Method of making prestructure for MEMS systems
First Claim
1. A method of forming an interferometric display element, comprising:
- providing a substrate;
depositing a layer of support post material over the substrate;
patterning the layer of support post material to form at least two support posts;
depositing an electrode layer over the substrate, wherein the depositing of the electrode layer is performed after the forming of the at least two support posts, and wherein at least a first portion of the electrode layer is located between the at least two support posts;
forming at least a first sacrificial layer over at least the first portion of the electrode layer;
forming a mechanical layer over the sacrificial layer, wherein the mechanical layer covers a portion of each of the at least two support posts; and
removing at least a portion of the first sacrificial layer after formation of the mechanical layer, wherein removal of at least a portion of the first sacrificial layer allows a portion of the mechanical layer extending between the at least two support posts to be displaced with respect to the first portion of the electrode layer.
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Accused Products
Abstract
A method of making an interferometric modulator element includes forming at least two posts, such as posts formed from spin-on glass, on a substrate. In alternate embodiments, the posts may be formed after certain layers of the modulator element have been deposited on the substrate. An interferometric modulator element includes at least two spin-on glass support posts located on the substrate. In alternate embodiments, the support posts may be located over certain layers of the modulator element, rather than on the substrate. A method of making an interferometric modulator element includes forming a rigid cap over a support post. An interferometric modulator element includes support posts having rigid cap members.
510 Citations
18 Claims
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1. A method of forming an interferometric display element, comprising:
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providing a substrate; depositing a layer of support post material over the substrate; patterning the layer of support post material to form at least two support posts; depositing an electrode layer over the substrate, wherein the depositing of the electrode layer is performed after the forming of the at least two support posts, and wherein at least a first portion of the electrode layer is located between the at least two support posts; forming at least a first sacrificial layer over at least the first portion of the electrode layer; forming a mechanical layer over the sacrificial layer, wherein the mechanical layer covers a portion of each of the at least two support posts; and removing at least a portion of the first sacrificial layer after formation of the mechanical layer, wherein removal of at least a portion of the first sacrificial layer allows a portion of the mechanical layer extending between the at least two support posts to be displaced with respect to the first portion of the electrode layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of forming a micromechanical system (MEMS) element, comprising:
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forming at least two support posts located over a substrate; depositing an electrode layer over the substrate after the formation of the support posts, wherein at least a portion of the electrode layer is located over a support post of the at least two support posts; forming at least a first sacrificial layer over the electrode layer; removing the portion of the electrode layer; forming a movable layer extending over the at least two support posts and the first sacrificial layer, wherein forming the movable layer is performed after removing the portion of the electrode layer; and removing the first sacrificial layer after forming the movable layer. - View Dependent Claims (15, 16, 17, 18)
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Specification