Micro-electromechanical system Fabry-Perot filter mirrors

• US 7,573,578 B2
• Filed: 08/10/2006
• Issued: 08/11/2009
• Est. Priority Date: 06/06/2006
• Status: Expired due to Fees

• Current Assignee: Morpho Detection LLC (Smiths Group International Holdings Ltd.)
• Original Assignee: GE Homeland Protection Incorporated (Safran SA)
• Inventors: Chandrasekaran, Shankar, Banerjee, Ayan, Zribi, Anis, Goravar, Shivappa, Claydon, Glenn S., Que, Long, Kennerly, Stacey, Hays, David C.
• Primary Examiner(s): Chowdhury; Tarifur
• Assistant Examiner(s): Hansen; Jonathan M
• Application Number:
  US11/502,189
• Time in Patent Office: 1,097 Days
• Field of Search: 356/454, 356/480, 356/519
• US Class Current: 356/454
• CPC Class Codes: G02B 26/001 based on interference in an adjustable optical cavity interference filters G02B5/28; devices or arrangements using multiple reflections in spectrometry or monochromators G01J3/26

Abstract

According to one embodiment, a micro-electrical mechanical system apparatus includes first and second mirrors that define a cavity. Moreover, a photonic band-gap structure coats a surface of at least one of the first or second mirrors to improve reflectivity. Another embodiment includes a third mirror, wherein the second and third mirrors form a second cavity. The spaces between the mirrors might comprise, for example, a pair of Fabry-Perot filter cavities for a spectrometer.

Claims

1. A micro-electrical mechanical system apparatus, comprising:

a movable partially reflecting mirror;

a fixed partially reflecting mirror, wherein the movable and fixed mirrors together define a cavity between the mirrors, and further wherein the mirrors are each oriented to reflect light in a direction substantially parallel to upper and lower planar surfaces of a wafer to further define the cavity between the mirrors, and further wherein the cavity is variable in size in a direction substantially parallel to the upper and lower planar surfaces, and further wherein each mirror is disposed within the wafer such that light passes through the fixed partially reflecting mirror to enter the cavity between the mirrors; and

a photonic band-gap structure on a surface of at least one of the movable or fixed mirrors, the photonic band-gap structure comprising alternate layers of relatively high refractive index materials and air, wherein the layers together are configured to achieve a desired level of finesse for a corresponding Fabry-Perot filter.

2. The apparatus of claim 1, wherein at least one of the movable or fixed mirrors is associated with a crystallographic vertical plane of silicon relative to the planes defined by the upper and lower planar surfaces of a silicon wafer.

3. The apparatus of claim 2, further comprising:

an actuator within the plane defined by the upper planar surface of the silicon wafer, wherein the actuator is configured to move the movable mirror.

4. The apparatus of claim 1, wherein the photonic band-gap structure is a one-dimensional photonic band-gap structure and the space between the movable and fixed mirrors is a Fabry-Perot filter cavity.

5. The apparatus of claim 4, wherein the photonic band-gap structure is associated with at least one Bragg mirror formed of alternate layers of relatively high and relatively low refractive index materials.

6. The apparatus of claim 5, wherein a distance associated with the photonic band-gap structure represents substantially a quarter wave optical thickness value.

7. The apparatus of claim 4, wherein the reflection of the mirror having the photonic band-gap structure is substantially 99%.

8. The apparatus of claim 1, wherein the apparatus is associated with at least one of:

(i) a telecommunication device, (ii) a meteorology device, or (iii) a pressure sensor.

9. A method, comprising:

forming a fixed vertical partially reflecting mirror in a wafer, the fixed mirror having a reflecting surface oriented to reflect light in a direction substantially parallel to upper and lower planar surfaces of the wafer;

forming a movable vertical mirror in the wafer, the movable mirror having a reflecting surface oriented to reflect light in a direction substantially parallel to the upper and lower planar surfaces of the wafer, the fixed and movable vertical mirrors defining a Fabry-Perot cavity there between within the wafer, wherein the cavity size is variable in a direction substantially parallel to the upper and lower planar surfaces of the wafer;

growing a layer of a relatively low index substance for the fixed vertical mirror; and

growing a layer of a relatively high index substance for the fixed vertical mirror, such that the layers together are configured to achieve a desired level of finesse for a corresponding Fabry-Perot filter, wherein light passes through the fixed partially reflecting mirror to enter the cavity between the mirrors, and further wherein growing a layer of a relatively low index substance and growing a layer of a relatively high index substance is repeated to form a photonic band-gap structure comprising alternating layers of relatively high refractive index material and air.

