Lithographically fabricated holographic optical identification element

• US 7,508,608 B2
• Filed: 11/17/2005
• Issued: 03/24/2009
• Est. Priority Date: 11/17/2004
• Status: Active Grant

• Current Assignee: Illumina Incorporated
• Original Assignee: Illumina Incorporated
• Inventors: Kersey, Alan D., Putnam, Martin A., Moon, John A.
• Primary Examiner(s): LAVARIAS, ARNEL C
• Application Number:
  US11/283,518
• Publication Number:
  US 20060132877A1
• Time in Patent Office: 1,223 Days
• Field of Search: 359/900, 438/32
• US Class Current: 430/2
• CPC Class Codes: G02B 5/1857 using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
• CPC Class Codes: G02B 5/203 having holographic or diffractive elements diffraction gratings per se G02B5/18; holographic elements per se G02B5/32; generating the spectrum using diffraction elements G01J3/18
• CPC Class Codes: G03F 7/001 Phase modulating patterns, e.g. refractive index patterns
• CPC Class Codes: G03H 1/18 Particular processing of hologram record carriers, e.g. for obtaining blazed holograms photographic processing in general G03C, G03D
• CPC Class Codes: G03H 1/182 Post-exposure processing, e.g. latensification
• CPC Class Codes: G03H 2230/10 Microhologram not registered to the substrate
• CPC Class Codes: Y10S 359/90 Methods
• CPC Class Codes: Y10T 428/2982 Particulate matter [e.g., sphere, flake, etc.]
• CPC Class Codes: Y10T 428/2991 Coated
• CPC Class Codes: Y10T 436/143333 Saccharide [e.g., DNA, etc.]

Abstract

A method for fabricating an optical identification element is provided, wherein a removable plate or substrate having photosensitive material fabricated thereon, one or more gratings are written on the photosensitive material, then lines are etched to create one or more separate optical identification elements. The one or more gratings may be written by exposing the photosensitive material to ultraviolet (UV) light. The lines may be etched to create the one or more separate optical identification elements by photolithography to define/create the same.

Claims

1. A method for fabricating an optical identification element comprising:

providing a removable substrate having photosensitive material fabricated thereon;

writing one or more gratings on the photosensitive material; and

etching lines into the removable substrate to create one or more optical identification elements.

2. A method according to claim 1, wherein the optical identification element has a planar shape.

3. A method according to claim 1, wherein the optical identification element includes a holographic optical identification element.

4. A method according to claim 1, wherein the optical identification element has an interference pattern reproduced from a pattern of interference produced by a split coherent beam of radiation.

5. A method according to claim 1, wherein the writing one or more gratings includes exposing the photosensitive material to ultraviolet (UV) light.

6. A method according to claim 1, wherein the etching lines includes using photolithography to create the one or more optical identification elements.

7. A method according to claim 1 further comprising removing the optical identification elements from the substrate.

8. A method according to claim 1, wherein the one or more gratings include a surface relief grating, a densification grating, cover slips, or borosilcate.

9. A method according to claim 1, wherein the substrate includes an optical material.

10. A method according to claim 1, wherein the method includes writing grating codes at multiple axes across each optical identification element, where a single axis reader picks up one code.

11. A method according to claim 1, wherein the method includes adding an orientation marker to the optical identification element.

12. A method according to claim 11, wherein the orientation marker includes one or more of the following:

a) magnetic material for self-alignment;

b) birefringence;

or c) fluorescence to determine alignment/orientation.

13. A method according to claim 1, wherein the method includes putting at least one bit in along different axes and using a spinning readout system.