Methods and arrangement for implementing highly efficient plasma traps

• US 7,562,638 B2
• Filed: 12/23/2005
• Issued: 07/21/2009
• Est. Priority Date: 12/23/2005
• Status: Active Grant

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Wang, Ing-Yann Albert, Kamarehi, Mohammad
• Primary Examiner(s): Hassanzadeh; Parviz
• Assistant Examiner(s): DHINGRA, RAKESH KUMAR
• Application Number:
  US11/318,360
• Publication Number:
  US 20070144441A1
• Time in Patent Office: 1,306 Days
• Field of Search: 118/723.MW, 118/723.ME, 156/345.35, 156/345.36, 156/345.41, 315/111.71
• US Class Current: 118/723.0MW
• CPC Class Codes: H01J 37/32211 Means for coupling power to the plasma
• CPC Class Codes: H01J 37/32357 Generation remote from the workpiece, e.g. down-stream
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence

Abstract

An arrangement configured to contain plasma within plasma tube assembly of downstream microwave plasma system. Downstream microwave plasma system is configured to generate plasma within plasma-sustaining region of plasma tube assembly and channeling at least portion of plasma downstream to plasma processing chamber of downstream microwave plasma system. Arrangement includes a first hollow center electrically conductive disk surrounding a cylindrical structure that defines plasma passage of plasma tube assembly. Arrangement also includes a second hollow center electrically conductive disk also surrounding the cylindrical structure. Second hollow center electrically conductive disk is configured to be disposed in a spaced-apart relationship relative to first hollow center electrically conductive disk so as to form a first hollow center disk-shape interstitial region between first hollow center electrically conductive disc and second hollow center electrically conductive disc.

Claims

1. A plasma system comprising:

a microwave waveguide assembly;

an upstream plurality of hollow center electrically conductive, disks;

a downstream plurality of hollow center electrically conductive disks; and

a plasma tube assembly intersecting said microwave waveguide assembly, said plasma tube assembly having a plasma-sustaining region defined between said upstream plurality of hollow center electrically conductive disks and said downstream plurality of hollow center electrically conductive disks,

wherein a first hollow center electrically conductive disk among at least one of said upstream plurality of hollow center electrically conductive disk and said downstream plurality of hollow center electrically conductive disks includes a first downstream corrugated outer surface and a first upstream corrugated outer surface disposed opposite to said first downstream corrugated outer surface, said first hollow center electrically conductive disk further including a first plurality of corrugated peaks disposed on said first downstream corrugated outer surface, said first hollow center electrically conductive disk further including a second plurality of corrugated peaks disposed on said first upstream corrugated outer surface, and

a second hollow center electrically conductive disk among at least one of said upstream plurality of hollow center electrically conductive disk and said downstream plurality of hollow center electrically conductive disks includes a second upstream corrugated outer surface and a second downstream corrugated outer surface disposed opposite to said second upstream outer surface, said second hollow center electrically conductive disk further including a third plurality of corrugated peaks disposed on said second downstream corrugated outer surface, said second hollow center electrically conductive disk further including a fourth plurality of corrugated peaks disposed on said second upstream corrugated outer surface, said second upstream corrugated outer surface facing said first downstream corrugated outer surface.

2. The plasma a system of claim 1 wherein said first plurality of corrugated peaks includes at least a first corrugated peak and a second corrugated peak, said first corrugated peak surrounding said plasma tube assembly, said second corrugated peak surrounding said first corrugated peak.

3. The plasma system of claim 1 wherein said downstream plurality of hollow center electrically conductive disks includes at least a downstream outer hollow center electrically conductive disk and a downstream inner hollow center electrically conductive disk, said downstream outer hollow center electrically conductive disk being disposed downstream relative to said downstream inner hollow center electrically conductive disk.

4. The plasma system of claim 3 further including a downstream cooling manifold, said downstream cooling manifold being disposed in at least one of a first assembly arrangement and a second assembly arrangement relative to sad downstream outer hollow center electrically conductive disk, said first assembly arrangement being characterized by having substantially no air gap between an upstream-facing surface of said downstream cooling manifold and a downstream-facing surface of said downstream outer hollow center electrically conductive disk, said second assembly arrangement being characterized by said downstream cooling manifold being disposed adjacent to said downstream outer hollow center electrically conductive disk.

