Method of manufacturing a write pole
First Claim
Patent Images
1. A method of fabricating a magnetic write head comprising:
- depositing a layer of magnetic material on a flux guide layer;
depositing a first hard mask layer on said layer of magnetic material;
depositing a second hard mask layer on said first hard mask layer;
depositing a third hard mask layer on said second hard mask layer;
depositing a photo-resist layer upon said third hard mask layer;
patterning said photo-resist layer to define a write pole;
reactive ion etching said third hard mask layer exposed by said pattern photo-resist layer wherein a third hard mask defining said write pole is formed;
reactive ion etching said second hard mask layer and said first hard mask layer exposed by said patterned third hard mask wherein a first hard mask and second hard mask defining said write pole is formed;
ion milling said layer of magnetic material exposed by said second hard mask and said first hard mask wherein a beveled write pole is formed;
forming a conformal spacer upon a portion of a flare length proximate a tip of said beveled write pole; and
forming a shield layer upon said conformal spacer adjacent said flare length proximate said tip of said beveled write pole.
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Abstract
A method of fabricating a magnetic write head, in accordance with one embodiment, includes forming a beveled write pole. A conformal spacer may be formed upon a portion of a flare length proximate a tip of the write pole. A shield layer may also be formed upon the conformal spacer adjacent the flare length proximate the tip of the write pole.
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Citations
8 Claims
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1. A method of fabricating a magnetic write head comprising:
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depositing a layer of magnetic material on a flux guide layer; depositing a first hard mask layer on said layer of magnetic material; depositing a second hard mask layer on said first hard mask layer; depositing a third hard mask layer on said second hard mask layer; depositing a photo-resist layer upon said third hard mask layer; patterning said photo-resist layer to define a write pole; reactive ion etching said third hard mask layer exposed by said pattern photo-resist layer wherein a third hard mask defining said write pole is formed; reactive ion etching said second hard mask layer and said first hard mask layer exposed by said patterned third hard mask wherein a first hard mask and second hard mask defining said write pole is formed; ion milling said layer of magnetic material exposed by said second hard mask and said first hard mask wherein a beveled write pole is formed; forming a conformal spacer upon a portion of a flare length proximate a tip of said beveled write pole; and forming a shield layer upon said conformal spacer adjacent said flare length proximate said tip of said beveled write pole. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification