Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus, comprising:
- a radiation source configured to provide radiation;
an array of optical light engines, each of the optical light engines comprising;
an array of individually controllable elements arranged and constructed to receive and to pattern the radiation, andprojection optics configured to receive the patterned radiation and to project the patterned radiation onto a substrate; and
a substrate table that supports the substrate;
wherein a spacing between adjacent optical engines is greater than a spacing between adjacent elements of each array of individually controllable elements;
wherein the substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.
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Abstract
A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.
49 Citations
26 Claims
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1. A lithographic apparatus, comprising:
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a radiation source configured to provide radiation; an array of optical light engines, each of the optical light engines comprising; an array of individually controllable elements arranged and constructed to receive and to pattern the radiation, and projection optics configured to receive the patterned radiation and to project the patterned radiation onto a substrate; and a substrate table that supports the substrate; wherein a spacing between adjacent optical engines is greater than a spacing between adjacent elements of each array of individually controllable elements; wherein the substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A lithographic apparatus, comprising:
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a radiation source configured to provide radiation; an array of optical light engines, each of the optical light engines comprising; an array of individually controllable elements arranged and constructed to receive and to pattern the radiation, and projection optics configured to receive the patterned radiation and to project the patterned radiation onto a substrate; and a substrate table configured to support the substrate; wherein a spacing between adjacent optical engines is greater than a spacing between adjacent elements of each array of individually controllable elements; wherein the array of optical light engines is arranged and constructed to move relative to the substrate table during exposure of the substrate to the patterned radiation. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A lithographic apparatus, comprising:
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optical light engines, each of the optical light engines comprising, an emitting portion configured to emit a patterned beam, an array of individually controllable elements arranged and constructed to receive radiation and generate respective portions of the patterned beam, and a projection system configured to direct the patterned beam onto a substrate; and a substrate table configured to support the substrate; wherein a spacing between adjacent optical engines is greater than a spacing between adjacent elements of each array of individually controllable elements; wherein the apparatus is arranged and constructed such that the substrate table moves relative to the optical light engines during exposure of the substrate. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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Specification