Elastomer bonding of large area sputtering target
First Claim
1. A method of bonding at least one sputtering target tile to a backing plate, comprising:
- providing an elastomeric adhesive layer between the at least one sputtering target tile and the backing plate;
providing at least one metal mesh within the elastomeric adhesive layer, wherein at least a portion of the at least one metal mesh contacts both the at least one sputtering target tile and the backing plate, and the at least a portion of the at least one metal mesh is made of metal wire with a diameter greater than 0.5 mm; and
curing the elastomeric adhesive layer between the at least one sputtering target tile and the backing plate by passing heated water through at least one heating channel in the backing plate.
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Accused Products
Abstract
Embodiments of the present invention generally relate to sputtering targets used in semiconductor manufacturing. In particular, the invention relates to bonding the sputtering target to a backing plate that supports the sputtering target in a deposition chamber. In one embodiment, a method of bonding at least one sputtering target tile to a backing plate comprises providing an elastomeric adhesive layer between the at least one sputtering target tile and the backing plate, and providing at least one metal mesh within the elastomeric adhesive layer, wherein at least a portion of the at least one metal mesh contacts both the at least one sputtering target tile and the backing plate, and the at least a portion of the at least one metal mesh is made of metal wire with diameter greater than 0.5 mm.
83 Citations
29 Claims
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1. A method of bonding at least one sputtering target tile to a backing plate, comprising:
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providing an elastomeric adhesive layer between the at least one sputtering target tile and the backing plate; providing at least one metal mesh within the elastomeric adhesive layer, wherein at least a portion of the at least one metal mesh contacts both the at least one sputtering target tile and the backing plate, and the at least a portion of the at least one metal mesh is made of metal wire with a diameter greater than 0.5 mm; and curing the elastomeric adhesive layer between the at least one sputtering target tile and the backing plate by passing heated water through at least one heating channel in the backing plate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of bonding at least one sputtering target tile to a backing plate, comprising:
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providing at least one elastomeric adhesive layer between the at least one sputtering target tile and the backing plate; providing at least one metal mesh within the at least one elastomeric adhesive layer, wherein at least a portion of the at least one metal mesh contacts both the at least one sputtering target tile and the backing plate and the total surface area of the openings of the at least one metal mesh is between about 40% to about 70% of the total bonding surface area of the at least one sputtering target tile; and
,curing the at least one elastomeric adhesive layer between the at least one sputtering target tile and the backing plate by passing heated water through at least one heating channel in the backing plate. - View Dependent Claims (13, 14, 15, 16, 17)
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18. A sputtering target assembly, comprising:
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at least one sputtering target tile; a backing plate for the at least one sputtering target tile, the backing plate having at least one heating channel; an elastomeric adhesive layer between the at least one sputtering target tile and the backing plate, wherein the elastomeric adhesive layer bonds the at least one sputtering target and the backing plate together; and at least one metal mesh within the elastomeric adhesive layer, wherein at least a portion of the at least one metal mesh contacts both the at least one sputtering target tile and the backing plate, and the at least a portion of the at least one metal mesh is made of metal wire with a diameter greater than 0.5 mm, wherein the elastomeric adhesive layer is cured by passing heated water through the at least one heating channel in the backing plate. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26, 27)
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28. A sputtering target assembly, comprising:
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at least one sputtering target tile; a backing plate for the at least one sputtering target tile, the backing plate having at least one heating channel; at least one elastomeric adhesive layer between the at least one sputtering target tile and the backing plate, wherein the at least one elastomeric adhesive layer bonds the at least one sputtering target and the backing plate together; and at least one metal mesh within the at least one elastomeric adhesive layer, wherein at least a portion of the at least one metal mesh contacts both the at least one sputtering target tile and the backing plate, and the total surface area of the openings of the at least one metal mesh is between about 40% to about 70% of the total bonding surface area of the at least one sputtering target tile, wherein the elastomeric adhesive layer is cured by passing heated water through the at least one heating channel in the backing plate. - View Dependent Claims (29)
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Specification