Exposure apparatus and device manufacturing method
First Claim
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1. An exposure apparatus that exposes a substrate by projecting a pattern image onto the substrate via a liquid, the exposure apparatus comprising:
- a projection optical system that projects the pattern image onto the substrate via the liquid in a space, the projection optical system including an optical member that comes into contact with the liquid in the space;
an object disposed adjacent to the optical member of the projection optical system; and
a gap formed between a surface of the optical member of the projection optical system and a surface of the object, the gap being in fluidic communication with the space,wherein at least a portion of at least one of the surface of the optical member and the surface of the object includes a liquid restricting portion that restricts the flow of liquid.
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Abstract
An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes: a liquid supply mechanism that has a supply port arranged to oppose a surface of the substrate; and a buffer space formed in a channel of the liquid supply mechanism; wherein the liquid is supplied to the supply port after reserving a prescribed amount or more of liquid in the buffer space.
114 Citations
66 Claims
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1. An exposure apparatus that exposes a substrate by projecting a pattern image onto the substrate via a liquid, the exposure apparatus comprising:
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a projection optical system that projects the pattern image onto the substrate via the liquid in a space, the projection optical system including an optical member that comes into contact with the liquid in the space; an object disposed adjacent to the optical member of the projection optical system; and a gap formed between a surface of the optical member of the projection optical system and a surface of the object, the gap being in fluidic communication with the space, wherein at least a portion of at least one of the surface of the optical member and the surface of the object includes a liquid restricting portion that restricts the flow of liquid. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45)
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46. An exposure apparatus that exposes a substrate by projecting a pattern image onto the substrate via a liquid, the exposure apparatus comprising:
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a projection optical system that projects the pattern image onto the substrate via the liquid in a space, the projection optical system including an optical member that comes into contact with the liquid in the space; an object disposed adjacent to the optical member of the projection optical system; and a gap formed between a surface of the optical member of the projection optical system and a surface of the object, the gap being in fluidic communication with the space, wherein at least a portion of at least one of the surface of the optical member and the surface of the object includes a liquid repellent surface that restricts the flow of liquid. - View Dependent Claims (47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66)
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Specification