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Optical system with nanoscale projection antireflection layer/embossing

  • US 7,529,026 B2
  • Filed: 04/28/2005
  • Issued: 05/05/2009
  • Est. Priority Date: 04/28/2005
  • Status: Expired due to Fees
First Claim
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1. An optical system having a radiation transparent member, comprising:

  • a light source that produces a beam of light;

    a device for selectively modifying the beam of light, the device including the radiation transparent member and a reflective member which are arranged to be movable with respect to one another; and

    an anti-reflective embossment embossed into at least one surface of the radiation transparent member, the embossment comprising spaced structures configured to permit incident radiation to pass through the embossment and the radiation transparent member, and to, at least, attenuate reflection of the incident radiation off the embossment, the structures being maximally spaced from one another by a subwavelength of the incident radiation.

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