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Dual work function metal gate structure and related method of manufacture

  • US 7,514,310 B2
  • Filed: 07/29/2005
  • Issued: 04/07/2009
  • Est. Priority Date: 12/01/2004
  • Status: Active Grant
First Claim
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1. A method, comprising:

  • forming a metal layer having a first work function;

    adjusting the work function of a selected portion of the metal layer by doping the selected portion with fluorine (F), such that the work function of the selected portion of the metal layer is reduced to a second work function less than the first work function as a function of the doping with fluorine.

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