5. The plasma system of claim 4 wherein said downstream cooling manifold is disposed in said first assembly arrangement relative to said downstream outer hollow center electrically conductive disk.

6. The plasma system of claim 4 wherein said downstream cooling manifold is disposed in said second assembly arrangement relative to said downstream outer hollow center electrically conductive disk.

7. The plasma system of claim 3 wherein said downstream outer hollow center electrically conductive disk is formed of a first hollow center electrically conductive disk surrounding a passage within said plasma tube assembly, wherein a second hollow center electrically conductive disk is disposed upstream of said first hollow center electrically conductive disk, said second hollow center electrically conductive disk also surrounding said passage within said plasma tube assembly, and a first interstitial region is disposed between said first hollow center electrically conductive disc and said second hollow center electrically conductive disc.

8. The plasma system of claim 7 wherein said first interstitial region forms an air gap.

9. The plasma system of claim 7 wherein said first interstitial region is formed of a solid material other than air.

10. The plasma system of claim 7 wherein said downstream inner hollow center electrically conductive disk is formed of said second hollow center electrically conductive disk, wherein a third hollow center electrically conductive disk is disposed upstream relative to said second hollow center electrically conductive disk, and a second interstitial region is disposed between said second hollow center electrically conductive disc and said third hollow center electrically conductive disc.

11. The plasma system of claim 10 wherein said second interstitial region forms an air gap.

12. The plasma system of claim 3 further including an upstream cooling manifold, said upstream cooling manifold being disposed such that there exists substantially no air gap between a downstream-facing surface of said upstream cooling manifold and an upstream-facing surface of an upstream outer hollow center electrically conductive disk among said upstream plurality of hollow center electrically conductive disks.

13. The plasma system of claim 3 further including an upstream cooling manifold, said, upstream cooling manifold being disposed adjacent to an upstream outer hollow center electrically conductive disk among said upstream plurality of hollow center electrically conductive disks.

14. The plasma system of claim 1 wherein said microwave guide assembly includes a sliding short configured for tuning said microwave guide assembly.

15. A plasma system comprising:

a microwave waveguide assembly;

an upstream hollow center electrically conductive disk set;

a downstream hollow center electrically conductive disk set disposed downstream relative to said upstream hollow center electrically conductive disk set; and

a plasma tube assembly intersecting said microwave waveguide assembly, said plasma tube assembly having a plasma-sustaining region defined between said upstream hollow center electrically conductive disk set and said downstream hollow center electrically conductive disk set,

wherein a first hollow center electrically conductive disk among at least one of said upstream hollow center electrically conductive disk set and said downstream hollow center electrically conductive disk set includes a first set of corrugated peaks disposed on an outer surface of said first hollow center electrically conductive disk, each of said first set of corrugated peaks having a rectangular cross section, and

a second hollow center electrically conductive disk among at least one of said upstream hollow center electrically conductive disk set and said downstream hollow center electrically conductive disk set includes a second set of corrugated peaks disposed on an outer surface of said second hollow center electrically conductive disk, a cross section of each of said second set of corrugated peaks is rectangular, said second set of corrugated peaks being aligned with said first set of corrugated peaks, said outer surface of said first hollow center electrically conductive disk facing said outer surface of said second hollow center electrically conductive disk.

16. The plasma system of claim 15 further comprising a downstream cooling manifold disposed such that substantially no air gap exists between an upstream-facing surface of said downstream cooling manifold and a downstream-facing surface of said downstream hollow center electrically conductive disk set.

17. The plasma system of claim 15 wherein said first set of corrugated peaks includes at least a first corrugated peak and a second corrugated peak, said first corrugated peak surrounding said plasma tube assembly, said second corrugated peak surrounding said first corrugated peak.

