Highly tunable low-impedance capacitive micromechanical resonators, oscillators, and processes relating thereto

• US 7,511,870 B2
• Filed: 10/15/2005
• Issued: 03/31/2009
• Est. Priority Date: 10/18/2004
• Status: Expired due to Fees

• Current Assignee: Georgia Tech Research Corporation (University System of Georgia)
• Original Assignee: Georgia Tech Research Corporation (University System of Georgia)
• Inventors: Sundaresan, Krishnakumar, Ayazi, Farrokh, Ho, Gavin Kar-Fai, Pourkamali, Siavash
• Primary Examiner(s): Mack; Ricky L
• Assistant Examiner(s): Tra; Tuyen Q
• Application Number:
  US11/251,197
• Publication Number:
  US 20060125576A1
• Time in Patent Office: 1,263 Days
• Field of Search: 735/040.3, 735/143.7, 735/143.8, 735/143.2, 738/625.9, 735/041.2, 735/041.4, 735/041.5, 731/05, 310/309, 310/321, 310/324, 310330-332, 310/366, 310/314, 310/317, 310/320, 310/353, 333/186, 333/197, 333/200, 331/108.C, 331/116.R, 331/158, 359/631, 359/290, 359/291
• US Class Current: 359/237
• CPC Class Codes: H03B 5/30 with frequency-determining element being electromechanical resonator
• CPC Class Codes: H03H 2009/02496 Horizontal, i.e. parallel to the substrate plane
• CPC Class Codes: H03H 9/02244 of microelectro-mechanical resonators
• CPC Class Codes: H03H 9/02338 Suspension means
• CPC Class Codes: H03H 9/2463 Clamped-clamped beam resonators
• CPC Class Codes: H03H 9/462 Microelectro-mechanical filters
• CPC Class Codes: H03H 9/505 for microelectro-mechanical filters

Abstract

Disclosed are capacitive micromechanical resonators optimized for high Q, low motional impedance, and large tuning range. Exemplary resonators were fabricated using a HARPSS-on-SOI process, and demonstrated quality factors up to 119000 in vacuum. For resonators operating between 3 MHz and 30 MHz, the lowest extracted impedance is 218 kΩ and the largest electrostatic tuning coefficient is −240 ppm/V². The disclosed designs are applicable up to at least 200 MHz operation. An oscillator interface circuit comprising of a trans-impedance amplifier and an automatic bias generator providing a temperature-compensating bias voltage is also disclosed. Experiments show temperature drift reduction from 2800 ppm to 39 ppm over a 100° C. range. Process compensation (DFM) of micromechanical resonators, resonators having mass loading elements that allow generation of closely spaced frequencies, and coupled systems comprising of the resonators are also described.

Claims

1. Apparatus, comprising:

a substrate; and

resonator apparatus comprising;

one or more anchors connected to the substrate;

at least one input/output electrode that is electrically insulated from the substrate; and

a resonator comprising an extensional member coupled to the anchor and separated from the substrate, and a flexural member connected to the extensional member that is separated from the substrate and separated from the electrode by a gap.

2. The apparatus recited in claim 1 wherein the resonator comprises a plurality of flexural members connected to the extensional member.

3. The apparatus recited in claim 2 further comprising:

a bias generator for generating a bias voltage coupled to a selected one of the one or more anchors; and

a trans-impedance amplifier coupled to the at least one electrode that selectively feeds back a voltage to at least one input/output electrode, or a selected one of the one or more anchors directly or through a buffer.

4. The apparatus recited in claim 3 wherein the bias generator comprises:

a voltage reference for generating a reference signal;

a proportional to absolute temperature reference for generating a proportional to absolute temperature reference signal;

an amplifier for amplifying the reference and proportional to absolute temperature reference signals; and

a generator for generating the bias voltage.

5. The apparatus recited in claim 2 wherein width and length dimensions of the flexural member and the extensional member are controlled such that the stiffness-to-mass ratio of the resonator is a constant.

6. The apparatus recited in claim 2 wherein multiple resonator apparatus are fabricated on a single substrate and wherein the flexural and extensional members dimensionally vary across the substrate and vary for different substrates, and wherein when resonating, the flexural and extensional members form a dynamic mass and have a dynamic stiffness, and wherein design dimensions of the flexural and extensional members are selected so that the ratio of the dynamic stiffness of the resonator apparatus to the dynamic mass of the resonator apparatus is substantially constant.

7. The apparatus recited in claim 2 which comprises a plurality of resonator apparatus disposed on the substrate, and wherein selected ones of the resonators further comprise one or more mass loading elements selectively disposed on the flexural and extensional members, and when each resonator apparatus is operative over a different predetermined frequency range which is a function of the mass and location of the one or more one or more mass loading elements.