10. A micro-electrical mechanical system apparatus, comprising:

a fixed mirror;

a movable mirror;

wherein the fixed and movable mirrors each includes a partially reflecting surface within a wafer to define a first cavity there between within the wafer;

a third mirror configured with a partially reflecting surface within the wafer, the third mirror configured together with the fixed mirror or the movable mirror to define a second cavity there between within the wafer, wherein the partially reflecting surfaces are configured to reflect light in a direction substantially parallel to upper and lower planar surfaces of the wafer, and further wherein at least one cavity size is variable in a direction substantially parallel to the upper and lower planar surfaces of the wafer, such that light passes through the fixed partially reflecting mirror to enter the first and second cavities between the mirrors; and

a one-dimensional photonic band-gap structure on a surface of at least one of the fixed, movable, or third mirrors, the band-gap structure comprising alternate layers of relatively high refractive index materials and air to achieve a desired level of finesse for a corresponding Fabry-Perot filter.

11. The apparatus of claim 10, wherein at least one of the fixed, movable, or third mirrors is associated with a crystallographic vertically inclined plane of silicon that is oriented substantially normal to the upper and lower planar surfaces of the wafer.

12. The apparatus of claim 10, further comprising:

an actuator within the plane defined by the upper planar surface of the wafer, such that the actuator is disposed within the wafer, and wherein the actuator is configured to move the movable mirror in a direction parallel to the upper and lower planar surfaces of the wafer.

13. The apparatus of claim 10, wherein the space between the fixed and movable mirrors is a first Fabry-Perot filter cavity and the space between the third mirror and the other mirror defining the second cavity is a second Fabry-Perot filter cavity.

14. A method, comprising:

reflecting light off of an analyte sample into a first Fabry-Perot filter formed in a silicon wafer, the first Fabry-Perot filter comprising a first cavity;

transmitting light from the first Fabry-Perot filter into a second Fabry-Perot filter formed in the silicon wafer, the second Fabry-Perot filter comprising a second cavity;

an actuator disposed within the silicon wafer and configured to vary the width of the first or second Fabry-Perot filter cavity in a direction substantially parallel to a non-arcuate planar surface of the silicon wafer such that the wavelength of light that exits the second Fabry-Perot filter varies over time, and further such that light entering the first and second Fabry-Perot filters passes through a fixed partially reflecting mirror comprising a one-dimensional photonic band-gap structure comprising alternate layers of relatively high refractive index materials and air to achieve a desired level of finesse for the first Fabry-Perot filter; and

analyzing light output from the second Fabry-Perot filter to determine information about the analyte sample.

15. The method of claim 14, further comprising:

moving a mirror associated with the first or second Fabry-Perot filter in a direction substantially parallel to the non-arcuate planar surface of the silicon wafer such that the light output from the second Fabry-Perot filter may be analyzed across an optical spectral range.

16. A spectrometer, comprising:

a laser source;

an analyte sample to reflect light from the laser source;

a Fabry-Perot filter cavity disposed within a wafer and configured to receive the reflected light, including

an actuator disposed within the wafer, the wafer comprising upper and lower planar surfaces,

at least one movable mirror comprising a partially reflecting surface oriented to reflect light in a direction substantially parallel to the upper and lower planar surfaces, wherein the actuator is configured to move the at least one movable mirror in a direction substantially parallel to the upper and lower planar surfaces,

a fixed mirror comprising a partially reflecting surface oriented to reflect light in a direction substantially parallel to the upper and lower planar surfaces, the fixed mirror oriented substantially parallel to the movable mirror such that light enters the Fabry-Perot filter cavity via the fixed mirror, and

a one-dimensional photonic band-gap structure on a surface of at least one of the movable or fixed mirrors, the one-dimensional photonic band-gap structure comprising alternate layers of relatively high refractive index materials and air to achieve a desired level of finesse for a corresponding Fabry-Perot filter;

a detector to detect photons exiting the Fabry-Perot filter cavity over time as the movable mirror is moved by the actuator; and

a decision unit to determine if the analyte sample is associated with at least one type of molecule based on the detected photons.