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Reactive deposition for electrochemical cell production

  • US 7,521,097 B2
  • Filed: 05/27/2004
  • Issued: 04/21/2009
  • Est. Priority Date: 06/06/2003
  • Status: Expired due to Fees
First Claim
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1. A method for forming an electrochemical cell, the method comprising performing the sequential reactive deposition of an elemental metal or metal alloy, and a metalloid oxide, wherein the reactive deposition comprises moving a substrate or platen relative to a product flow for at least a portion of the time period when deposition is being performed and wherein the sequential reactive depositions are performed with respect to a single reaction zone, wherein a reactant flow intersects with a light beam to drive a reaction that forms the product flow and wherein the reactant flow is generated from an inlet nozzle.

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