Applications and fabrication techniques for large scale wire grid polarizers

• US 7,561,332 B2
• Filed: 11/28/2005
• Issued: 07/14/2009
• Est. Priority Date: 11/30/2004
• Status: Expired due to Fees

• Current Assignee: Agoura Technologies, Inc.
• Original Assignee: Agoura Technologies, Inc.
• Inventors: Little, Michael J., McLaughlin, Charles W.
• Primary Examiner(s): OLSEN, ALLAN W
• Application Number:
  US11/289,660
• Publication Number:
  US 20060118514A1
• Time in Patent Office: 1,324 Days
• Field of Search: None
• US Class Current: 359/485.05
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: G02B 5/3058 comprising electrically conductive elements, e.g. wire grids, conductive particles

Abstract

A wire grid polarizer may be fabricated by forming plurality of substantially-straight metallic lines of predetermined periodicity Λ on a thin film substrate A plurality of substantially straight nanometer-scale periodic surface relief structures is created on a surface of the substrate. The periodic surface relief structures cover a region greater than about 4 centimeters in length and greater than about 4 centimeters in width, wherein the periodicity Λ is between about 10 nanometers and about 500 nanometers. One or more layers of material are formed on the periodic relief structures. The one or more layers include one or more conductor materials that form the plurality of substantially straight metallic lines over a region of the substrate greater than about 4 centimeters in length and greater than about 4 centimeters in width.

Claims

1. A direct view display apparatus, comprising

a source of backlight;

a liquid crystal array;

a wire grid polarizer disposed between the source of backlight and the liquid crystal array, wherein the wire grid polarizer includes a plurality of spaced-apart metal lines on a polymer substrate, wherein the plurality of spaced-apart metal lines is characterized by a periodicity that is less than λ

/3, where λ

is a wavelength for visible light; and

a second polarizer, wherein the liquid crystal array is disposed between the wire grid polarizer and the second polarizer, wherein the second polarizer is configured to transmit light transmitted by the wire grid polarizer.

2. The apparatus of claim 1, further comprising an optical diffuser disposed between the source of backlight and the wire grid polarizer.

3. The apparatus of claim 1, further comprising an optical diffuser integrated into the backlight source.

4. The apparatus of claim 1, further comprising an optical diffuser integrated into the wire grid polarizer.

5. The apparatus of claim 1 wherein the second polarizer is a wire grid polarizer.

6. The apparatus of claim 1 wherein the second polarizer is an absorption-type polarizer.

7. The apparatus of claim 6, further comprising a third polarizer, wherein the third polarizer is an absorption-type polarizer, wherein the liquid crystal display is disposed between the second and third polarizers, and wherein the wire grid polarizer is a tiled wire grid polarizer having a plurality of wire grid sections separated by spaces.

8. The apparatus of claim 7, wherein the wire grid sections are sufficiently close to each other that, when viewed through the third polarizer, the spaces appear sufficiently imperceptible for the purposes of a commercially acceptable display.

9. The apparatus of claim 1 wherein the wire grid polarizer includes a plurality of substantially-straight metallic lines of predetermined periodicity Λ

formed on a thin film substrate, wherein the lines cover a region approximately 4 centimeters to about 200 centimeters in length and approximately 4 centimeters to about 200 centimeters in width, wherein a space between adjacent metal lines in the plurality has a width between λ

/10 and λ

/5.

10. The apparatus of claim 9 wherein said thin film substrate is transparent.

11. The apparatus of claim 9 wherein said thin film substrate is made of a polymer material.

12. The apparatus of claim 9 wherein said substrate comprises poly(dimethylsiloxene).

13. The apparatus of claim 9 wherein the plurality of substantially-straight metallic lines of predetermined periodicity Λ

are formed on the thin film substrate by creating a plurality of substantially straight nanometer-scale periodic surface relief structures on a surface of the substrate, wherein the periodic surface relief structures cover a region greater than about 4 centimeters in length and greater than about 4 centimeters in width, wherein the periodicity Λ

is less than λ

/3, where λ

is a wavelength for visible light; and

forming one or more layers of material on the periodic relief structures, the one or more layers including one or more conductor materials that form the plurality of substantially straight metallic lines over a region of the substrate greater than about 4 centimeters in length and greater than about 4 centimeters in width, wherein the periodicity Λ

is less than λ

/3, where λ

is a wavelength for visible light.

