Sensor substrate and method of fabricating same
First Claim
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1. A method of forming an hermetically sealed substrate comprising:
- obtaining a substrate material;
forming a via from a first side of the substrate to a second side of the substrate;
filling the via with a conductive material such that an hermetic seal forms between the first side of the substrate and the second side of the substrate to form a filled via; and
depositing a pillar on top of the filled via,wherein depositing a pillar on top of the filled via comprises;
depositing a metal on at least one of the substrate and the filled via;
coating the substrate with a ceramic; and
removing the metal after the substrate has been coated with the ceramic.
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Abstract
A substrate with hermetically sealed vias extending from one side of the substrate to another and a method for fabricating same. The vias may be filled with a conductive material such as, for example, a fritless ink. The conductive path formed by the conductive material aids in sealing one side of the substrate from another. One side of the substrate may include a sensing element and another side of the substrate may include sensing electronics.
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Citations
15 Claims
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1. A method of forming an hermetically sealed substrate comprising:
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obtaining a substrate material; forming a via from a first side of the substrate to a second side of the substrate; filling the via with a conductive material such that an hermetic seal forms between the first side of the substrate and the second side of the substrate to form a filled via; and depositing a pillar on top of the filled via, wherein depositing a pillar on top of the filled via comprises; depositing a metal on at least one of the substrate and the filled via; coating the substrate with a ceramic; and removing the metal after the substrate has been coated with the ceramic. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 12, 13, 14, 15)
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11. A method of forming an hermetically sealed substrate comprising:
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obtaining a substrate material; forming a via from a first side of the substrate to a second side of the substrate; filling the via with a conductive material such that an hermetic seal forms between the first side of the substrate and the second side of the substrate to form a filled via; and covering the filled via with a nonconductive cap, wherein covering the filled via is done using an ion beam assist deposition process.
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Specification