Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby

• US 7,565,219 B2
• Filed: 12/09/2003
• Issued: 07/21/2009
• Est. Priority Date: 12/09/2003
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Huijbregstse, Jeroen, Van Der Schaar, Maurits, Schets, Sicco Ian, Swinnen, Bart Luc
• Primary Examiner(s): Hartman, Jr.; Ronald D
• Application Number:
  US10/730,254
• Publication Number:
  US 20050123843A1
• Time in Patent Office: 2,051 Days
• Field of Search: 700120-121, 700/125
• US Class Current: 700/121
• CPC Class Codes: G03F 9/7092 Signal processing

Abstract

A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object has a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.

Claims

1. A lithographic apparatus comprising:

a projection system configured to project a patterned beam of radiation onto a target portion of a substrate,

a sensor;

a processing unit arranged to communicate with the sensor; and

a beam generator arranged to project an alignment beam to at least one of a plurality of alignment marks, of which desired positions are known,

wherein the sensor is arranged to measure positional parameters for each of the plurality of alignment marks based on the projected alignment beam and to transfer the measured positional parameters to the processing unit, the positional parameters based on a plurality of diffraction orders generated by projecting the alignment beam to the at least one of a plurality of alignment marks, and

wherein the processing unit is arranged to determine at least one parameter of a model providing information about a position of the substrate, based on the measured positional parameters, and

wherein the measured positional parameters are weighted with variable weighing coefficients, the variable weighing coefficients based on the diffraction orders, and

wherein the processing unit is arranged to determine a numerical value of at least one of the weighing coefficients and the at least one parameter of the model simultaneously.

2. The lithographic apparatus according to claim 1, wherein the at least one parameter of the model includes at least one of translation, rotation, and expansion.

3. The lithographic apparatus according to claim 1, wherein the plurality of alignment marks are formed as diffractive elements.

4. The lithographic apparatus according to claim 1, wherein the processing unit is arranged to determine the at least one parameter of the model based on a least-squares solution of an expression based on desired and measured positions of at least one of the plurality of alignment marks.

6. The lithographic apparatus according to claim 1, wherein the apparatus is further configured to project a patterned beam of radiation onto a target portion of the substrate based on the at least one parameter of the model.

7. The lithographic apparatus according to claim 1, wherein said processing unit is arranged to determine the numerical value of at least one of the weighing coefficients based on measurements of at least one substrate, and

wherein the processing unit is arranged to use the determined numerical value of at least one of the weighing coefficients during a determination of the at least one parameter of the model for at least one other substrate.

8. The lithographic apparatus according to claim 1, wherein the processing unit solves for the at least one model parameter and the weighing coefficients by a least squares method and wherein a number of measured positional parameters corresponds to a sum of a number of model parameters with a number of the weighing coefficients.

9. The lithographic apparatus according to claim 8, wherein the at least one model parameter, weighing coefficients, and measured positional parameters are processed in accordance with:

$\left(\begin{array}{ccccccc}1& 0& x_{\mathrm{nom}}& -y_{\mathrm{nom}}& -x_{\mathrm{meas},1}& \mathrm{\dots <br><br>}& -x_{\mathrm{meas},14}\\ 0& 1& y_{\mathrm{nom}}& x_{\mathrm{nom}}& -y_{\mathrm{meas},1}& \mathrm{\dots <br><br>}& -y_{\mathrm{meas},14}\end{array}\right)<br><br>\left(\begin{array}{c}{T}_x\\ T_y\\ \mathrm{Exp}\\ R\\ {\mathrm{\alpha <br><br>}}_1\\ \mathrm{⋮<br><br>}\\ {\mathrm{\alpha <br><br>}}_{14}\end{array}\right)=\left(\begin{array}{c}-x_{\mathrm{nom}}\\ -y_{\mathrm{nom}}\end{array}\right)$

5. A lithographic apparatus comprising:

a projection system configured to project a patterned beam of radiation onto a target portion of a substrate,

a sensor;

a processing unit arranged to communicate with the sensor; and

a beam generator arranged to project an alignment beam to at least one of a plurality of alignment marks, of which desired positions are known,

wherein the sensor is arranged to measure positional parameters for each of the plurality of alignment marks based on the projected alignment beam and to transfer the measured positional parameters to the processing unit, and

wherein the processing unit is arranged to determine at least one parameter of a model providing information about a position of the substrate, based on the measured positional parameters, and

wherein the measured positional parameters are weighted with weighing coefficients, and

wherein the processing unit is arranged to determine a numerical value of at least one of the weighing coefficients together with the at least one parameter of the model, and

wherein the processing unit is arranged to set the value of a weighing coefficient to zero when the signal strength of a corresponding positional parameter is below a certain threshold.