Method for separating a useful layer and component obtained by said method

• US 7,569,152 B2
• Filed: 07/01/2004
• Issued: 08/04/2009
• Est. Priority Date: 07/04/2003
• Status: Expired due to Fees

• Current Assignee: Commissariat a L'Energie Atomique (French Alternative Energies and Atomic Energy Commission)
• Original Assignee: Commissariat a L'Energie Atomique (French Alternative Energies and Atomic Energy Commission)
• Inventors: Viollet Bosson, Sylvie, Diem, Bernard, Grange, Hubert, Borel, Michel
• Primary Examiner(s): OLSEN, ALLAN W
• Application Number:
  US10/562,931
• Publication Number:
  US 20060144816A1
• Time in Patent Office: 1,860 Days
• Field of Search: None
• US Class Current: 216/12
• CPC Class Codes: B81B 3/001 Structures having a reduced contact area, e.g. with bumps or with a textured surface
• CPC Class Codes: B81C 2201/115 Roughening a surface

Abstract

A useful layer (1) is initially attached by a sacrificial layer (2) to a layer (3) forming a substrate. Before etching of the sacrificial layer (2), at least a part of the surface (4, 5) of at least one of the layers in contact with the sacrificial layer (2) is doped. After etching of the sacrificial layer (2), the surface (4, 5) is superficially etched so as to increase the roughness of its doped part. After doping, a mask (9) is deposited on a part of the useful layer (1) so as to delineate a doped zone and a non-doped zone of the surface (4, 5), one of the zones forming a stop after the superficial etching phase.

Claims

1. Method for separating a useful layer, initially attached by a sacrificial layer to a layer forming a substrate, the method comprising the following steps in order:

depositing of a mask on at least a predetermined part of the useful layer;

doping through the mask of at least a part of the surface of at least one of the layers in contact with the sacrificial layer, so as to delineate at least one doped zone and at least one non-doped zone of said part of the surface;

at least partial etching of the sacrificial layer; and

superficial etching of said part of the surface so as to increase the roughness of the doped zone of said part of the surface,

one of said zones forming a stop after the superficial etching.

2. Method according to claim 1, wherein, said surface intrinsically comprising doping elements of a predetermined type, doping is performed by doping elements of the same type, the stop being formed by the non-doped zone.

3. Method according to claim 1, wherein, said surface intrinsically comprising doping elements of a predetermined type, doping is performed by doping elements of opposite type, the stop being formed by the doped zone.

4. Method according to claim 1, comprising, after doping, an epitaxy step increasing the thickness of the useful layer.

5. Method according to claim 1, wherein doping is performed by ion implantation, the doping elements being taken from the group comprising Boron, Phosphorus and Arsenic.

6. Method according to claim 1, wherein superficial etching is performed by an aqueous solution containing K₂Cr₂0₇ and HF.

7. Method according to claim 1, wherein the sacrificial layer is completely etched before the superficial etching phase of said surface.

8. Method according to claim 1, wherein the mask is delineated by photolithography.

9. Method according to claim 8, wherein the photolithography has a resolution of about 0.3 micrometers.

10. Component comprising a suspended useful layer, attached by fixing means to a substrate, obtained by a method according to claim 1.

11. Method for separating a useful layer, initially attached by a sacrificial layer to a layer forming a substrate, the method comprising the following steps in order:

doping of at least a part of the surface of at least one of the layers in contact with the sacrificial layer;

at least partial etching of the sacrificial layer so as to leave at least one spacer block between the layer forming the substrate and the useful layer,

superficial etching of said surface so as to increase the roughness of the doped part of the surface,

wherein the superficial etching of said surface uses the spacer block as mask, so as to form at least one stop in said surface;

removal of said spacer block; and

an additional superficial etching of said surface so as to increase the roughness of the surface of the stop.

12. The method according to claim 11, further comprising depositing of a mask on at least a predetermined part of the useful layer.