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Lithographic apparatus and device manufacturing method

  • US 7,561,251 B2
  • Filed: 03/29/2004
  • Issued: 07/14/2009
  • Est. Priority Date: 03/29/2004
  • Status: Active Grant
First Claim
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1. A device manufacturing method, comprising:

  • emitting a beam of radiation using an illumination system;

    imparting to the beam a pattern in its cross section;

    projecting the patterned beam of radiation onto a target portion of a surface of a substrate;

    measuring a first respective temperature of a first plurality of regions in the target portion of the substrate;

    measuring a second respective temperature of a second plurality of regions in the target portion of the substrate;

    calculating a dimensional response from differences between measurements of the first and the second respective temperatures of the first and the second plurality of regions of the substrate; and

    concurrently adjusting, in real time, one or more spatial characteristics of the patterned beam relative to a substrate support to compensate for the calculated dimensional response, wherein the spatial characteristics comprise a cross-sectional shape of the patterned beam, a position of the patterned beam, and a size of the patterned beam.

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