Systems and methods for minimizing scattered light in multi-SLM maskless lithography
First Claim
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1. A system, comprising:
- a plurality of patterning devices, each patterning device comprising a reflecting portion, the reflecting portion including an array of programmable elements that each are configured to produce a beam, and a non-reflecting portion, wherein respective beams form a patterned beam and wherein the non-reflecting portion is configured to produce stray beams;
a projection system configured to direct the patterned beams onto a surface; and
an aperture device comprising a number of openings, the number corresponding to a number of the patterning devices, the openings arranged in a configuration to correspond to locations of the patterning devices, the openings being arranged in a configuration to transmit the patterned beam, while substantially blocking the stray beams;
wherein a spacing between adjacent ones of the elements in each of the array of programmable elements is smaller than a spacing between adjacent ones of the patterning devices.
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Abstract
The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for directing light from the pattern generating device, and an aperture located at or near an object window. The aperture has a profile that matches the configuration of the pattern generating devices. A method for blocking scattered light in a lithography system using multiple pattern generating devices is also provided.
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10 Claims
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1. A system, comprising:
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a plurality of patterning devices, each patterning device comprising a reflecting portion, the reflecting portion including an array of programmable elements that each are configured to produce a beam, and a non-reflecting portion, wherein respective beams form a patterned beam and wherein the non-reflecting portion is configured to produce stray beams; a projection system configured to direct the patterned beams onto a surface; and an aperture device comprising a number of openings, the number corresponding to a number of the patterning devices, the openings arranged in a configuration to correspond to locations of the patterning devices, the openings being arranged in a configuration to transmit the patterned beam, while substantially blocking the stray beams; wherein a spacing between adjacent ones of the elements in each of the array of programmable elements is smaller than a spacing between adjacent ones of the patterning devices. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification