Method and apparatus for improved baffle plate
First Claim
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1. A method of fabricating a baffle plate assembly, surrounding a substrate holder in a plasma processing system comprising:
- providing a plate having a surface and a thickness;
forming a baffle plate blank from the plate by forming multiple variations in a direction perpendicular to the surface of the plate, the multiple variations having a depth in the direction perpendicular to the surface of the plate greater than the thickness of the plate; and
modifying in a single operation by planar material removal at least some of the multiple variations of said baffle plate blank to create one or more pumping passageways.
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Abstract
An apparatus related to plasma chambers used for processing semiconductor substrates and specifically to improvements in pumping baffle plates used in plasma sources. An apparatus and method for making a baffle plate assembly formed from a modified baffle plate blank wherein a variety of pumping features are formed in the baffle plate blank and opened in a planar material removal operation.
289 Citations
16 Claims
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1. A method of fabricating a baffle plate assembly, surrounding a substrate holder in a plasma processing system comprising:
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providing a plate having a surface and a thickness; forming a baffle plate blank from the plate by forming multiple variations in a direction perpendicular to the surface of the plate, the multiple variations having a depth in the direction perpendicular to the surface of the plate greater than the thickness of the plate; and modifying in a single operation by planar material removal at least some of the multiple variations of said baffle plate blank to create one or more pumping passageways. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification