Interferometric lithography system and method used to generate equal path lengths of interfering beams

• US 7,561,252 B2
• Filed: 12/29/2005
• Issued: 07/14/2009
• Est. Priority Date: 12/29/2005
• Status: Active Grant

• Current Assignee: ASML Holding NV, ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Holding NV, ASML Netherlands BV (ASML Holding NV)
• Inventors: Baselmans, Johannes Jacobus Matheus, Sewell, Harry
• Primary Examiner(s): Kim; Peter B
• Application Number:
  US11/320,473
• Publication Number:
  US 20070153250A1
• Time in Patent Office: 1,293 Days
• Field of Search: 355/69, 355/67, 355/53, 355/71, 355/55, 430/312, 430/316, 430/311, 353/122, 250/548
• US Class Current: 355/67
• CPC Class Codes: G03B 27/54 Lamp housings; Illuminating means
• CPC Class Codes: G03F 7/70408 Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect

Abstract

A system and method are provided for writing patterns onto substrates. First and second beams are directed to converge and substantially overlap in a common region on a substrate. This can be done so that the first and second beams are mutually temporally coherent and spatially coherent in the region of overlap to form interference fringes to define a writing image. A beam width of the first and second beams is adjusted. This can be done so that respective path lengths of the beams are matched when they reach the common region to ensure the first and second beams are mutually spatially coherent and temporally coherent across an entire width of the common region. In one example, the substrate is moved with respect to the writing image, while writing patterns onto the substrate. In another example, the substrate remains stationary.

Claims

1. A method to write patterns onto an exposure field on a substrate, comprising:

directing first and second temporally coherent and spatially coherent beams of radiation to substantially overlap in the exposure field on the substrate, such that the first and second beams form interference fringes;

adjusting a beam width of the first beam, such that respective path lengths of the beams are matched when they reach the exposure field to ensure the first and second beams are mutually spatially coherent and temporally coherent across a full width of the exposure field.

2. The method of claim 1, further comprising:

causing diffraction of a radiation beam to form the first and second beams.

3. The method of claim 1, further comprising:

relatively moving the substrate with respect to the exposure field while writing patterns onto the substrate.

4. The method of claim 1, further comprising reducing magnification by passing the first and second beams through respective first and second magnification reduction optical systems.

5. The method of claim 4, further comprising passing the first beam through a first convex lens and a first concave lens and passing the second beam through a second convex lens and a second concave lens.

6. The method of claim 4, further comprising passing the first beam through a first pair of cylindrical lenses and passing the second beam through a second pair of cylindrical lenses.

7. The method of claim 4, further comprising passing the first beam through a first pair of prisms and the second beam through a second pair of prisms.

8. The method of claim 4, further comprising passing the first beam through first and second optical elements and passing the second beam through third and fourth optical elements.

9. The method of claim 1, furthering comprising reducing, expanding or demagnifying the beam width to perform the adjusting.

10. The method of claim 1, further comprising:

measuring a contrast of the fringes across a region of overlap; and

adjusting magnification to maximize contrast across the region of overlap.

11. The method of claim 1, wherein the directing is performed using tiltable mirrors.

12. The method of claim 1, wherein the directing is performed using a spatial light modulator.

13. The method of claim 1, further comprising forming the first and second beams from a beam of radiation having a short temporal coherence length.

14. The method of claim 1, further comprising:

adjusting a beam width of the second beam, such that respective path lengths of the beams are matched when they reach the exposure field to ensure the first and second beams are mutually spatially coherent and temporally coherent across a full width of the exposure field.

15. A system for writing a pattern onto an exposure field on a substrate, comprising:

an optical directing device configured to direct first and second spatially coherent and temporally coherent beams of radiation to substantially overlap at the exposure field, such that overlapping beams form interference fringes in the exposure field; and

a first beam width adjusting system located in the beam path of the first light beam, such that respective path lengths of the beams are matched when they reach the exposure field to maintain the spatial coherence and temporal coherence of the beams across a full width of the exposure field.

16. The system of claim 15, wherein the optical directing device comprises tiltable mirrors.

17. The system of claim 15, further comprising:

a beam splitter configured to generate the first and second beams from a beam of radiation.

18. The system of claim 17, wherein the beam of radiation is generated from an excimer laser.

19. The system of claim 17, wherein the beam of radiation is generated from a source of radiation having a short temporal coherence length.

20. The system of claim 15, further comprising:

a detector configured to sense a contrast of the fringes across the exposure field and generate a signal;

a controller configured to receive the signal and generate a control signal therefrom; and

an adjusting device configured to receive the control signal and adjust the beam width adjustment system to maximize contrast across the exposure field.

21. The system of claim 20, wherein:

the beam width adjusting system comprises optical elements; and

the adjusting device Is configured to adjust position, or orientation, or both position and orientation, of the optical elements.

22. The system of claim 15, further comprising:

a second beam width adjusting system located in the beam path of the second light beam, such that respective path lengths of the beams are matched when they reach the exposure field to maintain the spatial coherence and temporal coherence of the beams across a full width of the exposure field.

23. The system of claim 22, wherein at least one of the beam width adjusting systems comprises a spatial light modulator.

24. The system of claim 22, wherein at least one of the beam width adjusting systems comprises a convex lens and a concave lens.

25. The system of claim 22, wherein at least one of the beam width adjusting systems comprises a cylindrical lens.

26. The system of claim 22, wherein at least one of the beam width adjusting systems comprises a prism.

27. The system of claim 22, wherein each of the first and second beam width adjusting systems comprise first and second optical elements.

28. The system of claim 27, wherein the first optical element and second optical element each comprise a pair of cylindrical lenses, a pair of concave and convex lenses, or a pair of prisms.

29. A system, comprising:

a beam splitter configured to split a beam of radiation into first and second beams;

a first beam width adjusting system configured to receive the first beam and output a first beam width adjusted beam, such that respective path lengths of the first and second beams are matched; and

a first reflector configured to direct the first beam width adjusted beam to interfere with the second beam at an exposure field of a substrate, such that fringes formed by the interference form an image on the substrate.

30. The system of claim 29, wherein the beam splitter comprises a phase shifting, an alternating phase shifting, or a binary phase shifting beam splitter.

31. The system of claim 29, wherein the beam width adjusting system comprises optical elements, and the system further comprises:

a detector configured to sense a contrast value of the fringes;

a controller configured to receive a signal from the detector and output a control signal based on the contrast value; and

a first adjusting system, coupled to the first beam width adjusting system, configured to receive the control signal and thereby control orientation or position of an optical element within the first beam width adjusting system.

32. The system of claim 29, further comprising:

a substrate stage configured to move the substrate relative to the image field.

33. The system of claim 29, further comprising:

a second beam width adjusting system configured to receive the second beam and output a second beam width adjusted beam, such that respective path lengths of the first beam width adjusted beam and the second beam width adjusted beam are matched; and

a second reflector configured to direct the second beam width adjusted beam to interfere with the first beam width adjusted beam at the exposure field of the substrate, such that fringes formed by the interference form an image on the substrate.

34. The system of claim 33, wherein the first and second beam width adjusting systems each comprises a pair of concave and convex lenses, a pair of cylindrical lenses, or a pair of prisms.

35. The system of claim 33, wherein the first and second beam width adjusting systems are configured such that the first beam and first beam width adjusted beam have a substantially similar combined path length as the second beam and the second beam width adjusted beam to maintain a mutual spatial coherency and temporal coherence before they interfere.

36. The system of claim 33, wherein the first and second beam width adjusting systems are configured to expand, reduce, or demagnify a width of respective ones of the first and second beams.