18. The plasma system claim 15 wherein said downstream hollow center electrically conductive disk set includes at least a downstream outer hollow center electrically conductive disk and a downstream inner hollow center electrically conductive disk, said downstream outer hollow center electrically conductive disk being disposed downstream relative to said downstream inner hollow center electrically conductive disk,

wherein at least one of said downstream outer hollow center electrically conductive disk and said downstream inner hollow center electrically conductive disk includes a plurality of corrugated peaks, said plurality of corrugated peaks being oriented parallel to said plasma tube assembly.

19. The plasma system of claim 18 wherein said downstream outer hollow center electrically conductive disk is formed of a first hollow center electrically conductive disk surrounding a passage within said plasma tube assembly, wherein a second hollow center electrically conductive disk is disposed upstream of said first hollow center electrically conductive disk, said second hollow center electrically conductive disk also surrounding said passage within said plasma tube assembly, and a first interstitial region is disposed between said first hollow center electrically conductive disc and said second hollow center electrically conductive disc.

20. The plasma system of claim 19 wherein said first interstitial region forms an air gap.

21. The plasma system of claim 19 wherein said downstream inner hollow center electrically conductive disk is formed of said second hollow center electrically conductive disk, wherein a third hollow center electrically conductive disk is disposed upstream relative to said second hollow center electrically conductive disk, and a said interstitial region is disposed between said second hollow center electrically conductive disc and said third hollow center electrically conductive disc.

22. The plasma system of claim 21 wherein said second interstitial region forms an air gap.

23. The plasma system of claim 15 wherein said microwave guide assembly includes a sliding short configured for tuning said microwave guide assembly.

24. A plasma system comprising:

a microwave waveguide assembly;

an upstream plurality of hollow center electrically conductive disks;

a downstream plurality of hollow center electrically conductive disks; and

a plasma tube assembly intersecting said microwave waveguide assembly, said plasma tube assembly having a plasma-sustaining region defined between said upstream plurality of hollow center electrically conductive disks and said downstream plurality of hollow center electrically conductive disks,

wherein a first hollow center electrically conductive disk among at least one of said upstream plurality of hollow center electrically conductive disks and said downstream plurality of hollow center electrically conductive disks includes a lust plurality of corrugated peaks disposed on an outer surface of said first hollow center electrically conductive disk, and

a second hollow center electrically conductive disk among at least one of said upstream plurality of hollow center electrically conductive disks and downstream plurality of hollow center electrically conductive disks includes a second plurality of corrugated peaks disposed on an outer surface of said second hollow center electrically conductive disk, said second plurality of corrugated peaks being offset relative to said first plurality of corrugated peaks, said outer surface of said first hollow center electrically conductive disk facing said outer surface of said second hollow center electrical conductive disk.

25. The plasma system of claim 24 further comprising a downstream cooling manifold disposed such that substantially no air gap exists between an upstream-facing surface of said downstream cooling manifold and a downstream-facing surface of a downstream outer hollow center electrically conductive disk among said downstream plurality of hollow center electrically conductive disks.

26. The plasma system of claim 24 wherein said first plurality of corrugated peaks includes at least a first corrugated peak and a second corrugated peak, said first corrugated peak surrounding said plasma tube assembly, said second corrugated peak surrounding said first corrugated peak.

27. The plasma system of claim 24 wherein a downstream outer hollow center electrically conductive disk among said downstream plurality of hollow center electrically conductive disks is formed of a first hollow center electrically conductive disk surrounding a passage within said plasma tube assembly, wherein a second hollow center electrically conductive disk is disposed upstream of said first hollow center electrically conductive disk, said second hollow center electrically conductive disk also surrounding said passage within said plasma tube assembly, and a first interstitial region is disposed between said first hollow center electrically conductive disc and said second hollow center electrically conductive disc.

28. The plasma system of claim 27 wherein said first interstitial region forms a first air gap.

29. The plasma system of claim 27 wherein a downstream inner plasma trap among said downstream plurality of plasma traps is formed of said second hollow center electrically conductive disk, wherein a third hollow center electrically conductive disk is disposed upstream relative to said second hollow center electrically conductive disk, and a second interstitial region is disposed between said second hollow center electrically conductive disc and said third hollow center electrically conductive disc.

30. The plasma system of claim 29 wherein said second interstitial region forms a second air gap.