8. The apparatus recited in claim 2 wherein the resonator apparatus further comprises:

at least one additional input/output electrode that is electrically insulated from the substrate, and is disposed on an opposite side of the flexural member from the at least one electrode, and is separated from the flexural member by a gap.

9. The apparatus recited in claim 2 which comprises an array of resonator apparatus disposed on the substrate that have nominally identical frequencies or closely spaced frequencies, and that are coupled together for form filter apparatus.

10. The apparatus recited in claim 1 wherein the resonator comprises a plurality of flexural members connected to a plurality of extensional members, and wherein the plurality of flexural members are separated from a plurality of input/output electrodes by respective gaps.

11. The apparatus recited in claim 10 further comprising:

a bias generator for generating a bias voltage coupled to a selected one of the one or more anchors; and

a trans-impedance amplifier coupled to the at least one electrode that selectively feeds back a voltage to the at least one input/output electrode, or a selected one of the one or more anchors directly or through a buffer.

12. The apparatus recited in claim 11 wherein the bias generator comprises:

a voltage reference for generating a reference signal;

a proportional to absolute temperature reference for generating a proportional to absolute temperature reference signal;

an amplifier for amplifying the reference and proportional to absolute temperature reference signals; and

a generator for generating the bias voltage.

13. The apparatus recited in claim 10 which comprises a plurality of resonator apparatus disposed on the substrate, and wherein selected ones of the resonators further comprise one or more mass loading elements selectively disposed on the flexural and extensional members, and when each resonator apparatus is operative over a different predetermined frequency range which is a function of the mass and location of the one or more one or more mass loading elements.

14. The apparatus recited in claim 1 further comprising:

a bias generator for generating a bias voltage coupled to a selected one of the one or more anchors; and

a trans-impedance amplifier coupled to the at least one electrode that selectively feeds back a voltage to at least one input/output electrode, or a selected one of the one or more anchors directly or through a buffer.

15. The apparatus recited in claim 14, further comprising:

a level control circuit for receiving a reference voltage and the voltage output from the buffer and for generating a gain control signal for setting the gain of the trans-impedance amplifier.

16. The apparatus recited in claim 14 wherein the bias generator comprises:

a voltage reference for generating a reference signal;

a proportional to absolute temperature reference for generating a proportional to absolute temperature reference signal;

an amplifier for amplifying the reference and proportional to absolute temperature reference signals; and

a generator for generating the bias voltage.

17. Apparatus comprising:

a substrate;

a plurality of anchors connected to the substrate;

a plurality of input/output electrodes that is electrically insulated from the substrate; and

a resonator comprising an extensional member coupled to the anchor and separated from the substrate, and a plurality of flexural members connected to distal ends of the extensional member that are separated from the substrate and separated from the electrodes by a gap;

a bias generator for generating a bias voltage coupled to a selected one of the anchors; and

a trans-impedance amplifier coupled to a selected electrode that selectively feeds back a voltage to at least one input/output electrode, or a selected one of the one or more anchors directly or through a buffer.

18. The apparatus recited in claim 17 wherein the bias generator comprises:

a voltage reference for generating a reference signal;

a proportional to absolute temperature reference for generating a proportional to absolute temperature reference signal;

an amplifier for amplifying the reference and proportional to absolute temperature reference signals; and

a generator for generating the bias voltage.

19. The apparatus recited in claim 17 wherein a tuning voltage is input to the bias generator for tuning the frequency of oscillation of the apparatus.

20. Apparatus comprising:

a substrate;

a plurality of resonator apparatus disposed on the substrate that each comprise;

a plurality of anchors connected to the substrate;

a plurality of input/output electrodes that is electrically insulated from the substrate; and

a resonator comprising an extensional member coupled to the anchor and separated from the substrate, and a plurality of flexural members connected to distal ends of the extensional member that are separated from the substrate and separated from the electrodes by a gap;

and wherein selected ones of the resonators further comprise one or more mass loading elements selectively disposed on the flexural and extensional members, and when each resonator apparatus is operative over a different predetermined frequency range which is a function of the mass and location of the one or more one or more mass loading elements.

21. Apparatus comprising:

a substrate;

a plurality of resonator apparatus disposed on the substrate that each comprise;

a plurality of anchors connected to the substrate;

a plurality of input/output electrodes that is electrically insulated from the substrate;

a resonator comprising an extensional member coupled to the anchor and separated from the substrate, and a plurality of flexural members connected to distal ends of the extensional member that are separated from the substrate and separated from the electrodes by a gap; and

coupling apparatus for coupling the plurality of resonator apparatus together to provide a coupled resonator response.