Transparent electrode

• US 7,531,239 B2
• Filed: 04/04/2006
• Issued: 05/12/2009
• Est. Priority Date: 04/06/2005
• Status: Active Grant

• Current Assignee: Eclipse Energy Systems Inc.
• Original Assignee: Eclipse Energy Systems Inc.
• Inventors: Demiryont, Hulya
• Primary Examiner(s): XU, LING X
• Application Number:
  US11/278,643
• Publication Number:
  US 20060228564A1
• Time in Patent Office: 1,134 Days
• Field of Search: None
• US Class Current: 428/445
• CPC Class Codes: B32B 17/06 comprising glass as the main or only constituent of a layer, next to another layer of a specific material
• CPC Class Codes: C03C 17/36 at least one coating being a metal
• CPC Class Codes: C03C 17/3618 Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
• CPC Class Codes: C03C 17/3644 the metal being silver
• CPC Class Codes: C03C 17/3655 the multilayer coating containing at least one conducting layer
• CPC Class Codes: C03C 17/3671 specially adapted for use as electrodes
• CPC Class Codes: C03C 17/3694 one layer having a composition gradient through its thickness
• CPC Class Codes: C03C 17/40 all coatings being metal coatings
• CPC Class Codes: C03C 2217/94 Transparent conductive oxide layers [TCO] being part of a multilayer coating
• CPC Class Codes: G02F 1/13439 characterised by their electrical, optical, physical properties; materials therefor; method of making
• CPC Class Codes: H01L 31/022466 made of transparent conductive layers, e.g. TCO, ITO layers
• CPC Class Codes: H01L 31/022475 composed of indium tin oxide [ITO]
• CPC Class Codes: Y10T 428/265 1 mil or less
• CPC Class Codes: Y10T 428/31659 With cellulosic layer

Abstract

An electrically conductive multilayer thin film structure and composition is transparent in both the visible and infrared portions of the spectrum. This multilayer film is readily deposited on a variety of substrates, including plastics, and survives such in service conditions as flexing, vibration, thermal cycling, thermal shock, ultraviolet exposure, and high humidity. The preferred films are also compatible with conventional photolithography processes.

Claims

1. A multilayer electrically conducting thin film having an optical-transparency of at least 50% for at least a selected band of wavelengths between 400 nm and 25 microns, the multilayer film comprising:

an adhesion-enhancing optical-matching layer deposited directly on a supporting surface and having a thickness of not more than 60 nm;

a metallic conduction layer deposited directly on the adhesion-enhancing optical-matching layer and having a thickness of at least three and not more than 60 nm; and

an anti-reflective overcoat layer comprising an oxide and deposited directly on the metallic conduction layer, the overcoat layer having a thickness of at least 3 and not more than 120 nm.

2. A multilayer electrically conducting thin film having an optical-transparency of at least 75% for at least a selected band of wavelengths between 400 nm and 25 microns and an electrical sheet resistance of no more than 5 Ohm/sq, the multilayer film comprising:

an adhesion-enhancing optical-matching layer deposited directly on a supporting surface;

a metallic conduction layer deposited directly on the adhesion-enhancing optical-matching layer; and

an anti-reflective overcoat layer comprising silicon and an oxide of silicon, the overcoat layer deposited directly on the metallic conduction layer, and wherein the oxidation level of silicon in the overcoat layer increases with distance from the metallic conduction layer.