Lithographic apparatus and device manufacturing method

• US 7,573,574 B2
• Filed: 07/13/2004
• Issued: 08/11/2009
• Est. Priority Date: 07/13/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Simons, Hubertus Johannes Gertrudus, Hinnen, Paul Christiaan, Van Haren, Richard Johannes Franciscus
• Primary Examiner(s): Toatley, Jr.; Gregory J
• Assistant Examiner(s): Stock, Jr.; Gordon J
• Application Number:
  US10/889,211
• Publication Number:
  US 20060012763A1
• Time in Patent Office: 1,855 Days
• Field of Search: None
• US Class Current: 356/401
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/70683 Mark designs
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask

Abstract

A lithographic apparatus and method comprise an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device and a metrology target patterning device. The product patterning device imparts a radiation beam derived from the illumination system with a product pattern in its cross-section representing features of a product device to be formed. The metrology target patterning device imparts the radiation beam with a metrology target pattern in its cross-section representing at least one metrology target. The product patterning device is separate from the metrology target patterning device. A substrate table holds a substrate. A projection system project the radiation patterned by the product patterning device and the metrology target patterning device onto a target portion of the substrate. A metrology target patterning device controller adjusts the metrology target pattern independently of the product pattern.

Claims

1. A lithographic apparatus, comprising:

an illumination system configured to provide a radiation beam;

a product patterning device configured to pattern the radiation beam with a product pattern representing features of a product device;

a metrology target patterning device configured to pattern the radiation beam with a metrology target pattern representing at least one metrology target;

a metrology target pattern controller configured to adjust the metrology target pattern independently of said product pattern;

a support structure configured to support the product patterning device and the metrology target patterning device, such that they are separated from each other; and

a projection system configured to project the radiation patterned by said product patterning device and said metrology target patterning device onto a target portion of a substrate;

wherein said metrology target pattern controller adjusts the metrology target pattern after said product pattern has been finalized and prior to the projecting of the radiation patterned by the product patterning device onto the substrate.

2. The lithographic apparatus of claim 1, further comprising:

a mask storage device configured to store a plurality of masks; and

a mask storage device controller configured to provide a selected mask from said mask storage device,

wherein a first one of said product patterning device and said metrology target patterning device comprises at least one of the plurality of masks and a second one comprises an array of individually controllable devices.

3. The lithographic apparatus of claim 1, wherein said metrology target pattern controller provides metrology targets corresponding to at least one predetermined standard.

4. The lithographic apparatus of claim 1, wherein at least one of said product patterning device and said metrology target patterning device comprises an array of individually controllable elements.

5. The lithographic apparatus of claim 1, wherein said metrology target pattern controller adjusts said metrology target based on information derived from inspection of a previously patterned substrate.

6. The lithographic apparatus of claim 1, wherein said metrology target patterning device patterns the radiation beam corresponding to a metrology target and a pattern corresponding to a protective structure for said metrology target.

7. The lithographic apparatus of claim 1, wherein said metrology target pattern controller provides a metrology target pattern comprising a plurality of metrology targets.

8. The lithographic apparatus of claim 1, wherein said at least one metrology target comprises a primary structure and at least one substructure.

9. The lithographic apparatus of claim 5, further comprising:

a metrology target inspection device configured to inspect the previously patterned substrate to provide said information to said metrology target pattern controller.

10. The lithographic apparatus of claim 6, wherein said protective structure comprises at least one copy of said metrology target.

11. The lithographic apparatus of claim 7, wherein two or more of said plurality of metrology targets are positioned in different target portions on said substrate.

12. The lithographic apparatus of claim 11, wherein said different target portions comprise different dies.

13. The lithographic apparatus of claim 8, wherein said substructure has a form different to that of said primary structure.

14. The lithographic apparatus of claim 8, wherein said substructure has a characteristic length scale smaller than that of said primary structure.

15. The lithographic apparatus of claim 8, wherein said primary structure comprises a grating.

16. A lithographic apparatus, comprising:

an illumination system configured to supply a beam of radiation;

a control system configured to control an array of individually controllable elements to pattern the beam;

a projection system configured to project the patterned beam onto a target portion of a substrate,

wherein said control system receives a first data file comprising product pattern data representing features of a product device to be formed, and

wherein said control system receives a second data file comprising metrology target data representing a metrology target pattern and an intended metrology target location on the substrate

wherein the control system modifies the second data file after receiving the first data file and prior to the projecting of the patterned beam onto the target portion of the substrate.

17. The lithographic apparatus of claim 16, further comprising:

a metrology target verification and adaptation device configured to detect performance of a metrology target based on an analysis of product pattern data and metrology target data.

18. The lithographic apparatus of claim 16 further comprising:

a metrology target verification and adaptation device configured to adjust said metrology target data to provide an improved metrology target based on a detected performance.