Blocker plate bypass to distribute gases in a chemical vapor deposition system

• US 7,572,337 B2
• Filed: 05/16/2005
• Issued: 08/11/2009
• Est. Priority Date: 05/26/2004
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Padhi, Deenesh, Nowak, Thomas, Rocha-Alvarez, Juan Carlos, Cho, Tom K., Balasubramanian, Ganesh, Kim, Bok Hoen, M'Saad, Hichem, Raj, Daemian
• Primary Examiner(s): Zervigon; Rudy
• Application Number:
  US11/131,010
• Publication Number:
  US 20050263248A1
• Time in Patent Office: 1,548 Days
• Field of Search: 118/715, 156/345.33, 156/345.34
• US Class Current: 118/715
• CPC Class Codes: C23C 16/4405 Cleaning of reactor or parts inside the reactor by using reactive gases
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C23C 16/45574 Nozzles for more than one gas
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32449 Gas control, e.g. control of the gas flow

Abstract

Apparatus and methods for distributing gases into a processing chamber are disclosed. In one embodiment, the apparatus includes a gas distribution plate having a plurality of apertures disposed therethrough and a blocker plate having both a plurality of apertures disposed therethrough and a plurality of feed through passageways disposed therein. A first gas pathway delivers a first gas through the plurality of apertures in the blocker plate and the gas distribution plate. A bypass gas pathway delivers a second gas through the plurality of feed through passageways in the blocker plate and to areas around the blocker plate prior to the second gas passing through the gas distribution plate.

Claims

1. An apparatus for distributing gases into a processing chamber, comprising:

a gas distribution plate in the chamber, wherein the gas distribution plate has a plurality of apertures disposed therethrough; and

a blocker plate spaced above the gas distribution plate, wherein the blocker plate has a plurality of apertures disposed therethrough and feed through passages extending through a center region of the blocker plate;

wherein a first gas pathway is configured to deliver a first gas sequentially through the apertures of both the blocker plate and the gas distribution plate; and

wherein a second gas pathway is configured to deliver a second gas (i) around the blocker plate and through the apertures of the gas distribution plate without passing through the blocker plate, and (ii) through the feed through passages extending through a center region of the blocker plate and through the apertures of the gas distribution plate, without mixing first and second gases prior to the first gas passing through the apertures of the blocker plate.

2. The apparatus of claim 1, wherein the second gas pathway includes a radial passage having a perimeter outlet proximate a perimeter of the chamber.

3. The apparatus of claim 2, wherein the second gas pathway includes a feed through passage that extends from the radial passage and through the blocker plate, the feed through passage being disposed along the radial passage at an inward radial location.

4. The apparatus of claim 2, wherein the second gas pathway includes at least two feed through passages that extend from the radial passage and through the blocker plate, the feed through passages disposed along the radial passage at inward radial locations.

5. The apparatus of claim 2, further comprising a block secured to the perimeter outlet that includes an orifice of predetermined size to control flow of the second gas through the radial passage.

6. The apparatus of claim 1, wherein the processing chamber is a chemical vapor deposition chamber.

7. The apparatus of claim 1, wherein the blocker plate includes approximately 500 apertures.

8. The apparatus of claim 1, wherein the blocker plate includes approximately 500 apertures that each have a diameter of approximately 0.16 millimeters.

9. An apparatus for distributing gases into a processing chamber, comprising:

a gas distribution plate in the chamber, wherein the gas distribution plate has a plurality of apertures disposed therethrough;

a mounting plate in the chamber, wherein the mounting plate has a plurality of radial bores therein that provide perimeter outlets to an area between the mounting plate and the gas distribution plate, the radial bores in fluid communication with a gas distribution assembly; and

a blocker plate disposed between the mounting plate and the gas distribution plate, wherein a first side of the blocker plate is in fluid communication with the gas distribution assembly and a first flow is passable through the blocker plate to the area between the mounting plate and the gas distribution plate on a second side of the blocker plate such that a second flow flows from the outlets at termini of the radial bores and from the first side of the blocker plate is passable through common ones of the apertures of the gas distribution plate without mixing the first and second flows prior to the first flow passing through the blocker plate.

10. The apparatus of claim 9, further comprising feed through passages that extend from the radial bores and through the blocker plate, the feed through passages disposed along the radial bores at inward radial locations.

11. The apparatus of claim 10, wherein selected ones of the radial bores have at least two feed through passages.

12. The apparatus of claim 9, further comprising blocks secured to the perimeter outlets, each block including an orifice of predetermined size to control flow of the second gas through the radial bores.

13. The apparatus of claim 9, wherein the processing chamber is a chemical vapor deposition chamber.

14. The apparatus of claim 9, wherein the blocker plate includes approximately 500 apertures.

15. The apparatus of claim 9, wherein the blocker plate includes approximately 500 apertures that have a diameter of approximately 0.16 millimeters.