Method for manufacturing thin film integrated circuit device, noncontact thin film integrated circuit device and method for manufacturing the same, and idtag and coin including the noncontact thin film integrated circuit device
First Claim
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1. A method for manufacturing a thin film integrated circuit device comprising the steps of:
- forming a peel-off layer over a substrate;
forming a base film over the peel-off layer;
forming a plurality of thin film integrated circuit devices over the base film;
forming a groove at a boundary between the plurality of thin film integrated circuit devices; and
introducing a gas or a liquid containing halogen fluoride into the groove, thereby removing the peel-off layer, thereby separating the plurality of thin film integrated circuit devices,wherein the substrate is a glass substrate or a quartz substrate.
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Abstract
To provide a thin film integrated circuit which is mass produced at low cost, a method for manufacturing a thin film integrated circuit according to the invention includes the steps of: forming a peel-off layer over a substrate; forming a base film over the peel-off layer; forming a plurality of thin film integrated circuits over the base film; forming a groove at the boundary between the plurality of thin film integrated circuits; and introducing a gas or a liquid containing halogen fluoride into the groove, thereby removing the peel-off layer; thus, the plurality of thin film integrated circuits are separated from each other.
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Citations
20 Claims
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1. A method for manufacturing a thin film integrated circuit device comprising the steps of:
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forming a peel-off layer over a substrate; forming a base film over the peel-off layer; forming a plurality of thin film integrated circuit devices over the base film; forming a groove at a boundary between the plurality of thin film integrated circuit devices; and introducing a gas or a liquid containing halogen fluoride into the groove, thereby removing the peel-off layer, thereby separating the plurality of thin film integrated circuit devices, wherein the substrate is a glass substrate or a quartz substrate. - View Dependent Claims (7, 8, 9, 10)
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2. A method for manufacturing a thin film integrated circuit device comprising the steps of:
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forming a peel-off layer over a substrate; forming a base film over the peel-off layer; forming a plurality of thin film integrated circuit devices over the base film; forming a groove at a boundary between the plurality of thin film integrated circuit devices; attaching a jig to an upper portion of the plurality of thin film integrated circuit devices; introducing a gas or a liquid containing halogen fluoride into the groove, thereby removing the peel-off layer, thereby separating the plurality of thin film integrated circuit devices; and removing the jig attached to the plurality of thin film integrated circuit devices, wherein the substrate is a glass substrate or a quartz substrate. - View Dependent Claims (5)
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3. A method for manufacturing a thin film integrated circuit device comprising the steps of:
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forming a peel-off layer over a substrate; forming a base film over the peel-off layer; forming a plurality of thin film integrated circuits over the base film; forming an insulating film over the plurality of thin film integrated circuits, thereby forming a plurality of thin film integrated circuit devices; forming a groove at a boundary between the plurality of thin film integrated circuit devices; and introducing a gas or a liquid containing halogen fluoride into the groove, thereby removing the peel-off layer, thereby separating the plurality of thin film integrated circuit devices, wherein the substrate is a glass substrate or a quartz substrate. - View Dependent Claims (6)
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4. A method for manufacturing a thin film integrated circuit device comprising the steps of:
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forming a peel-off layer over a substrate; forming a base film over the peel-off layer; forming a plurality of thin film integrated circuits over the base film; forming an insulating film over the plurality of thin film integrated circuits, thereby forming a plurality of thin film integrated circuit devices; forming a groove at a boundary between the plurality of thin film integrated circuit devices; attaching a jig to an upper portion of the plurality of thin film integrated circuit devices; introducing a gas or a liquid containing halogen fluoride into the groove, thereby removing the peel-off layer, thereby separating the plurality of thin film integrated circuit devices; and removing the jig attached to the plurality of thin film integrated circuit devices, wherein the substrate is a glass substrate or a quartz substrate.
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11. A method for manufacturing a noncontact thin film integrated circuit device comprising the steps of:
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forming a peel-off layer over a substrate; forming a base film over the peel-off layer; forming a plurality of thin film integrated circuits over the base film; forming an insulating film over the plurality of thin film integrated circuits, thereby forming a plurality of thin film integrated circuit devices; forming a groove at a boundary between the plurality of thin film integrated circuit devices; introducing a gas or a liquid containing halogen fluoride into the groove, thereby removing the peel-off layer, thereby separating the plurality of thin film integrated circuit devices; and forming an antenna on an upper or lower portion of the plurality of thin film integrated circuit devices, wherein the substrate is a glass substrate or a quartz substrate. - View Dependent Claims (16, 17, 18, 19, 20)
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12. A method for manufacturing a noncontact thin film integrated circuit device comprising the steps of:
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forming a peel-off layer over a substrate; forming a base film over the peel-off layer; forming a plurality of thin film integrated circuits over the base film; forming an insulating film over the plurality of thin film integrated circuits, thereby forming a plurality of thin film integrated circuit devices; forming a groove at a boundary between the plurality of thin film integrated circuit devices; attaching a jig to an upper portion of the plurality of thin film integrated circuit devices; introducing a gas or a liquid containing halogen fluoride into the groove, thereby removing the peel-off layer, thereby separating the plurality of thin film integrated circuit devices; removing the jig attached to the plurality of thin film integrated circuit devices; and forming an antenna on an upper or lower portion of the plurality of thin film integrated circuit devices, wherein the substrate is a glass substrate or a quartz substrate. - View Dependent Claims (15)
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13. A method for manufacturing a noncontact thin film integrated circuit device comprising the steps of:
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forming a peel-off layer over a first substrate; forming a base film over the peel-off layer; forming a plurality of thin film integrated circuit devices over the base film; forming a groove at a boundary between the plurality of thin film integrated circuit devices; introducing a gas or a liquid containing halogen fluoride into the groove, thereby removing the peel-off layer, thereby separating the plurality of thin film integrated circuit devices; and enfolding at least one of the thin film integrated circuit devices with a substrate provided with an antenna, wherein the first substrate is a glass substrate or a quartz substrate.
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14. A method for manufacturing a noncontact thin film integrated circuit device comprising the steps of:
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forming a peel-off layer over a first substrate; forming a base film over the peel-off layer; forming a plurality of thin film integrated circuit devices over the base film; forming a groove at a boundary between the plurality of thin film integrated circuit devices; attaching a jig to an upper portion of the plurality of thin film integrated circuit devices; introducing a gas or a liquid containing halogen fluoride into the groove, thereby removing the peel-off layer, thereby separating the plurality of thin film integrated circuit devices; removing the jig attached to the plurality of thin film integrated circuit devices; and enfolding at least one of the thin film integrated circuit devices with a substrate provided with an antenna, wherein the first substrate is a glass substrate or a quartz substrate.
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Specification