Method and structure for implanting bonded substrates for electrical conductivity

• US 7,547,609 B2
• Filed: 11/15/2005
• Issued: 06/16/2009
• Est. Priority Date: 11/24/2004
• Status: Expired due to Fees

• Current Assignee: Silicon Genesis
• Original Assignee: Silicon Genesis
• Inventors: Henley, Francois J.
• Primary Examiner(s): Tran, Thien F
• Application Number:
  US11/280,016
• Publication Number:
  US 20060131687A1
• Time in Patent Office: 1,309 Days
• Field of Search: 438/406, 438/455, 438/459, 438/480, 438/514
• US Class Current: 438/406
• CPC Class Codes: H01L 21/26513 of electrically active species
• CPC Class Codes: H01L 21/2652 Through-implantation

Abstract

A process for forming multi-layered substrates, e.g., silicon on silicon. The process includes providing a first substrate, which has a thickness of material to be removed. The thickness of material to be removed includes a first face region. The process includes joining the first face region of the first substrate to a second face region of a second substrate to form an interface region between the first face region of the first substrate and the second face region of the second substrate. The process includes removing the thickness of material from the first substrate while maintaining attachment of the first face region of the first substrate to the second face region of the second substrate. The process implants particles through the interface region to form a region of the particles within the vicinity of the interface region to electrically couple the thickness of material to the second substrate. In a preferred embodiment, the particles are conductive or can also have other characteristics that facilitates electrical contact or coupling between the first face region and the second face region according to a specific embodiment.

Claims

1. A process for forming multi-layered substrates, the process comprising:

providing a first substrate, the first substrate comprising a thickness of material to be removed, the thickness of material to be removed comprising a first face region;

joining the first face region of the first substrate to a second face region of a second substrate to form an interface region between the first face region of the first substrate and the second face region of the second substrate;

removing the thickness of material from the first substrate while maintaining attachment of the first face region of the first substrate to the second face region of the second substrate; and

implanting particles through the interface region to form a region of the particles within the vicinity of the interface region to electrically couple the thickness of material to the second substrate.

2. The process of claim 1 wherein the particles comprise a conductive characteristic at the vicinity of the interface region.

3. The process of claim 1 wherein the particles comprise dopant particles.

4. The process of claim 3 wherein the dopant particles are selected from boron, arsenic, or phosphorus.

5. The process of claim 1 wherein the first substrate is a silicon wafer.

6. The process of claim 5 wherein the silicon wafer is characterized by a major crystallographic plane in the {100} plane.

7. The process of claim 5 wherein the silicon wafer is characterized by a major crystallographic plane in the {110} plane.

8. The process of claim 5 wherein the silicon wafer is characterized by a major crystallographic plane in the {111} plane.

9. The process of claim 1 wherein the region of the particles has a concentration of about 10¹⁸ particles/cm³ and greater.

10. The process of claim 1 wherein the joining comprises bonding the first face to the second face.

11. The process of claim 1 wherein the joining comprises plasma activated processing at least the first face or the second face.

12. The process of claim 1 wherein the joining comprises bonding the first face to the second face using an oxide material.

13. The process of claim 1 wherein the interface region is characterized by an insulating material.

14. The process of claim 1 wherein the region of particles changes the interface region from an insulating characteristic to a conductive characteristic.

15. The process of claim 1 wherein the implanting is provided using a high energy implanter.

16. The process of claim 1 wherein the interface region comprises a silicon dioxide material.

17. The process of claim 1 wherein the implanting forms a well region in the thickness of material and a portion of the second substrate.

18. The process of claim 1 further comprising forming a plurality of via structures through the interface region to electrically connect the thickness of material to a portion of the second substrate.

19. The process of claim 1 further comprising implanting second particles through the thickness of material to form a well region therein.

20. The process of claim 1 wherein the thickness of material is 8000 Angstroms and less.

21. The process of claim 1 further comprising thermally treating the region of the particles.

22. The process of claim 1 further comprising heat treating the interface region.

23. The process of claim 1 wherein the implanting of the particles is through the thickness of material and the first face and the second face.

24. The process of claim 1 wherein the particles are characterized by a conductive property to provide electrical connection between the thickness of material and a portion of the second substrate.

25. The process of claim 1 wherein the particles comprises a plurality of silicon ions or a plurality of germanium ions.