Optical system with nanoscale projection antireflection layer/embossing
First Claim
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1. An optical system having a radiation transparent member, comprising:
- a light source that produces a beam of light;
a device for selectively modifying the beam of light, the device including the radiation transparent member and a reflective member which are arranged to be movable with respect to one another; and
an anti-reflective embossment embossed into at least one surface of the radiation transparent member, the embossment comprising spaced structures configured to permit incident radiation to pass through the embossment and the radiation transparent member, and to, at least, attenuate reflection of the incident radiation off the embossment, the structures being maximally spaced from one another by a subwavelength of the incident radiation.
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Abstract
An optical system having a radiation transparent member and an anti-reflective embossment embossed into at least one surface of the transparent member. The embossment has spaced structures configured to permit incident radiation to pass through the embossment and the radiation transparent member, and to, at least, attenuate reflection of the incident radiation off the embossment. The structures are maximally spaced from one another by a subwavelength of the incident radiation.
25 Citations
24 Claims
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1. An optical system having a radiation transparent member, comprising:
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a light source that produces a beam of light; a device for selectively modifying the beam of light, the device including the radiation transparent member and a reflective member which are arranged to be movable with respect to one another; and an anti-reflective embossment embossed into at least one surface of the radiation transparent member, the embossment comprising spaced structures configured to permit incident radiation to pass through the embossment and the radiation transparent member, and to, at least, attenuate reflection of the incident radiation off the embossment, the structures being maximally spaced from one another by a subwavelength of the incident radiation. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. An embossed anti-reflection surface in an image projection arrangement comprising:
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a plurality of projections formed in a surface of a radiation transparent member through which radiation, having a wavelength range, passes to an image formation device, peaks of the projections being separated by distances which are less than any wavelength in a wavelength range of radiation; wherein the image formation device comprises a matrix of elements which modify the incident radiation; wherein the matrix of elements each comprise the radiation transparent member and a radiation reflective member which are arranged to be movable with respect one another. - View Dependent Claims (20, 21)
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22. An embossed anti reflection surface in an image projection arrangement comprising:
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a plurality of nano-scale projections formed in a surface of a transparent member which forms part of each of a matrix of light modifying elements that form an image formation device; wherein the matrix of light modifying elements modify the incident radiation; wherein the matrix of light modifying elements each comprise a radiation transparent member and a radiation reflective member which are arranged to be movable with respect one another.
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23. An image formation device, comprising:
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means for transmitting light, the means for transmitting having a surface; means for attenuating reflection from the surface using essentially conical/frustoconical-shaped nanostructures which have peaks that are spaced by a distance less than any wavelength in a wavelength range of white light; means for reflecting light, the means for reflecting light having a radiation transparent member and a reflective member which are arranged to be movable with respect one another.
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24. An image formation device, comprising:
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a plurality of transparent members arranged in a predetermined spatial relationship; and an anti-reflective embossment formed in a surface of at least two of the plurality of transparent members, the anti-reflective embossment comprising essentially conical/frustoconical-shaped nanostructures which have peaks that are spaced by a distance less than a wavelength in a wavelength range of visible white light; wherein at least one of the plurality of transparent members and a reflective member are arranged to be movable with respect to one another.
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Specification