Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound

• US 7,524,610 B2
• Filed: 06/26/2007
• Issued: 04/28/2009
• Est. Priority Date: 11/30/2006
• Status: Expired due to Fees

• Current Assignee: Korea Advanced Institute of Science and Technology, Samsung Electronics Co. Ltd.
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: Kim, Su-min, Kim, Jin-baek, Kim, Kyu-sik, Park, Ji-young, Ha, Young-ung, Park, Byung-ha
• Primary Examiner(s): Lee; Sin J.
• Application Number:
  US11/768,632
• Publication Number:
  US 20080131787A1
• Time in Patent Office: 672 Days
• Field of Search: None
• US Class Current: 430/270.1
• CPC Class Codes: C07D 305/06 with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
• CPC Class Codes: C08L 61/06 of aldehydes with phenols
• CPC Class Codes: G03F 7/038 Macromolecular compounds which are rendered insoluble or differentially wettable G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021
• CPC Class Codes: Y10S 430/115 Cationic or anionic

Abstract

An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization products of the oxetane-containing compound.

Claims

1. An oxetane-containing compound represented by Formula 2:

2. The oxetane-containing compound of claim 1, wherein the oxetane group is represented by Formula 3:

3. The oxetane-containing compound of claim 2, wherein R₁ is a hydrogen atom or a substituted or unsubstituted C₁-C₁₀ alkyl group.

4. The oxetane-containing compound of claim 1, wherein Q₃, Q₄, Q₅, Q₆, Q₇, and Q₈ are each independently one of hydrogen atom, a hydroxyl group, a C₁-C₃₀ alkoxy group substituted with an oxetane group represented by Formula 3 or a carbonyl group, a C₁-C₃₀ alkyl group substituted with an oxetane group represented by Formula 3 or a carbonyl group, and an ether bond-containing monovalent group substituted with an oxetane group represented by Formula 3 or a hydroxyl group:

5. The oxetane-containing compound of claim 1, wherein Q₃, Q₄, Q₅, Q₆, Q₇, and Q₈ are each independently one of a hydrogen atom and a structure among the structures represented by Formula 4:

6. The oxetane-containing compound of claim 1, wherein L₂, and L₃ are each independently at least one structure among the structures represented by Formula 5:

7. The oxetane-containing compound of claim 1, wherein the oxetane-containing compound is represented by Formula 7, and m is 0, 1, or 2:

8. A photoresist composition, comprising:

an oxetane-containing compound according to claim 1;

a photo initiator; and

a solvent.

9. The photoresist composition of claim 8, wherein the photo initiator is at least one of an onium salt of a Group 15 element, an onium salt of a Group 16 element, and an aromatic halonium salt.

10. The photoresist composition of claim 8, wherein an amount of the photo initiator is in the range of about 5-20 parts by weight based on 100 parts by weight of the oxetane-containing compound.

11. The photoresist composition of claim 8, wherein the solvent is at least one of γ

-butyrolactone, cyclopentanone, C₁-C₆ acetate, tetrahydrofuran, and xylene.

12. The photoresist composition of claim 8, wherein the amount of the solvent is in the range of about 30-100 parts by weight based on 100 parts by weight of the oxetane-containing compound.

13. The photoresist composition of claim 8, further comprising:

additives,

wherein the additives are at least one of silane coupling agents, dyestuffs, surfactants, fillers and viscosity modifiers.

14. A method of preparing a pattern, the method comprising:

coating a photoresist composition having an oxetane-containing compound of claim 8 on a substrate; and

exposing the coated photoresist composition to light according to a specific pattern and developing the resultant to obtain a structure having the pattern.

15. The method of claim 14, wherein the structure comprises polymerization products of an oxetane-containing compound represented by Formula 2:

16. The method of claim 14, wherein the structure is a chamber layer of an inkjet print head.

17. The method of claim 14, wherein the structure is a nozzle layer of an inkjet print head.

18. The method of claim 14, wherein the structure is a sacrificial layer that is required to manufacture a Micro Electro Mechanical System (MEMS) switch.

19. An inkjet print head comprising:

a substrate through which an ink feed hole to supply ink is formed;

a chamber layer comprising a plurality of ink chambers filled with ink supplied from the ink feed hole; and

a nozzle layer comprising a plurality of nozzles through which the ink is ejected,

wherein at least one of the chamber layer and the nozzle layer comprises polymerization products of an oxetane-containing compound according to claim 1.

20. The inkjet print head of claim 19, further comprising a plurality of heaters to heat ink in the ink chambers and generate bubbles, and an electrode to apply current to the heaters.