Method for manufacturing an array of interferometric modulators
First Claim
1. A method for manufacturing an array of interferometric modulators, each interferometric modulator comprising first and second optical layers which when the interferometric modulator is in an undriven state are spaced by a gap of one size, and when the interferometric modulator is in a driven state are spaced by a gap of another size, the size of the gap determining an optical response of the interferometric modulator, the method comprising:
- fabricating interferometric modulators of a plurality of types characterized by gap sizes between its first and second optical layers when in the undriven state;
wherein fabricating the interferometric modulators of the plurality of types comprises in sequence;
forming a sacrificial structure over a light-transmissive substrate, the sacrificial structure having different thicknesses in each of a plurality of regions, each of the thicknesses corresponding to a gap size between the first and second optical layers in the undriven state for reflecting a particular color, the sacrificial structure being formed of an opaque material;
forming vias through the sacrificial structure;
depositing a photosensitive material into the vias and over the sacrificial structure, the photosensitive material being negative acting;
exposing the photosensitive material to light passing through the substrate; and
developing the photosensitive material such that portions of the photosensitive material in the vias remain to form a plurality of supports of the array of interferometric modulators.
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Abstract
In one embodiment, the invention provides a method for manufacturing an array of interferometric modulators. Each interferometric modulator comprises first and second optical layers which when the interferometric modulator is in an undriven state are spaced by a gap of one size, and when the interferometric modulator is in a driven state are spaced by a gap of another size, the size of the gap determining an optical response of the interferometric modulator. The method comprises fabricating interferometric modulators of a first type characterized by the size of the gap between its first and second optical layers when in the undriven state; fabricating interferometric modulators of a second type characterized by the size of the gap between its first and second optical layers when in the undriven state; and fabricating modulators of a third type characterized by the size of the gap between its first and second optical layers when in the undriven state, wherein fabricating the interferometric modulators of the first, second, and third types comprises using a sequence of deposition and patterning steps of not more than 9 masking steps to deposit and pattern layers of material on a substrate.
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Citations
13 Claims
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1. A method for manufacturing an array of interferometric modulators, each interferometric modulator comprising first and second optical layers which when the interferometric modulator is in an undriven state are spaced by a gap of one size, and when the interferometric modulator is in a driven state are spaced by a gap of another size, the size of the gap determining an optical response of the interferometric modulator, the method comprising:
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fabricating interferometric modulators of a plurality of types characterized by gap sizes between its first and second optical layers when in the undriven state; wherein fabricating the interferometric modulators of the plurality of types comprises in sequence; forming a sacrificial structure over a light-transmissive substrate, the sacrificial structure having different thicknesses in each of a plurality of regions, each of the thicknesses corresponding to a gap size between the first and second optical layers in the undriven state for reflecting a particular color, the sacrificial structure being formed of an opaque material; forming vias through the sacrificial structure; depositing a photosensitive material into the vias and over the sacrificial structure, the photosensitive material being negative acting; exposing the photosensitive material to light passing through the substrate; and developing the photosensitive material such that portions of the photosensitive material in the vias remain to form a plurality of supports of the array of interferometric modulators. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method for manufacturing an array of interferometric modulators, each interferometric modulator comprising first and second optical layers which when the interferometric modulator is in an undriven state are spaced by a gap of one size, and when the interferometric modulator is in a driven state are spaced by a gap of another size, the size of the gap determining an optical response of the interferometric modulator, the method comprising fabricating interferometric modulators of one or more types characterized by one or more gap sizes between its first and second optical layers when in the undriven state;
wherein fabricating the interferometric modulators comprises; forming a first sacrificial structure over a light-transmissive substrate, the sacrificial structure being formed of an opaque material; forming one or more mirrors on the first sacrificial structure such that portions of the first sacrificial structure are exposed; forming a second sacrificial structure on the mirrors and on the exposed portions of the first sacrificial structure; forming first vias extending through the first and second sacrificial structures, and second vias extending through the second sacrificial structure to expose portions of the mirrors; depositing a photosensitive material into the first and second vias and on the second sacrificial structure, the photosensitive material being negative acting; exposing the photosensitive material to light passing through the substrate; and developing the photosensitive material after exposing the photosensitive material. - View Dependent Claims (12, 13)
Specification