Temperable high shading performance coatings
First Claim
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1. A method of producing coated substrates, the method comprising providing a pane having generally-opposed major surfaces and depositing upon one of said major surfaces a temperable high shading performance low-emissivity coating comprising, in sequence outwardly:
- (a) a first infrared-reflective film;
(b) a first high absorption blocker layer deposited directly over the first infrared-reflective film, the first high absorption blocker layer being deposited as essentially pure niobium;
(c) a middle coat comprising a first silicon nitride film deposited directly over the first high absorption blocker layer;
(d) a second infrared-reflective film;
(e) a second high absorption blocker layer deposited directly over the second infrared-reflective film, the second high absorption blocker layer being deposited as essentially pure niobium; and
(f) an outer coat comprising a second silicon nitride film deposited directly over the second high absorption blocker layer;
wherein the first and second high absorption blocker layers are deposited at a combined thickness of greater than 50 angstroms.
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Abstract
The invention provides temperable high shading performance low-emissivity coatings. The invention also provides insulating glass units, monolithic panes, and other substrates bearing such coatings. Further, the invention provides methods of producing coated substrates by depositing coatings of this nature.
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Citations
19 Claims
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1. A method of producing coated substrates, the method comprising providing a pane having generally-opposed major surfaces and depositing upon one of said major surfaces a temperable high shading performance low-emissivity coating comprising, in sequence outwardly:
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(a) a first infrared-reflective film; (b) a first high absorption blocker layer deposited directly over the first infrared-reflective film, the first high absorption blocker layer being deposited as essentially pure niobium; (c) a middle coat comprising a first silicon nitride film deposited directly over the first high absorption blocker layer; (d) a second infrared-reflective film; (e) a second high absorption blocker layer deposited directly over the second infrared-reflective film, the second high absorption blocker layer being deposited as essentially pure niobium; and (f) an outer coat comprising a second silicon nitride film deposited directly over the second high absorption blocker layer; wherein the first and second high absorption blocker layers are deposited at a combined thickness of greater than 50 angstroms. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of producing coated substrates, the method comprising providing a pane having generally-opposed major surfaces and depositing upon one of said major surfaces a temperable high shading performance low-emissivity coating comprising, in sequence outwardly:
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(a) a first infrared-reflective film; (b) a first high absorption blocker layer deposited directly over the first infrared-reflective film, the first high absorption blocker layer being deposited as essentially pure niobium; (c) a middle coat comprising a depositing a plurality of alternating films of transparent dielectric nitride and transparent dielectric oxide, wherein a first of said transparent dielectric nitride is deposited directly over the first high absorption blocker layer; (d) a second infrared-reflective film; (e) a second high absorption blocker layer deposited directly over the second infrared-reflective film, the second high absorption blocker layer being deposited as essentially pure niobium; and (f) an outer coat comprising a transparent dielectric nitride film deposited directly over the second high absorption blocker layer; wherein the first and second high absorption blocker layers are deposited at a combined thickness of greater than 50 angstroms. - View Dependent Claims (13, 14, 15, 16, 17, 18)
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19. A method of producing coated substrates, the method comprising providing a pane having generally-opposed major surfaces and depositing upon one of said major surfaces a temperable high shading performance low-emissivity coating comprising, in sequence outwardly:
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(a) a first infrared-reflective film; (b) a first high absorption blocker layer deposited directly over the first infrared-reflective film, the first high absorption blocker layer being deposited as essentially pure niobium; (c) a middle coat comprising the following sequence of intermediate films, moving outwardly;
a transparent dielectric nitride film, a transparent dielectric oxide film, a transparent dielectric nitride film, and a transparent dielectric oxide film(d) a second infrared-reflective film; (e) a second high absorption blocker layer deposited directly over the second infrared-reflective film, the second high absorption blocker layer being deposited as essentially pure niobium; and (f) an outer coat comprising a transparent dielectric nitride film deposited directly over the second high absorption blocker layer; wherein the first and second high absorption blocker layers are deposited at a combined thickness of greater than 50 angstroms.
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Specification