System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode
First Claim
1. A method, comprising:
- receiving a data set based on a field distribution in a pupil plane of a projection system, the field distribution corresponding to an image;
modifying the data set to result in a modified data set that represents a desired field distribution in the pupil plane of the projection system, the desired field distribution corresponding to the image having desired characteristics;
setting states of pixels located on a dynamic pattern generator according to the modified data set;
patterning a beam of radiation with the dynamic pattern generator; and
projecting the patterned beam onto a target portion of a substrate.
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Accused Products
Abstract
A system and method for patterning a beam of radiation based on a pupil field distribution. In an embodiment, the distribution of the field in an area of the pupil plane affecting an image and an illumination mode are selected so as to render an image with desired characteristics. Additionally and/or alternatively, an illumination mode is selected so as to render an image with desired characteristics. The distribution of the field in an area of the pupil plane affecting an image is then realized using the spatial light modulator The system and method include using an illumination system, a pattern generator, and a projector. The illumination system supplies a beam of radiation. The pattern generator patterns the beam of radiation based on a data set corresponding to a field distribution in a pupil plane. The projector projects the patterned beam onto a target portion of an object.
25 Citations
20 Claims
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1. A method, comprising:
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receiving a data set based on a field distribution in a pupil plane of a projection system, the field distribution corresponding to an image; modifying the data set to result in a modified data set that represents a desired field distribution in the pupil plane of the projection system, the desired field distribution corresponding to the image having desired characteristics; setting states of pixels located on a dynamic pattern generator according to the modified data set; patterning a beam of radiation with the dynamic pattern generator; and projecting the patterned beam onto a target portion of a substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A system for patterning a beam of radiation, comprising:
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an illumination system configured to supply the beam of radiation; an image controller configured to receive a data set based on a field distribution in a pupil plane of a projection system and modify the data set to result in a modified data set that represents a desired field distribution in the pupil plane of the projection system, the desired field distribution corresponding to an image having desired characteristics; and a pattern generator configured to pattern the beam of radiation based on the modified data set; and a projector configured to project the patterned beam onto a target portion of a substrate. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
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Specification