beam, or both the energy and the duration, such that a desired dose of radiation is delivered to the substrate during an exposure;

directing the patterned beam of radiation through an enclosure having a top and bottom surface, wherein the beam of radiation traverses through the top and bottom surfaces of the enclosure;

supplying an absorbent gas according to a concentration profile to the enclosure traversed by the beam of radiation to effect a desired attenuation of the patterned beam of radiation, the absorbent gas absorbing the radiation wavelength; and

determining, with a sensor located within the enclosure, the energy of the radiation by measuring, out of a path of the beam of radiation, particles scattered from the path of the beam due to the interaction of the radiation with the absorbent gas to determine an amount of interaction of the radiation with the absorbent gas, wherein results of the measurement are used to control the energy and/or the duration.

55. A lithographic projection apparatus for imaging a pattern onto a substrate that is at least partially covered by a layer of radiation-sensitive material, the apparatus comprising:

a radiation system configured to provide a beam of radiation;

a support configured to support a patterning structure, the patterning structure configured to produce a desired pattern in the beam of radiation;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam of radiation onto a target portion of the substrate;

a concentration controlled enclosure of radiation absorbent gas, with a top surface and a bottom surface substantially parallel to each other, positioned to be traversed by the beam of radiation during exposure of the radiation-sensitive material, wherein the beam of radiation traverses through the top and bottom surfaces of the concentration controlled enclosure while avoiding interaction with an optical element between the top and bottom surfaces of the concentration controlled enclosure; and

a plurality of gas supplies configured to supply a plurality of different absorbent gasses at controlled concentrations to the enclosure.