Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic projection apparatus, comprising:
- a support configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate;
a base to which the support and the substrate table are mounted;
a reference frame compliantly mounted to the base;
a projection frame compliantly mounted to the reference frame, the mounting of the projection frame to the reference frame being between the projection frame and the reference frame, and wherein the projection system comprises at least one optical element mounted on the projection frame;
a second projection frame mounted to the reference frame; and
sensors mounted to the second projection frame configured to monitor positions of optical elements mounted to the projection frame.
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Abstract
A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
21 Citations
22 Claims
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1. A lithographic projection apparatus, comprising:
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a support configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a base to which the support and the substrate table are mounted; a reference frame compliantly mounted to the base; a projection frame compliantly mounted to the reference frame, the mounting of the projection frame to the reference frame being between the projection frame and the reference frame, and wherein the projection system comprises at least one optical element mounted on the projection frame; a second projection frame mounted to the reference frame; and sensors mounted to the second projection frame configured to monitor positions of optical elements mounted to the projection frame. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A device manufacturing method, comprising:
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providing a substrate that is at least partially covered by a layer of radiation-sensitive material; projecting a patterned beam of radiation onto a target portion of the layer of radiation-sensitive material using a projection system; supporting, on a base, a reference frame, a support configured to support a patterning device, and a substrate table configured to hold the substrate, wherein the reference frame is compliantly mounted to the base and the projection system is compliantly mounted to the reference frame, the mounting of the projection system to the reference frame being between the projection system and the reference frame, while projecting the patterned beam of radiation onto the target portion; and monitoring positions of optical elements mounted to a projection frame of the projection system using sensors mounted on a second projection frame mounted to the reference frame. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18)
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19. A lithographic projection apparatus, comprising:
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a support configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a base to which the support and the substrate table are mounted; a reference frame mounted to the base; a projection frame mounted to the reference frame, wherein the projection system comprises at least one optical element mounted on the projection frame; a sensor frame on which is mounted sensors configured to monitor positions of optical elements mounted to the projection frame; at least one first isolation mount operative between the reference frame and the base to inhibit vibrations or movements of a predetermined type from being transmitted from the base to the reference frame; and at least one second isolation mount operative between the reference frame and the sensor frame to inhibit vibrations or movements of a predetermined type from being transmitted from the reference frame to the sensor frame. - View Dependent Claims (20, 21)
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22. A lithographic projection apparatus, comprising:
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a support configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a base to which the support and the substrate table are mounted; a reference frame compliantly mounted to the base; a projection frame compliantly mounted to the reference frame on nodal axes of a dominant mode of bending vibration of the reference frame or a torsional vibration of the reference frame, the mounting of the projection frame to the reference frame being between the projection frame and the reference frame, and wherein the projection system comprises at least one optical element mounted on the projection frame.
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Specification