14. The apparatus of claim 9 wherein the plurality of substantially-straight metallic lines of predetermined periodicity Λ

are formed on the thin film substrate by

forming a layer of sacrificial material on a surface of said substrate;

buckling said surface of said substrate such that said surface assumes a repetitive undulating topology of periodicity Λ

;

depositing a masking layer of material at an oblique angle with respect to said buckled first layer so that said material of said masking layer is arranged into regions of alternating thickness of periodicity Λ

;

then

applying a uniaxial tensile force to said substrate so that said substrate is elongated to a sufficiently stressed length that said material of said masking layer fractures into a plurality of lines of periodicity Λ

’

;

then

removing regions of said sacrificial layer that lie between said lines of material of said masking layer;

then

depositing a metallic layer onto said structure whereby said metallic layer overlies said lines of said masking layer and exposed portions of said substrate;

then

removing said lines of material of said masking layer, underlying portions of said sacrificial layer and portions of said metallic layer that overlie said lines of material of said masking layer, leaving parallel lines of said metallic layer of periodicity Λ

’

that directly overlie said substrate; and

then

removing said uniaxial tensile force from said substrate whereby said substrate is relaxed to substantially said unstressed length the periodicity of said lines of material of said metallic layer is reduced to Λ

.

15. The apparatus of claim 14 wherein forming one or more layers of material, creating nanometer-scale periodic surface relief structures and selectively etching said one or more materials includes:

applying a first uniaxial tensile force to stress said substrate whereby said substrate is elongated from said unstressed length to a first stressed length;

then

forming a layer of sacrificial material on a surface of said substrate;

then

removing said first uniaxial tensile force from said coated substrate whereby said substrate assumes substantially said unstressed length and said material of said sacrificial layer buckles to assume a repetitive undulating topology of periodicity Λ

;

then

depositing a masking layer of material at an oblique angle with respect to said buckled first layer so that said material of said masking layer is arranged into regions of alternating thickness of periodicity Λ

;

then

applying a second uniaxial tensile force that exceeds said first uniaxial tensile force to said substrate so that said substrate is elongated to a second stressed length exceeding said first stressed length whereby said material of said masking layer is fractured into a plurality of lines of periodicity Λ

’

;

then

removing regions of said sacrificial layer that lie between said lines of material of said masking layer;

then

depositing a metallic layer onto said structure whereby said metallic layer overlies said lines of said masking layer and exposes portions of said sacrificial layer;

then

removing said lines of material of said masking layer, underlying portions of said sacrificial layer and portions of said metallic layer that overlie said lines of material of said masking layer, leaving parallel lines of said metallic layer of periodicity Λ

’

that directly overlie said substrate; and

then

removing said second uniaxial tensile force from said substrate whereby said substrate is relaxed to substantially said unstressed length the periodicity of said lines of material of said metallic layer is reduced to Λ

.

16. A direct view display apparatus, comprising:

a source of backlight;

a liquid crystal array;

a wire grid polarizer disposed between the source of backlight and the liquid crystal array, wherein the wire grid polarizer includes a plurality of spaced-apart metal lines on a polymer substrate, wherein the plurality of spaced-apart metal lines is characterized by a periodicity that is less than λ

/3, where λ

is a wavelength for visible light, wherein no other polarizer is disposed between the wire grid polarizer and the liquid crystal array; and

a second polarizer, wherein the liquid crystal array is disposed between the wire grid polarizer and the second polarizer, wherein the second polarizer is configured to transmit light transmitted by the wire grid polarizer.