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Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination

  • US 7,522,258 B2
  • Filed: 06/29/2005
  • Issued: 04/21/2009
  • Est. Priority Date: 06/29/2005
  • Status: Expired due to Fees
First Claim
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1. A lithographic apparatus comprising:

  • a substrate table that supports a substrate;

    a substrate handler that moves the substrate relative to the substrate table, the substrate handler being adapted to load substrates to be exposed on to and unload substrates that have been exposed from the substrate table before and after an exposure, respectively, anda clean gas supply system that supplies a clean gas by filtering a fluctuating air volume caused due to a movement of the substrate handler carrying the substrates to at least one location at which a substrate is located during the exposure, wherein the clean gas supply system is moveably mounted.

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