Liquid crystal display device and method for fabricating the same
First Claim
1. A method for fabricating a liquid crystal display (LCD) device, comprising:
- depositing an inorganic insulating layer on a first surface of a first substrate, wherein the inorganic insulating layer is made of one of silicon oxide and silicon nitride;
after depositing the inorganic insulating layer, sequentially depositing a first electrode on the inorganic insulating layer, an organic light emitting layer on the first electrode and a second electrode on the organic light emitting layer to form an organic light emitting diode;
after forming the organic light emitting diode , depositing a protective layer to protect the organic light emitting diode;
forming a thin film transistor array for a liquid crystal display panel on a second surface of the first substrate;
providing a liquid crystal layer for the liquid crystal display panel on the second surface of the first substrate; and
attaching the first substrate to a second substrate for the liquid crystal display panel,wherein the liquid crystal panel and the organic light emitting diode use the first substrate in common.
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Accused Products
Abstract
A liquid crystal display (LCD) device includes a first substrate and a second substrate, an organic light emitting element formed by interposing a first insulating layer on an outer surface of the first substrate, a second insulating layer and a protective layer formed in order over an entire surface of the organic light emitting element, a thin film transistor formed on the first substrate, a passivation layer formed over an entire surface of the first substrate including the thin film transistor, a pixel electrode formed on the passivation layer to be connected to the thin film transistor, a common electrode formed on the second substrate, and a liquid crystal layer formed between the first substrate and the second substrate. A method for fabricating the LCD includes the steps of forming a first insulating layer on an outer surface of a first substrate, forming an organic light emitting element on the first insulating layer, forming a second insulating layer over an entire surface of the organic light emitting element, forming a protective layer on the second insulating layer, forming a thin film transistor on the first substrate, forming a passivation layer over an entire surface of the first substrate including the thin film transistor, forming a pixel electrode on the passivation layer, and forming a liquid crystal layer between the first substrate and a second substrate.
9 Citations
7 Claims
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1. A method for fabricating a liquid crystal display (LCD) device, comprising:
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depositing an inorganic insulating layer on a first surface of a first substrate, wherein the inorganic insulating layer is made of one of silicon oxide and silicon nitride; after depositing the inorganic insulating layer, sequentially depositing a first electrode on the inorganic insulating layer, an organic light emitting layer on the first electrode and a second electrode on the organic light emitting layer to form an organic light emitting diode; after forming the organic light emitting diode , depositing a protective layer to protect the organic light emitting diode; forming a thin film transistor array for a liquid crystal display panel on a second surface of the first substrate; providing a liquid crystal layer for the liquid crystal display panel on the second surface of the first substrate; and attaching the first substrate to a second substrate for the liquid crystal display panel, wherein the liquid crystal panel and the organic light emitting diode use the first substrate in common. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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Specification