Ion beam apparatus having plasma sheath controller
First Claim
1. An ion beam apparatus comprising:
- a plasma chamber;
a grid assembly installed at one end of the plasma chamber, and having first ion extraction apertures; and
a plasma sheath controller disposed between the plasma chamber and the grid assembly, and having second ion extraction apertures smaller than the first ion extraction apertures.
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Accused Products
Abstract
An ion beam apparatus includes a plasma chamber with a grid assembly installed at one end of the plasma chamber and a plasma sheath controller disposed between the plasma chamber and the grid assembly. The grid assembly includes first ion extraction apertures. The plasma sheath controller includes second ion extraction apertures smaller than the first ion extraction apertures. When the plasma sheath controller is used in this configuration, the surface of the plasma takes on a more planar configuration adjacent the controller so that ions, extracted from the plasma in a perpendicular direction to the plasma surface, pass cleanly through the apertures of the grid assembly rather than collide with the sidewalls of the grid assembly apertures. A semiconductor manufacturing apparatus and method for forming an ion beam are also provided.
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Citations
28 Claims
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1. An ion beam apparatus comprising:
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a plasma chamber; a grid assembly installed at one end of the plasma chamber, and having first ion extraction apertures; and a plasma sheath controller disposed between the plasma chamber and the grid assembly, and having second ion extraction apertures smaller than the first ion extraction apertures. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A semiconductor manufacturing apparatus comprising:
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a plasma chamber; a specimen chamber in communication with the plasma chamber; a grid assembly disposed between the plasma chamber and the specimen chamber, and having first ion extraction apertures; and a plasma sheath controller disposed between the plasma chamber and the grid assembly, and having second ion extraction apertures smaller than the first ion extraction apertures. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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26. A method for providing an ion beam from a plasma source, comprising:
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positioning a plasma sheath controller adjacent the plasma sheath of a plasma source and in front of a grid assembly so that multiple apertures of the plasma sheath controller are in communication with each aperture of the grid assembly and the resulting plasma sheath is substantially coplanar with a surface of the plasma sheath controller, wherein the width of the plasma sheath controller apertures is smaller than the thickness of the plasma sheath; applying a voltage to the grid assembly; and extracting ions through apertures in the plasma sheath controller and then through apertures in the grid assembly to form an ion beam. - View Dependent Claims (27, 28)
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Specification